JPH11329963A - レンズの摺動を伴う照明光学系及びｒｅｍａ対物レンズと、その動作方法 - Google Patents

レンズの摺動を伴う照明光学系及びｒｅｍａ対物レンズと、その動作方法

Info

Publication number
JPH11329963A
JPH11329963A JP11058033A JP5803399A JPH11329963A JP H11329963 A JPH11329963 A JP H11329963A JP 11058033 A JP11058033 A JP 11058033A JP 5803399 A JP5803399 A JP 5803399A JP H11329963 A JPH11329963 A JP H11329963A
Authority
JP
Japan
Prior art keywords
optical system
illumination
objective lens
illumination optical
rema objective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11058033A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11329963A5 (enExample
Inventor
Joerg Schultz
イェルク・シュルツ
Johannes Wangler
ヨハネス・ヴァングラー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Carl Zeiss AG
Original Assignee
Carl Zeiss SMT GmbH
Carl Zeiss AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH, Carl Zeiss AG filed Critical Carl Zeiss SMT GmbH
Publication of JPH11329963A publication Critical patent/JPH11329963A/ja
Publication of JPH11329963A5 publication Critical patent/JPH11329963A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70183—Zoom systems for adjusting beam diameter

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
  • Microscoopes, Condenser (AREA)
JP11058033A 1998-03-05 1999-03-05 レンズの摺動を伴う照明光学系及びｒｅｍａ対物レンズと、その動作方法 Pending JPH11329963A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19809395A DE19809395A1 (de) 1998-03-05 1998-03-05 Beleuchtungssystem und REMA-Objektiv mit Linsenverschiebung und Betriebsverfahren dafür
DE19809395.0 1998-03-05

Publications (2)

Publication Number Publication Date
JPH11329963A true JPH11329963A (ja) 1999-11-30
JPH11329963A5 JPH11329963A5 (enExample) 2006-04-06

Family

ID=7859786

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11058033A Pending JPH11329963A (ja) 1998-03-05 1999-03-05 レンズの摺動を伴う照明光学系及びｒｅｍａ対物レンズと、その動作方法

Country Status (6)

Country Link
US (1) US6295122B1 (enExample)
EP (1) EP0940722A3 (enExample)
JP (1) JPH11329963A (enExample)
KR (1) KR100632812B1 (enExample)
DE (1) DE19809395A1 (enExample)
TW (1) TW409198B (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001237183A (ja) * 2000-01-20 2001-08-31 Asm Lithography Bv マイクロリソグラフィ投影装置
JP2002055277A (ja) * 2000-08-11 2002-02-20 Nikon Corp リレー結像光学系、および該光学系を備えた照明光学装置並びに露光装置
US6717651B2 (en) 2000-04-12 2004-04-06 Nikon Corporation Exposure apparatus, method for manufacturing thereof and method for manufacturing microdevice
JP2011517843A (ja) * 2008-02-01 2011-06-16 カール・ツァイス・エスエムティー・ゲーエムベーハー 照明光学系及び投影露光装置

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4238390B2 (ja) 1998-02-27 2009-03-18 株式会社ニコン 照明装置、該照明装置を備えた露光装置および該露光装置を用いて半導体デバイスを製造する方法
US6833904B1 (en) 1998-02-27 2004-12-21 Nikon Corporation Exposure apparatus and method of fabricating a micro-device using the exposure apparatus
DE10010131A1 (de) * 2000-03-03 2001-09-06 Zeiss Carl Mikrolithographie - Projektionsbelichtung mit tangentialer Polarisartion
DE10029852A1 (de) * 2000-06-16 2001-12-20 Sick Ag Objekterkennung
TW498408B (en) * 2000-07-05 2002-08-11 Asm Lithography Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP2002231619A (ja) * 2000-11-29 2002-08-16 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
JP3826047B2 (ja) * 2002-02-13 2006-09-27 キヤノン株式会社 露光装置、露光方法、及びそれを用いたデバイス製造方法
JP4332331B2 (ja) * 2002-08-05 2009-09-16 キヤノン株式会社 露光方法
DE10329793A1 (de) * 2003-07-01 2005-01-27 Carl Zeiss Smt Ag Projektionsobjektiv für eine mikrolithographische Projektionsbelichtungsanlage
US7714983B2 (en) * 2003-09-12 2010-05-11 Carl Zeiss Smt Ag Illumination system for a microlithography projection exposure installation
JP4455129B2 (ja) * 2004-04-06 2010-04-21 キヤノン株式会社 収差計測方法及びそれを用いた投影露光装置
JP4599936B2 (ja) * 2004-08-17 2010-12-15 株式会社ニコン 照明光学装置、照明光学装置の調整方法、露光装置、および露光方法
CN107144947B (zh) * 2017-06-26 2019-11-26 吉林工程技术师范学院 非球面变焦系统及照明光学系统
DE102023210777A1 (de) 2023-10-31 2025-04-30 Carl Zeiss Smt Gmbh Optisches System zur Führung von Beleuchtungs- und Abbildungslicht von einer Lichtquelle hin zu einem Bildfeld
DE102024205221A1 (de) 2024-06-06 2025-02-20 Carl Zeiss Smt Gmbh Verfahren zur Bestimmung einer Abbildungsqualität einer optischen Baugruppe eines optischen Systems

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6461716A (en) * 1987-08-31 1989-03-08 Canon Kk Illuminator
JPH06232030A (ja) * 1993-02-01 1994-08-19 Nikon Corp 露光方法及び露光装置
JPH0737798A (ja) * 1993-07-20 1995-02-07 Nippon Telegr & Teleph Corp <Ntt> 投影露光装置
JPH086175A (ja) * 1994-06-17 1996-01-12 Carl Zeiss:Fa 照明システム
JPH08316123A (ja) * 1995-05-19 1996-11-29 Nikon Corp 投影露光装置
JPH09190975A (ja) * 1996-12-20 1997-07-22 Canon Inc 露光装置及びそれを用いた素子製造方法
JPH09197270A (ja) * 1995-12-27 1997-07-31 Carl Zeiss:Fa マイクロリソグラフィ用投影露光装置のｒｅｍａ対物レンズ
JPH09325275A (ja) * 1996-06-04 1997-12-16 Canon Inc 照明装置及びそれを用いた投影露光装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4851882A (en) * 1985-12-06 1989-07-25 Canon Kabushiki Kaisha Illumination optical system
JP2705609B2 (ja) * 1995-02-21 1998-01-28 日本電気株式会社 露光装置および露光方法
KR960042227A (ko) * 1995-05-19 1996-12-21 오노 시게오 투영노광장치
KR100472866B1 (ko) * 1996-02-23 2005-10-06 에이에스엠엘 네델란즈 비.브이. 광학적장치용조명유닛

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6461716A (en) * 1987-08-31 1989-03-08 Canon Kk Illuminator
JPH06232030A (ja) * 1993-02-01 1994-08-19 Nikon Corp 露光方法及び露光装置
JPH0737798A (ja) * 1993-07-20 1995-02-07 Nippon Telegr & Teleph Corp <Ntt> 投影露光装置
JPH086175A (ja) * 1994-06-17 1996-01-12 Carl Zeiss:Fa 照明システム
JPH08316123A (ja) * 1995-05-19 1996-11-29 Nikon Corp 投影露光装置
JPH09197270A (ja) * 1995-12-27 1997-07-31 Carl Zeiss:Fa マイクロリソグラフィ用投影露光装置のｒｅｍａ対物レンズ
JPH09325275A (ja) * 1996-06-04 1997-12-16 Canon Inc 照明装置及びそれを用いた投影露光装置
JPH09190975A (ja) * 1996-12-20 1997-07-22 Canon Inc 露光装置及びそれを用いた素子製造方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001237183A (ja) * 2000-01-20 2001-08-31 Asm Lithography Bv マイクロリソグラフィ投影装置
US6717651B2 (en) 2000-04-12 2004-04-06 Nikon Corporation Exposure apparatus, method for manufacturing thereof and method for manufacturing microdevice
JP2002055277A (ja) * 2000-08-11 2002-02-20 Nikon Corp リレー結像光学系、および該光学系を備えた照明光学装置並びに露光装置
US6856377B2 (en) 2000-08-11 2005-02-15 Nikon Corporation Relay image optical system, and illuminating optical device and exposure system provided with the optical system
JP2011517843A (ja) * 2008-02-01 2011-06-16 カール・ツァイス・エスエムティー・ゲーエムベーハー 照明光学系及び投影露光装置

Also Published As

Publication number Publication date
KR100632812B1 (ko) 2006-10-11
EP0940722A3 (de) 2001-06-20
US6295122B1 (en) 2001-09-25
EP0940722A2 (de) 1999-09-08
TW409198B (en) 2000-10-21
DE19809395A1 (de) 1999-09-09
KR19990077474A (ko) 1999-10-25

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