JPH11340606A - レジスト層の形成方法及びプリント配線基板の製造方法 - Google Patents
レジスト層の形成方法及びプリント配線基板の製造方法Info
- Publication number
- JPH11340606A JPH11340606A JP10130976A JP13097698A JPH11340606A JP H11340606 A JPH11340606 A JP H11340606A JP 10130976 A JP10130976 A JP 10130976A JP 13097698 A JP13097698 A JP 13097698A JP H11340606 A JPH11340606 A JP H11340606A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- substrate
- hole
- resist layer
- conductive substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/429—Plated through-holes specially for multilayer circuits, e.g. having connections to inner circuit layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/11—Printed elements for providing electric connections to or between printed circuits
- H05K1/115—Via connections; Lands around holes or via connections
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0023—Etching of the substrate by chemical or physical means by exposure and development of a photosensitive insulating layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/061—Etching masks
- H05K3/064—Photoresists
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10130976A JPH11340606A (ja) | 1998-03-27 | 1998-04-27 | レジスト層の形成方法及びプリント配線基板の製造方法 |
TW088104821A TW411746B (en) | 1998-03-27 | 1999-03-26 | Resist layer formation method and printed circuit board manufacturing method |
KR1019990010514A KR19990078305A (ko) | 1998-03-27 | 1999-03-26 | 레지스트층의 형성 방법 및 인쇄회로 기판의 제조방법 |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10-98238 | 1998-03-27 | ||
JP9823898 | 1998-03-27 | ||
JP10130976A JPH11340606A (ja) | 1998-03-27 | 1998-04-27 | レジスト層の形成方法及びプリント配線基板の製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH11340606A true JPH11340606A (ja) | 1999-12-10 |
Family
ID=26439436
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10130976A Pending JPH11340606A (ja) | 1998-03-27 | 1998-04-27 | レジスト層の形成方法及びプリント配線基板の製造方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPH11340606A (ko) |
KR (1) | KR19990078305A (ko) |
TW (1) | TW411746B (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101020671B1 (ko) | 2008-11-26 | 2011-03-09 | 세메스 주식회사 | 기판 상의 포토레지스트막을 건조하기 위한 장치 |
KR101021839B1 (ko) * | 2008-11-26 | 2011-03-17 | 세메스 주식회사 | 기판 상의 포토레지스트막을 건조하기 위한 장치 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110099513B (zh) * | 2011-07-27 | 2022-02-18 | 住友重机械工业株式会社 | 基板制造装置及基板制造方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2941308B2 (ja) * | 1989-07-12 | 1999-08-25 | 株式会社日立製作所 | 検査システムおよび電子デバイスの製造方法 |
JPH08141488A (ja) * | 1994-11-18 | 1996-06-04 | Nikka Kk | 塗布装置用洗浄装置 |
JPH08236415A (ja) * | 1995-02-22 | 1996-09-13 | Dainippon Screen Mfg Co Ltd | ロールコータ |
JPH0917716A (ja) * | 1995-06-30 | 1997-01-17 | Casio Comput Co Ltd | レジスト塗布装置 |
-
1998
- 1998-04-27 JP JP10130976A patent/JPH11340606A/ja active Pending
-
1999
- 1999-03-26 TW TW088104821A patent/TW411746B/zh not_active IP Right Cessation
- 1999-03-26 KR KR1019990010514A patent/KR19990078305A/ko active IP Right Grant
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101020671B1 (ko) | 2008-11-26 | 2011-03-09 | 세메스 주식회사 | 기판 상의 포토레지스트막을 건조하기 위한 장치 |
KR101021839B1 (ko) * | 2008-11-26 | 2011-03-17 | 세메스 주식회사 | 기판 상의 포토레지스트막을 건조하기 위한 장치 |
Also Published As
Publication number | Publication date |
---|---|
TW411746B (en) | 2000-11-11 |
KR19990078305A (ko) | 1999-10-25 |
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