WO2023000470A1 - 光罩盒及半导体设备 - Google Patents
光罩盒及半导体设备 Download PDFInfo
- Publication number
- WO2023000470A1 WO2023000470A1 PCT/CN2021/117416 CN2021117416W WO2023000470A1 WO 2023000470 A1 WO2023000470 A1 WO 2023000470A1 CN 2021117416 W CN2021117416 W CN 2021117416W WO 2023000470 A1 WO2023000470 A1 WO 2023000470A1
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- WIPO (PCT)
- Prior art keywords
- opening
- shutter
- photomask
- pod according
- pod
- Prior art date
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 22
- 230000000903 blocking effect Effects 0.000 claims description 12
- 230000004308 accommodation Effects 0.000 claims description 7
- 230000002093 peripheral effect Effects 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 8
- 238000007789 sealing Methods 0.000 description 6
- 239000000428 dust Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 230000006978 adaptation Effects 0.000 description 2
- 230000003749 cleanliness Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
Definitions
- the present disclosure relates to the technical field of semiconductors, in particular to a photomask box and semiconductor equipment.
- the photomask box is used to store the photomask.
- the photomask box needs to be placed on the corresponding machine, and the photomask box needs to be opened to take out the photomask.
- the box cover is separated from the main body up and down, and the photomask is clamped into the machine after separation.
- the opening and closing process of the box cover there will be air flow disturbance, so the dust inside the machine will fall on the photomask, thereby affecting the yield rate of the semiconductor structure.
- the disclosure provides a photomask box and a semiconductor device to improve the use performance of the photomask box.
- a pod comprising:
- the body has an accommodating space for accommodating the photomask, the accommodating space has a first opening, and the first opening is located on the circumferential side of the body;
- the shutter is arranged on the body and is movably arranged relative to the body to block or release the first opening.
- a semiconductor device including the above-mentioned pod.
- the semiconductor device further includes:
- the photomask box is arranged on the carrying structure
- the driving mechanism drives the shutter to move relative to the body, so that the shutter blocks or releases the first opening, and after the shutter releases the first opening, the driving mechanism takes out the photomask through the first opening.
- FIG. 1 is a schematic diagram of an exploded structure of a photomask according to an exemplary embodiment
- Fig. 2 is a structural schematic diagram of a first viewing angle of a pod according to an exemplary embodiment
- Fig. 3 is a schematic structural diagram of a second viewing angle of a pod according to an exemplary embodiment
- Fig. 4 is a schematic structural diagram of a body and a seal of a pod according to an exemplary embodiment
- Fig. 5 is a schematic structural view of a pod according to an exemplary embodiment when the locking part of the shutter is in the first position;
- Fig. 6 is a schematic structural view of a pod when the locking part of the shutter is in the second position according to an exemplary embodiment
- Fig. 7 is a schematic diagram showing the application structure of a pod according to an exemplary embodiment
- Fig. 8 is a schematic diagram of a combined structure of a photomask pod and a carrying structure of a semiconductor device according to an exemplary embodiment
- Fig. 9 is a schematic structural diagram of a state of a semiconductor device according to an exemplary embodiment.
- Fig. 10 is a schematic structural diagram showing another state of a semiconductor device according to an exemplary embodiment.
- An embodiment of the present disclosure provides a photomask box. Please refer to FIGS. 1 to 5 .
- the opening 111 , the first opening 111 is located at the circumferential side of the body 10 ; the blocking member 20 , the blocking member 20 is disposed on the body 10 and is movably disposed relative to the body 10 to block or release the first opening 111 .
- a reticle pod includes a body 10 and a shielding member 20 , the reticle 1 is stored in the accommodation space 11 of the body 10 , and the reticle 1 can be taken out from the accommodating space 11 through the first opening 111 . Since the first opening 111 is located on the circumferential side of the main body 10, when the shutter 20 used to block or release the first opening 111 releases the first opening 111, the pod is separated from the front and back, effectively avoiding airflow disturbances The phenomenon of dust pollution to the photomask 1 is reduced, and the yield rate of the semiconductor structure is effectively improved.
- the first opening is located on the upper surface or the lower surface of the body.
- the mask box is separated up and down, which will cause dynamic airflow and cause dust to fall on the mask. 1 to affect exposure.
- the first opening 111 of the pod in this embodiment is located on the circumferential side of the main body 10
- the pod is separated from the front and back, which effectively avoids the occurrence of airflow disturbances and reduces The phenomenon that dust contaminates the photomask 1 is eliminated.
- the shutter 20 is movably arranged relative to the main body 10, that is, by changing the position of the shutter 20, the shutter 20 blocks the first opening 111. At this time, the photomask 1 is sealed in the body 10, and the first opening is released on the shutter 20. At 111 , the photomask 1 is exposed through the first opening 111 , and at this moment, the photomask 1 can be taken out from the main body 10 through the first opening 111 .
- the shutter 20 can move relative to the body 10, but when the shutter 20 releases the first opening 111, the shutter 20 can not be removed from the body 10, at this time, a part of the shutter 20 can be connected to the body 10 limit connections.
- one end of the shutter 20 can be hinged to the body 10 , and the shutter 20 can block or release the first opening 111 by rotating the shutter 20 .
- the shutter 20 can be drawn and arranged on the body 10. After the body 10 is drawn in place, one end of the shutter 20 can be in limited contact with the body 10, so as to prevent the shutter 20 from detaching from the body 10. At this time, the shutter 20
- the cooperation with the main body 10 is similar to the drawer structure, except that the first opening 111 of the main body 10 needs to be released when the blocking member 20 is pulled out.
- the shielding member 20 is detachably connected to the body 10 , that is, when the photomask 1 needs to be taken out from the body 10 , the shielding member 20 is detached to completely release the first opening 111 .
- the shielding member 20 can be removed along a direction away from the first opening 111 , that is, the shielding member 20 can be removed along a direction perpendicular to the first opening 111 .
- the shielding member 20 can be detached along a direction parallel to the first opening 111 , which is not limited here, as long as the shielding member 20 is detachable.
- the shutter 20 and the body 10 may be connected by fasteners, that is, when the shutter 20 needs to be detached from the body 10, the fasteners release the connection between the shutter 20 and the body 10, so that the shutter Part 20 is removed from body 10.
- the shutter 20 is engaged with the body 10.
- the clamping relationship between the shutter 20 and the body 10 can be released first, and then the shutter 20 can be removed from the body 10. remove.
- the locking relationship between the shielding member 20 and the body 10 is also released during the process of removing the shielding member 20 from the body 10, for example, the shielding member 20 is provided with a deformable buckle , and the main body 10 is provided with a card slot, the buckle enters into the card slot through deformation, and when it is removed, the buckle is deformed out of the card slot.
- the blocking member 20 includes: a cover body portion 21, the cover body portion 21 blocks or releases the first opening 111; 21, and is movably arranged relative to the cover portion 21, so that the engaging portion 22 has a first position where it is engaged with the body 10 and a second position where it is separated from the body 10; wherein, the engaging portion 22 is located at the second position In the second position, the shield 20 can be removed from the main body 10 .
- the cover part 21 may not have a fixed connection relationship with the body 10, but rely on the clamping part 22 to achieve clamping with the body 10. Therefore, by adjusting the position of the clamping part 22, the shielding part 20 can be connected or connected to the body 10. break away.
- the engaging part 22 may be a plug, and the body 10 is provided with a socket, and the plug is inserted into the socket by sliding the plug, or the plug is pulled out from the socket, so that the blocking member 20 and the body 10 connected, or the shutter 20 is separated from the main body 10.
- the engaging portion 22 is rotatably arranged relative to the cover portion 21, that is, the engaging portion 22 is switched between the first position and the second position by rotating the engaging portion 22, so as to facilitate the realization of the shutter 20 and the connection and separation of the body 10.
- the body 10 is provided with a locking slot, when the locking portion 22 is at the first position, the locking portion 22 is inserted into the slot, and when the locking portion 22 is at the second position, the locking portion 22 is out of the locking slot.
- the clamping part 22 By rotating the clamping part 22, the clamping part 22 enters or disengages from the clamping slot, so as to facilitate the connection and separation of the shutter 20 and the main body 10, which is not only easy to operate, but also has good connection stability.
- a rotation slot 221 is disposed on the engaging portion 22
- a rotating buckle 222 is disposed on the engaging portion 22 .
- the rotation slot 221 and the rotation buckle 222 are used to connect with the external component, so that the external component drives the clamping part 22 to rotate relative to the cover part 21.
- the external component can be a robot 51, where the robot 51 includes a robot arm and control department.
- the rotating buckles 222 may be protruding structures.
- the specific form of the protruding structures is not limited here and can be selected according to actual needs.
- the specific form of the rotating slot 221 is not limited here, and can be selected according to actual needs.
- the accommodating space 11 has a second opening 112 , and the second opening 112 is located on the circumferential side of the body 10 , and the shield 20 is inserted into the accommodating space through the second opening 112 11 , or the shutter 20 is taken out from the accommodating space 11 through the second opening 112 .
- the installation and disassembly of the shutter 20 relative to the main body 10 are all moving in a direction parallel to the second opening 112, that is, the shutter 20 is a pull-type movement relative to the main body 10, so that the distance between the shutter 20 and the main body 10 Avoid air disturbance to the greatest extent during the time, so as to ensure that dust will not be raised, so as to ensure the cleanliness of the photomask 1 when it is taken out.
- both the first opening 111 and the second opening 112 are located on the circumferential side of the main body 10, but the first opening 111 and the second opening 112 are in different directions, that is, the photomask 1 can be moved along the first direction relative to the
- the main body 10 moves so as to be taken out from the accommodating space 11
- the shield 20 can move relative to the main body 10 along the second direction so as to be taken out from the accommodating space 11 .
- the first direction is perpendicular to the first opening 111
- the second direction is perpendicular to the second opening 112
- the first direction may be perpendicular to the second direction, or the angle between the first direction and the second direction may not be equal to 90 degrees, here Not limited.
- the area of the cross section of the accommodating space 11 may be uniform, that is, the area of the cross section of the first cavity of the accommodating space 11 for accommodating the shutter 20 may be equal to that of the accommodating space 11 for accommodating the photomask 1
- the area of the cross-section of the second cavity may be larger than the area of the cross section of the second cavity of the housing space 11 used to accommodate the photomask 1, so as to facilitate the operation of the photomask. 1 enters the first cavity from the second cavity.
- the first cavity of the accommodation space 11 for accommodating the shutter 20 is provided with snap-in card slot.
- the body 10 is a rectangular body, and the body 10 includes two opposite first surfaces 13 , two opposite second surfaces 14 and two opposite third surfaces 15 , the second surface 14 and the third surface 15 are arranged around the first surface 13; wherein, the first opening 111 and the second opening 112 are located on the adjacent second surface 14 and the third surface 15 respectively.
- the first opening 111 and the second opening 112 are perpendicular to each other, that is, the moving direction of the photomask 1 away from the main body 10 is perpendicular to the moving direction of the shutter 20 away from the main body 10 .
- the height of the first opening 111 is smaller than the height of the second opening 112; wherein, when the engaging portion 22 is located at the first position, along the height direction of the second opening 112, the dimension of the engaging portion 22 is larger than that of the second opening 112 When the engaging portion 22 is at the second position, along the height direction of the second opening 112 , the dimension of the engaging portion 22 is smaller than the height of the second opening 112 .
- the engaging portion 22 when the engaging portion 22 is at the first position, the engaging portion 22 needs to be engaged with the slot of the body 10.
- the blocking member 20 is connected to the body 10, therefore, blocking
- the dimension of the member 20 along the height direction of the second opening 112 needs to be greater than the height of the second opening 112, so as to ensure that the shielding member 20 will not disengage from the second opening 112.
- the size is also larger than the size of the cover portion 21 along the height direction of the second opening 112 .
- the engaging portion 22 when the engaging portion 22 is at the second position, the engaging portion 22 needs to be disengaged from the slot of the body 10. At this time, the shutter 20 is separated from the body 10. Therefore, the shutter 20 moves along the second position.
- the size of the height direction of the second opening 112 needs to be smaller than the height of the second opening 112, so as to ensure that the shielding member 20 can be separated from the second opening 112. At this time, the size of the engaging part 22 along the height direction of the second opening 112 is not larger than the cover.
- the rotation angle of the locking part 22 from the first position to the second position is not limited here, and may be 90 degrees, or may be greater than or less than 90 degrees.
- the shielding of the first opening 111 by the shielding member 20 is actually an internal shielding, that is, the shielding member 20 is located at the first opening 111.
- An opening 111 is close to one side of the mask 1 .
- a sealing member 30 is provided between the cover portion 21 and the body 10 , so as to effectively seal the photomask 1 and prevent external contamination of the photomask 1 .
- the sealing member 30 may be a sealing member in the related art, such as a rubber sealing ring structure, which is not limited here, and the important thing is that the sealing member 30 can seal the cover body 21 and the body 10 .
- the shielding member 20 further includes: a connecting portion 23, the engaging portion 22 is located between the connecting portion 23 and the cover portion 21, and the connecting portion 23 is connected to the cover portion 21. connection; wherein, the clamping portion 22 is movably arranged relative to the connecting portion 23 .
- the connecting portion 23 cooperates with the cover portion 21 to realize reliable clamping of the engaging portion 22 , prevent the engaging portion 22 from detaching, and ensure that the engaging portion 22 can reliably rotate.
- connection part 23 and the cover body part 21 can be connected by a fastener 24, and there can be multiple fasteners 24, and the fastener 24 can be a structure such as a bolt in the related art, and the fastener 24 can also be a structure such as a bolt in the related art. spring nails.
- At least one of the cover part 21 and the connecting part 23 is provided with a limiting groove, and the locking part 22 is located in the limiting groove, so as to ensure that the locking part 22 can only be positioned relative to the cover part 21 and the connecting part. 23 for turning.
- the engaging portion 22 may also be rotatably disposed on at least one of the cover portion 21 and the connecting portion 23 .
- the connection portion 23 is provided with an avoidance hole 231 , that is, the avoidance hole 231 realizes the rotation of the rotation slot 221 and the rotation.
- Avoidance of the buckle 222 ensures that the external structure can be connected with the buckle 22 through the rotation slot 221, or when the external structure is connected with the rotation buckle 222, the avoidance hole 231 ensures that the rotation buckle 222 is not connected with the Section 23 interferes.
- An embodiment of the present disclosure also provides a semiconductor device, please refer to FIG. 1 to FIG. 10 , the semiconductor device includes the above-mentioned pod 2 .
- the semiconductor device further includes: a carrying structure 40 on which the photomask pod is arranged; a driving mechanism 50 that drives the shutter 20 to move relative to the main body 10 , so that the shutter 20 blocks or releases the first opening 111 , and after the shutter 20 releases the first opening 111 , the driving mechanism 50 takes out the photomask 1 through the first opening 111 .
- the supporting structure 40 realizes the fixing of the photomask box 2, ensuring that the photomask box 2 is placed on the supporting structure 40 through equipment such as a crane during use of the photomask 1, and then can be blocked by an external structure.
- the part 20 is opened, and the photomask 1 is taken out from the body 10 through the external structure.
- the external structure can be a robot 51, as shown in Figure 7.
- the robot 51 can be a robot structure in the related art.
- the shutter 20 is opened, and the photomask 1 is taken out from the main body 10.
- the drive mechanism 50 may only include the robot 51, and the robot 51 completes the motion that the shutter 20 releases the first opening 111, and the photomask 1 is released from the main body 10. inside out movement.
- the photomask pod 2 is placed on the carrying structure 40 , the photomask 1 is located in the accommodation space 11 , and the shielding member 20 blocks the first opening 111 , that is, the shielding member 20 is connected to the main body 10 .
- the driving mechanism 50 includes: a robot 51, the robot 51 drives the clamping part 22 of the shutter 20 to switch between the first position and the second position; pull out.
- the robot 51 can separate the clamping portion 22 from the body 10 , and at this time, the shutter 20 is separated from the body 10 through the opening and closing member 52 , and the robot 51 can extend into the housing through the first opening 111 . Space 11 for taking out the photomask 1 .
- the opening and closing member 52 places the shielding member 20 in the main body 10 through the second opening 112 , as shown in FIG. 10 .
- the robot 51 can place the photomask 1 at the station to be used, and connect the clamping portion 22 with the main body 10 , thereby completing the overall process of taking out the photomask 1 . If the reticle 1 needs to be put back into the main body 10 after use, the reverse operation can be performed to seal the main body 10 in the reticle pod 2 , which will not be repeated here.
- the opening and closing member 52 includes: a slide rail 521 ; a slide block 522 , the slide block 522 is arranged on the slide rail 521 and is movably arranged along the slide rail 521 ; the driving part 523 , the driving part 523 is drivingly connected with the slider 522 to drive the slider 522 to move along the slide rail 521;
- the member 20 moves relative to the body 10 .
- the opening and closing part 524 is connected to the shutter 20, the driving part 523 is activated, and the driving part 523, the slider 522 and the opening and closing part 524 are moved as a whole, so that The shutter 20 moves, and the moving direction of the slider 522 is determined by the slide rail 521.
- the slide rail 521 can be arranged in a vertical direction.
- the opening and closing part 524 can be connected with the shield 20 first, for example, the opening and closing part 524 is connected with the cover part 21, or the opening and closing part 524 is connected to the connection part 23 .
- the connection time between the opening and closing part 524 and the blocking part 20 there is no limit to the connection time between the opening and closing part 524 and the blocking part 20, as long as the opening and closing part 52 can make the blocking part 20 detach from the main body 10 after the robot 51 separates the clamping part 22 from the main body 10, that is, release
- the first opening 111 enables the robot 51 to take out the photomask 1 from the pod 2 .
- the opening and closing member 52 can drive the shielding member 20 to completely disengage from the body 10 , that is, the opening and closing member 52 makes the shielding member 20 completely pulled out from the body 10 .
- the opening and closing member 52 can drive the shutter 20 to partly disengage from the body 10 , that is, to realize the effective release of the first opening 111 . It is also easy to operate when returning to the original position.
- the driving part 523 can move as a whole, for example, the driving part 523 can include a gear and a motor, and when the motor drives the gear to rotate, the gear can move relative to an external rack, thus realizing the overall Moving, the forward rotation and reverse rotation of the motor realize the up and down movement of the shutter 20 .
- the driving part 523 can be partially movable, and the driving part 523 can include an oil cylinder and a piston rod, and the two ends of the piston rod can be respectively connected to the slider 522 and the opening and closing part 524, thereby realizing the up and down movement of the shutter 20 through the movement of the piston rod .
- the opening and closing member 52 may include a driving part 523 and an opening and closing part 524.
- the driving part 523 is connected to the opening and closing part 524, thereby driving the opening and closing part 524 to move up and down.
- the driving part 523 may be a telescopic motor, a cylinder, Drive mechanism such as oil cylinder.
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Abstract
本公开涉及半导体技术领域，提出了一种光罩盒及半导体设备。光罩盒，包括：本体，本体具有用于容纳光罩的容纳空间，容纳空间具有第一开口，第一开口位于本体的周向侧部；遮挡件，遮挡件设置在本体上，且相对于本体可活动地设置，以遮挡或释放第一开口。
Description
交叉引用
本公开要求于2021年07月19日提交的申请号为202110813124.1、名称为“光罩盒及半导体设备”的中国专利申请的优先权，该中国专利申请的全部内容通过引用全部并入本文。
本公开涉及半导体技术领域，尤其涉及一种光罩盒及半导体设备。
光罩盒用于收纳光罩，在光罩使用过程时，需要将光罩盒放置于相应的机台，并打开光罩盒已取出光罩。
相关技术中，光罩盒在打开时，均是将盒盖与本体上下分离，分离后将光罩夹进机台内部。在盒盖的上下开闭过程中会出现气流扰动，因此机台内部的灰尘会落到光罩上，从而影响半导体结构的良品率。
发明内容
本公开提供一种光罩盒及半导体设备，以改善光罩盒的使用性能。
根据本公开的第一个方面，提供了一种光罩盒，包括：
本体，本体具有用于容纳光罩的容纳空间，容纳空间具有第一开口，第一开口位于本体的周向侧部；
遮挡件，遮挡件设置在本体上，且相对于本体可活动地设置，以遮挡或释放第一开口。
根据本公开的第二个方面，提供了一种半导体设备，包括上述的光罩盒。
在本公开的一个实施例中，半导体设备还包括：
承载结构，光罩盒设置在承载结构上；
驱动机构，驱动机构驱动遮挡件相对于本体活动，以使遮挡件遮挡或释放第一开口，且在遮挡件释放第一开口后，驱动机构通过第一开口将光罩取出。
通过结合附图考虑以下对本公开的优选实施方式的详细说明，本公开的各种目标，特征和优点将变得更加显而易见。附图仅为本公开的示范性图解，并非一定是按比例绘制。在附图中，同样的附图标记始终表示相同或类似的部件。其中：
图1是根据一示例性实施方式示出的一种光罩盒的分解结构示意图；
图2是根据一示例性实施方式示出的一种光罩盒的第一个视角的结构示意图；
图3是根据一示例性实施方式示出的一种光罩盒的第二个视角的结构示意图；
图4是根据一示例性实施方式示出的一种光罩盒的本体和密封件的结构示意图；
图5是根据一示例性实施方式示出的一种光罩盒的遮挡件的卡接部位于第一位置时的结构示意图；
图6是根据一示例性实施方式示出的一种光罩盒的遮挡件的卡接部位于第二位置时的结构示意图；
图7是根据一示例性实施方式示出的一种光罩盒的应用结构示意图；
图8是根据一示例性实施方式示出的一种半导体设备的光罩盒和承载结构的组合结构示意图；
图9是根据一示例性实施方式示出的一种半导体设备的一个状态的结构示意图；
图10是根据一示例性实施方式示出的一种半导体设备的另一个状态的结构示意图。
附图标记说明如下：
1、光罩；2、光罩盒；
10、本体；11、容纳空间；111、第一开口；112、第二开口；13、第一表面；14、第二表面；15、第三表面；20、遮挡件；21、盖体部；22、卡接部；221、旋转插槽；222、旋转卡扣；23、连接部；231、避让孔；24、紧固件；30、密封件；40、承载结构；50、驱动机构；51、机器人；52、开闭件；521、滑轨；522、滑块；523、驱动部；524、开闭部。
体现本公开特征与优点的典型实施例将在以下的说明中详细叙述。应理解的是本公开能够在不同的实施例上具有各种的变化，其皆不脱离本公开的范围，且其中的说明及附图在本质上是作说明之用，而非用以限制本公开。
在对本公开的不同示例性实施方式的下面描述中，参照附图进行，附图形成本公开的一部分，并且其中以示例方式显示了可实现本公开的多个方面的不同示例性结构、系统和 步骤。应理解的是，可以使用部件、结构、示例性装置、系统和步骤的其他特定方案，并且可在不偏离本公开范围的情况下进行结构和功能性修改。而且，虽然本说明书中可使用术语“之上”、“之间”、“之内”等来描述本公开的不同示例性特征和元件，但是这些术语用于本文中仅出于方便，例如根据附图中的示例的方向。本说明书中的任何内容都不应理解为需要结构的特定三维方向才落入本公开的范围内。
本公开的一个实施例提供了一种光罩盒，请参考图1至图5，光罩盒包括：本体10，本体10具有用于容纳光罩1的容纳空间11，容纳空间11具有第一开口111，第一开口111位于本体10的周向侧部；遮挡件20，遮挡件20设置在本体10上，且相对于本体10可活动地设置，以遮挡或释放第一开口111。
本公开一个实施例的光罩盒包括本体10和遮挡件20，光罩1存储在本体10的容纳空间11内，且光罩1能够通过第一开口111由容纳空间11内取出。由于第一开口111位于本体10的周向侧部，用于遮挡或释放第一开口111的遮挡件20在释放第一开口111时，光罩盒属于前后分开的方式，有效地避免气流扰动现象的出现，减少了灰尘污染光罩1的现象，有效提高了半导体结构的良品率。
需要说明的是，相关技术中，第一开口位于本体的上表面或者下表面，在需要取出光罩1时，光罩盒属于上下分开的方式，因此会造成动态气流，导致灰尘飘落在光罩1上影响曝光。而本实施例中的光罩盒由于第一开口111位于本体10的周向侧部，在需要取出光罩1时，光罩盒属于前后分开的方式，有效地避免气流扰动现象的出现，减少了灰尘污染光罩1的现象。
遮挡件20相对于本体10可活动地设置，即通过改变遮挡件20的位置使得遮挡件20遮挡第一开口111，此时光罩1密封在了本体10内，而在遮挡件20释放第一开口111时，光罩1通过第一开口111实现暴露，此时，光罩1可以通过第一开口111由本体10取出。
在一些实施例中，遮挡件20可以相对于本体10运动，但在遮挡件20释放第一开口111时，遮挡件20可不由本体10上取下，此时，遮挡件20的一部分可以与本体10限位连接。例如，遮挡件20的一端可以与本体10铰接，通过转动遮挡件20使得遮挡件20遮挡或释放第一开口111。或者，遮挡件20可以抽拉地设置在本体10上，在本体10抽拉到位后，遮挡件20的一端可以与本体10限位接触，从而避免遮挡件20脱离本体10，此时遮挡件20和本体10的配合方式类似抽屉结构，不同之处在于遮挡件20拉出时，需要释放本体10的第一开口111。
在一个实施例中，遮挡件20与本体10可拆卸地相连接，即在需要将光罩1由本体10 内取出时，将遮挡件20拆下，以此完全释放第一开口111。遮挡件20可以沿远离第一开口111的方向拆下，即遮挡件20沿垂直于第一开口111的方向拆下。或者，遮挡件20可以沿平行于第一开口111的方向拆下，此处不作限定，只要保证遮挡件20可拆下即可。
可选的，遮挡件20与本体10可以通过紧固件相连接，即在需要将遮挡件20由本体10上拆下时，紧固件释放遮挡件20与本体10的连接关系，从而将遮挡件20由本体10上拆下。
可选的，遮挡件20与本体10卡接，在需要将遮挡件20由本体10上拆下时，可以先释放遮挡件20与本体10的卡接关系，然后将遮挡件20由本体10上拆下。或者，通过向遮挡件20施加外力，使得遮挡件20由本体10上拆下的过程中，遮挡件20与本体10的卡接关系也释放，例如，遮挡件20上设置有可变形的卡扣，而本体10上设置有卡槽，卡扣通过变形进入到卡槽内，而在拆除时，卡扣通过变形脱离卡槽。
在一个实施例中，如图2至图6所示，遮挡件20包括：盖体部21，盖体部21遮挡或释放第一开口111；卡接部22，卡接部22与盖体部21相连接，且相对于盖体部21可活动地设置，以使得卡接部22具有与本体10卡接的第一位置和与本体10分离的第二位置；其中，卡接部22位于第二位置时，遮挡件20能够由本体10取下。盖体部21可以与本体10不存在固定连接关系，而是依靠卡接部22实现与本体10卡接，因此，通过调整卡接部22的位置可以使得遮挡件20与本体10相连接或者相脱离。
可选的，卡接部22可以是一个插销，而本体10上设置有插孔，通过滑动插销使得插销插入到插孔内，或者使得插销由插孔拔出，从而使得遮挡件20与本体10相连接，或者遮挡件20与本体10相分离。
可选的，卡接部22相对于盖体部21可转动地设置，即通过转动卡接部22使得卡接部22在第一位置和第二位置之间进行切换，以此方便实现遮挡件20与本体10的连接与分离。
进一步的，本体10上设置有卡槽，卡接部22位于第一位置时，卡接部22插设于卡槽内，卡接部22位于第二位置时，卡接部22脱离卡槽。通过旋转卡接部22使得卡接部22进入或者脱离卡槽，以此方便实现遮挡件20与本体10的连接与分离，不仅操作方便，且连接的稳定性也较好。
在一个实施例中，如图2所示，卡接部22上设置有旋转插槽221，和/或，卡接部22上设置有旋转卡扣222。旋转插槽221和旋转卡扣222用于与外部部件相连接，从而使得外部部件驱动卡接部22相对于盖体部21转动，外部部件可以是机器人51，此处的机器人 51包括机器臂和控制部。
可选的，旋转插槽221和旋转卡扣222可以均为多个，旋转卡扣222可以是凸起结构，对于凸起结构的具体形式此处不作限定，可以根据实际需求进行选择。相应的，旋转插槽221的具体形式此处也不作限定，可以根据实际需求进行选择。
在一个实施例中，如图3和图4所示，容纳空间11具有第二开口112，第二开口112位于本体10的周向侧部，遮挡件20由第二开口112插设在容纳空间11内，或者遮挡件20通过第二开口112由容纳空间11取出。遮挡件20相对于本体10的安装与拆卸均是沿平行于第二开口112的方向进行移动的，即遮挡件20相对于本体10属于抽拉式的移动，从而使得遮挡件20与本体10之间最大限度的避免气流扰动现象的出现，从而保证不会使得灰尘扬起，以此保证取出光罩1时的清洁度。
需要说明的是，第一开口111与第二开口112均位于本体10的周向侧部，但第一开口111与第二开口112处于不同的方向，即光罩1可以沿第一方向相对于本体10移动，从而由容纳空间11内取出，而遮挡件20可以沿第二方向相对于本体10移动，从而由容纳空间11内取出。第一方向垂直于第一开口111，第二方向垂直于第二开口112，第一方向可以垂直于第二方向，或者，第一方向和第二方向的夹角可以不等于90度，此处不作限定。
进一步的，容纳空间11的横截面的面积可以均相一致，即用于容纳遮挡件20的容纳空间11的第一腔体的横截面的面积可以等于用于容纳光罩1的容纳空间11的第二腔体的横截面的面积。或者，用于容纳遮挡件20的容纳空间11的第一腔体的横截面的面积可以大于用于容纳光罩1的容纳空间11的第二腔体的横截面的面积，以此方便光罩1由第二腔体进入到第一腔体内。对于容纳空间11内部的结构不作限定，只要保证实现对光罩1以及遮挡件20的容纳即可，而用于容纳遮挡件20的容纳空间11的第一腔体内设置有与卡接部22相卡接的卡槽。
在一个实施例中，如图1和图4所示，本体10为矩形体，本体10包括相对的两个第一表面13、相对的两个第二表面14以及相对的两个第三表面15，第二表面14和第三表面15环绕第一表面13设置；其中，第一开口111和第二开口112分别位于相邻的第二表面14和第三表面15上。此时，第一开口111和第二开口112属于相互垂直关系，即光罩1脱离本体10的移动方向与遮挡件20脱离本体10的移动方向相互垂直。
可选的，第一开口111的高度小于第二开口112的高度；其中，卡接部22位于第一位置时，沿第二开口112的高度方向，卡接部22的尺寸大于第二开口112的高度，卡接 部22位于第二位置时，沿第二开口112的高度方向，卡接部22的尺寸小于第二开口112的高度。
结合图2和图5所示，在卡接部22位于第一位置时，卡接部22需要与本体10的卡槽相卡接，此时，遮挡件20与本体10相连接，因此，遮挡件20沿第二开口112的高度方向的尺寸需要大于第二开口112的高度，从而保证遮挡件20不会脱离第二开口112，此时，卡接部22沿第二开口112的高度方向的尺寸也大于盖体部21沿第二开口112的高度方向的尺寸。
如图6所示，在卡接部22位于第二位置时，卡接部22需要与本体10的卡槽相脱离，此时，遮挡件20与本体10相分离，因此，遮挡件20沿第二开口112的高度方向的尺寸需要小于第二开口112的高度，从而保证遮挡件20可以脱离第二开口112，此时，卡接部22沿第二开口112的高度方向的尺寸不大于盖体部21沿第二开口112的高度方向的尺寸。对于卡接部22由第一位置到第二位置的旋转角度此处不作限定，可以是90度，也可以大于或者小于90度。
需要说明的是，由于遮挡件20的至少部分安装于容纳空间11内实现对光罩1的密封，因此，遮挡件20对于第一开口111的遮挡实际上是内部遮挡，即遮挡件20位于第一开口111靠近光罩1的一侧。
在一个实施例中，如图3和图4所示，盖体部21与本体10之间设置有密封件30，从而可以有效实现对光罩1的密封，避免外部对光罩1造成污染。密封件30可以是相关技术中的密封件，如橡胶密封圈结构，此处不作限定，重在体现密封件30可以密封盖体部21与本体10即可。
在一个实施例中，如图2和图3所示，遮挡件20还包括：连接部23，卡接部22位于连接部23与盖体部21之间，连接部23与盖体部21相连接；其中，卡接部22相对于连接部23可活动地设置。连接部23与盖体部21相配合，实现了对卡接部22的可靠夹持，避免卡接部22脱离，且可以保证卡接部22可靠地实现转动。
连接部23与盖体部21可以通过紧固件24实现连接，紧固件24可以是多个，紧固件24可以是相关技术中的螺栓等结构，紧固件24也可以是相关技术中的弹簧钉。
可选的，盖体部21和连接部23的至少之一上设置有限位槽，而卡接部22位于限位槽内，从而保证卡接部22只能够相对于盖体部21和连接部23进行转动。或者，卡接部22也可以转动地设置于盖体部21和连接部23的至少之一上。
进一步的，如图2所示，在卡接部22上设置有旋转插槽221和旋转卡扣222时，连 接部23上设置有避让孔231，即避让孔231实现对旋转插槽221和旋转卡扣222的避让，以此保证外部结构能够通过旋转插槽221与卡接部22相连接，或者在外部结构与旋转卡扣222相连接时，避让孔231保证了旋转卡扣222不与连接部23相干涉。
本公开的一个实施例还提供了一种半导体设备，请参考图1至图10，半导体设备包括上述的光罩盒2。
在一个实施例中，如图7至图10所示，半导体设备还包括：承载结构40，光罩盒设置在承载结构40上；驱动机构50，驱动机构50驱动遮挡件20相对于本体10活动，以使遮挡件20遮挡或释放第一开口111，且在遮挡件20释放第一开口111后，驱动机构50通过第一开口111将光罩1取出。
可选的，承载结构40实现了对光罩盒2的固定，保证光罩1在使用过程中，通过天车等设备将光罩盒2放置在承载结构40上，然后可以通过外部结构将遮挡件20打开，并通过外部结构将光罩1由本体10内取出，此时外部结构可以为机器人51，如图7所示，此时，机器人51可以是相关技术中的机器人结构，通过机器臂将遮挡件20打开，并将光罩1由本体10内取出，此时，驱动机构50可以仅包括机器人51，机器人51完成遮挡件20释放第一开口111的运动，以及光罩1由本体10内取出的运动。
结合图8所示，光罩盒2放置在承载结构40上，光罩1位于容纳空间11内，遮挡件20遮挡第一开口111，即遮挡件20与本体10相连接。
进一步的，驱动机构50包括：机器人51，机器人51驱动遮挡件20的卡接部22在第一位置和第二位置切换；开闭件52，开闭件52驱动遮挡件20由第二开口112拉出。
结合图9所示，机器人51可以使得卡接部22与本体10相分离，此时通过开闭件52将遮挡件20与本体10相分离，而机器人51可以通过第一开口111伸入到容纳空间11内，以用于将光罩1取出。并在机器人51将光罩1取出后，开闭件52将遮挡件20通过第二开口112放置于本体10内，如图10所示。最后机器人51可以将光罩1放置于待使用工位，并将卡接部22与本体10相连接，从而完成光罩1取出的整体流程。如果光罩1使用完毕需要放回本体10，则可以进行反向操作，以将本体10密封于光罩盒2内，此处不作赘述。
可选的，结合图9和图10所示，开闭件52包括：滑轨521；滑块522，滑块522设置在滑轨521上，且沿滑轨521可移动地设置；驱动部523，驱动部523与滑块522驱动连接，以驱动滑块522沿滑轨521移动；开闭部524，开闭部524设置在驱动部523上，用于与遮挡件20相连接，以带动遮挡件20相对于本体10移动。在机器人51使得卡接部 22与本体10相分离后，开闭部524与遮挡件20相连接，驱动部523启动，并使得驱动部523、滑块522以及开闭部524整体移动，从而使得遮挡件20进行移动，滑块522的移动方向通过滑轨521进行确定，如图9和图10所示，滑轨521可以沿竖直方向设置。
需要说明的是，在光罩盒2放置于承载结构40上后，可以先将开闭部524与遮挡件20相连接，例如，开闭部524与盖体部21相连接，或者开闭部524与连接部23相连接。当然，对于开闭部524与遮挡件20的连接时间不作限定，只要保证机器人51使得卡接部22与本体10相分离后，开闭件52能够使得遮挡件20脱离本体10即可，即释放第一开口111，并使得机器人51可以将光罩1由光罩盒2内取出。
可选的，开闭件52可以驱动遮挡件20完全脱离本体10，即开闭件52使得遮挡件20完全由本体10拉出。
或者，开闭件52可以驱动遮挡件20部分脱离本体10，即实现对第一开口111的有效释放即可，遮挡件20部分未脱离本体10时，在后续使得开闭件52驱动遮挡件20恢复到原始位置时，也方便操作。
需要注意的是，驱动部523可以整体进行移动，例如，驱动部523可以包括一个齿轮和电机，在电机驱动齿轮转动时，齿轮可以相对于一个外部齿条进行移动，因此实现驱动部523的整体移动，电机的正转与反转实现了遮挡件20的上下移动。或者，驱动部523可以是部分移动，驱动部523可以包括油缸和活塞杆，活塞杆的两端可以分别连接滑块522和开闭部524，从而通过活塞杆的移动实现遮挡件20的上下移动。
可选的，开闭件52可以包括驱动部523和开闭部524，驱动部523与开闭部524相连接，从而驱动开闭部524进行上下移动，驱动部523可以是伸缩电机、气缸、油缸等驱动机构。
本领域技术人员在考虑说明书及实践这里公开的发明后，将容易想到本公开的其它实施方案。本公开旨在涵盖本发明的任何变型、用途或者适应性变化，这些变型、用途或者适应性变化遵循本公开的一般性原理并包括本公开未公开的本技术领域中的公知常识或惯用技术手段。说明书和示例实施方式仅被视为示例性的，本公开的真正范围和精神由所附的权利要求指出。
应当理解的是，本公开并不局限于上面已经描述并在附图中示出的精确结构，并且可以在不脱离其范围进行各种修改和改变。本公开的范围仅由所附的权利要求来限制。
Claims (20)
- 一种光罩盒，包括：本体，所述本体具有用于容纳光罩的容纳空间，所述容纳空间具有第一开口，所述第一开口位于所述本体的周向侧部；遮挡件，所述遮挡件设置在所述本体上，且相对于所述本体可活动地设置，以遮挡或释放所述第一开口。
- 根据权利要求1所述的光罩盒，其中，所述遮挡件与所述本体可拆卸地相连接。
- 根据权利要求2所述的光罩盒，其中，所述遮挡件与所述本体卡接。
- 根据权利要求3所述的光罩盒，其中，所述遮挡件包括：盖体部，所述盖体部遮挡或释放所述第一开口；卡接部，所述卡接部与所述盖体部相连接，且相对于所述盖体部可活动地设置，以使得所述卡接部具有与所述本体卡接的第一位置和与所述本体分离的第二位置；其中，所述卡接部位于所述第二位置时，所述遮挡件能够由所述本体取下。
- 根据权利要求4所述的光罩盒，其中，所述卡接部相对于所述盖体部可转动地设置。
- 根据权利要求5所述的光罩盒，其中，所述本体上设置有卡槽，所述卡接部位于所述第一位置时，所述卡接部插设于所述卡槽内，所述卡接部位于所述第二位置时，所述卡接部脱离所述卡槽。
- 根据权利要求6所述的光罩盒，其中，所述卡接部上设置有旋转插槽，和/或，所述卡接部上设置有旋转卡扣。
- 根据权利要求7所述的光罩盒，其中，所述旋转插槽和所述旋转卡扣均为多个。
- 根据权利要求6所述的光罩盒，其中，所述容纳空间具有第二开口，所述第二开口位于所述本体的周向侧部，所述遮挡件由所述第二开口插设在所述容纳空间内。
- 根据权利要求9所述的光罩盒，其中，所述本体为矩形体，所述本体包括相对的两个第一表面、相对的两个第二表面以及相对的两个第三表面，所述第二表面和所述第三表面环绕所述第一表面设置；其中，所述第一开口和所述第二开口分别位于相邻的所述第二表面和所述第三表面上。
- 根据权利要求10所述的光罩盒，其中，所述第一开口的高度小于所述第二开口的高度；其中，所述卡接部位于所述第一位置时，沿所述第二开口的高度方向，所述卡接部的尺寸大于所述第二开口的高度，所述卡接部位于所述第二位置时，沿所述第二开口的高度方向，所述卡接部的尺寸小于所述第二开口的高度。
- 根据权利要求4所述的光罩盒，其中，所述卡接部由所述第一位置到所述第二位置的旋转角度是90度。
- 根据权利要求4至12中任一项所述的光罩盒，其中，所述盖体部与所述本体之间设置有密封件。
- 根据权利要求4至12中任一项所述的光罩盒，其中，所述遮挡件还包括：连接部，所述卡接部位于所述连接部与所述盖体部之间，所述连接部与所述盖体部相连接；其中，所述卡接部相对于所述连接部可活动地设置。
- 根据权利要求14所述的光罩盒，其中，所述连接部与所述盖体部通过紧固件连接。
- 根据权利要求14所述的光罩盒，其中，所述卡接部上设置有旋转插槽，所述卡接部上设置有旋转卡扣，所述连接部上设置有避让孔，所述避让孔实现对所述旋转插槽和所述旋转卡扣的避让。
- 一种半导体设备，包括权利要求1至16中任一项所述的光罩盒。
- 根据权利要求17所述的半导体设备，其中，所述半导体设备还包括：承载结构，所述光罩盒设置在所述承载结构上；驱动机构，所述驱动机构驱动所述遮挡件相对于本体活动，以使所述遮挡件遮挡或释放所述第一开口，且在所述遮挡件释放所述第一开口后，所述驱动机构通过所述第一开口将所述光罩取出。
- 根据权利要求18所述的半导体设备，其中，所述光罩盒为权利要求9至11中任一项所述的光罩盒，所述驱动机构包括：机器人，所述机器人驱动所述遮挡件的卡接部在第一位置和第二位置切换；开闭件，所述开闭件驱动所述遮挡件由第二开口拉出。
- 根据权利要求19所述的半导体设备，其中，所述开闭件包括：滑轨；滑块，所述滑块设置在所述滑轨上，且沿所述滑轨可移动地设置；驱动部，所述驱动部与所述滑块驱动连接，以驱动所述滑块沿所述滑轨移动；开闭部，所述开闭部设置在所述驱动部上，用于与所述遮挡件相连接，以带动所述遮 挡件相对于所述本体移动。
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17/657,799 US20230020975A1 (en) | 2021-07-19 | 2022-04-04 | Mask pod and semiconductor device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110813124.1A CN115639719A (zh) | 2021-07-19 | 2021-07-19 | 光罩盒及半导体设备 |
| CN202110813124.1 | 2021-07-19 |
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| US17/657,799 Continuation US20230020975A1 (en) | 2021-07-19 | 2022-04-04 | Mask pod and semiconductor device |
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| WO2023000470A1 true WO2023000470A1 (zh) | 2023-01-26 |
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| PCT/CN2021/117416 WO2023000470A1 (zh) | 2021-07-19 | 2021-09-09 | 光罩盒及半导体设备 |
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| WO (1) | WO2023000470A1 (zh) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1165094A (ja) * | 1997-08-22 | 1999-03-05 | Nikon Corp | 収納ケース、露光装置及びデバイス製造装置 |
| CN1486388A (zh) * | 2000-12-13 | 2004-03-31 | 恩特格里斯开曼有限公司 | 横向浮动的卡锁锁芯组件 |
| CN1689928A (zh) * | 2004-04-21 | 2005-11-02 | 阿尔卡特公司 | 利用热迁移效应进行保护的传送盒 |
| US20090245978A1 (en) * | 2008-03-27 | 2009-10-01 | Tdk Corporation | Apparatus and method for opening/closing lid of closed container, gas replacement apparatus using same, and load port apparatus |
| US20130248413A1 (en) * | 2012-03-22 | 2013-09-26 | Gudeng Precision Industrial Co., Ltd. | Container for storing semiconductor device |
-
2021
- 2021-07-19 CN CN202110813124.1A patent/CN115639719A/zh active Pending
- 2021-09-09 WO PCT/CN2021/117416 patent/WO2023000470A1/zh unknown
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1165094A (ja) * | 1997-08-22 | 1999-03-05 | Nikon Corp | 収納ケース、露光装置及びデバイス製造装置 |
| CN1486388A (zh) * | 2000-12-13 | 2004-03-31 | 恩特格里斯开曼有限公司 | 横向浮动的卡锁锁芯组件 |
| CN1689928A (zh) * | 2004-04-21 | 2005-11-02 | 阿尔卡特公司 | 利用热迁移效应进行保护的传送盒 |
| US20090245978A1 (en) * | 2008-03-27 | 2009-10-01 | Tdk Corporation | Apparatus and method for opening/closing lid of closed container, gas replacement apparatus using same, and load port apparatus |
| US20130248413A1 (en) * | 2012-03-22 | 2013-09-26 | Gudeng Precision Industrial Co., Ltd. | Container for storing semiconductor device |
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| CN115639719A (zh) | 2023-01-24 |
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