KR100632812B1 - 렌즈가 이동되는 ｒｅｍａ 대물렌즈, 조명 시스템 및 그 작동 프로세스 - Google Patents

렌즈가 이동되는 ｒｅｍａ 대물렌즈, 조명 시스템 및 그 작동 프로세스 Download PDF

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Publication number
KR100632812B1
KR100632812B1 KR1019990006260A KR19990006260A KR100632812B1 KR 100632812 B1 KR100632812 B1 KR 100632812B1 KR 1019990006260 A KR1019990006260 A KR 1019990006260A KR 19990006260 A KR19990006260 A KR 19990006260A KR 100632812 B1 KR100632812 B1 KR 100632812B1
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KR
South Korea
Prior art keywords
optical elements
image
distortion
reticle
objective lens
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Expired - Fee Related
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KR1019990006260A
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English (en)
Korean (ko)
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KR19990077474A (ko
Inventor
슐츠예르크
방글러요하네스
Original Assignee
칼 짜이스 에스엠테 아게
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Application filed by 칼 짜이스 에스엠테 아게 filed Critical 칼 짜이스 에스엠테 아게
Publication of KR19990077474A publication Critical patent/KR19990077474A/ko
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Publication of KR100632812B1 publication Critical patent/KR100632812B1/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70183—Zoom systems for adjusting beam diameter

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
  • Microscoopes, Condenser (AREA)
KR1019990006260A 1998-03-05 1999-02-25 렌즈가 이동되는 ｒｅｍａ 대물렌즈, 조명 시스템 및 그 작동 프로세스 Expired - Fee Related KR100632812B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19809395 1998-03-05
DE19809395A DE19809395A1 (de) 1998-03-05 1998-03-05 Beleuchtungssystem und REMA-Objektiv mit Linsenverschiebung und Betriebsverfahren dafür

Publications (2)

Publication Number Publication Date
KR19990077474A KR19990077474A (ko) 1999-10-25
KR100632812B1 true KR100632812B1 (ko) 2006-10-11

Family

ID=7859786

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019990006260A Expired - Fee Related KR100632812B1 (ko) 1998-03-05 1999-02-25 렌즈가 이동되는 ｒｅｍａ 대물렌즈, 조명 시스템 및 그 작동 프로세스

Country Status (6)

Country Link
US (1) US6295122B1 (enExample)
EP (1) EP0940722A3 (enExample)
JP (1) JPH11329963A (enExample)
KR (1) KR100632812B1 (enExample)
DE (1) DE19809395A1 (enExample)
TW (1) TW409198B (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4238390B2 (ja) 1998-02-27 2009-03-18 株式会社ニコン 照明装置、該照明装置を備えた露光装置および該露光装置を用いて半導体デバイスを製造する方法
US6833904B1 (en) 1998-02-27 2004-12-21 Nikon Corporation Exposure apparatus and method of fabricating a micro-device using the exposure apparatus
TWI283798B (en) * 2000-01-20 2007-07-11 Asml Netherlands Bv A microlithography projection apparatus
DE10010131A1 (de) * 2000-03-03 2001-09-06 Zeiss Carl Mikrolithographie - Projektionsbelichtung mit tangentialer Polarisartion
US6717651B2 (en) 2000-04-12 2004-04-06 Nikon Corporation Exposure apparatus, method for manufacturing thereof and method for manufacturing microdevice
DE10029852A1 (de) * 2000-06-16 2001-12-20 Sick Ag Objekterkennung
TW498408B (en) * 2000-07-05 2002-08-11 Asm Lithography Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP2002055277A (ja) * 2000-08-11 2002-02-20 Nikon Corp リレー結像光学系、および該光学系を備えた照明光学装置並びに露光装置
JP2002231619A (ja) * 2000-11-29 2002-08-16 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
JP3826047B2 (ja) * 2002-02-13 2006-09-27 キヤノン株式会社 露光装置、露光方法、及びそれを用いたデバイス製造方法
JP4332331B2 (ja) * 2002-08-05 2009-09-16 キヤノン株式会社 露光方法
DE10329793A1 (de) * 2003-07-01 2005-01-27 Carl Zeiss Smt Ag Projektionsobjektiv für eine mikrolithographische Projektionsbelichtungsanlage
US7714983B2 (en) * 2003-09-12 2010-05-11 Carl Zeiss Smt Ag Illumination system for a microlithography projection exposure installation
JP4455129B2 (ja) * 2004-04-06 2010-04-21 キヤノン株式会社 収差計測方法及びそれを用いた投影露光装置
JP4599936B2 (ja) * 2004-08-17 2010-12-15 株式会社ニコン 照明光学装置、照明光学装置の調整方法、露光装置、および露光方法
DE102008007449A1 (de) * 2008-02-01 2009-08-13 Carl Zeiss Smt Ag Beleuchtungsoptik zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage für die Mikrolithographie
CN107144947B (zh) * 2017-06-26 2019-11-26 吉林工程技术师范学院 非球面变焦系统及照明光学系统
DE102023210777A1 (de) 2023-10-31 2025-04-30 Carl Zeiss Smt Gmbh Optisches System zur Führung von Beleuchtungs- und Abbildungslicht von einer Lichtquelle hin zu einem Bildfeld
DE102024205221A1 (de) 2024-06-06 2025-02-20 Carl Zeiss Smt Gmbh Verfahren zur Bestimmung einer Abbildungsqualität einer optischen Baugruppe eines optischen Systems

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4851882A (en) * 1985-12-06 1989-07-25 Canon Kabushiki Kaisha Illumination optical system
JPS6461716A (en) * 1987-08-31 1989-03-08 Canon Kk Illuminator
JP3282167B2 (ja) * 1993-02-01 2002-05-13 株式会社ニコン 露光方法、走査型露光装置、及びデバイス製造方法
JPH0737798A (ja) * 1993-07-20 1995-02-07 Nippon Telegr & Teleph Corp <Ntt> 投影露光装置
EP0687956B2 (de) * 1994-06-17 2005-11-23 Carl Zeiss SMT AG Beleuchtungseinrichtung
JP2705609B2 (ja) * 1995-02-21 1998-01-28 日本電気株式会社 露光装置および露光方法
KR960042227A (ko) * 1995-05-19 1996-12-21 오노 시게오 투영노광장치
JPH08316123A (ja) * 1995-05-19 1996-11-29 Nikon Corp 投影露光装置
DE19548805A1 (de) * 1995-12-27 1997-07-03 Zeiss Carl Fa REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen
KR100472866B1 (ko) * 1996-02-23 2005-10-06 에이에스엠엘 네델란즈 비.브이. 광학적장치용조명유닛
JPH09325275A (ja) * 1996-06-04 1997-12-16 Canon Inc 照明装置及びそれを用いた投影露光装置
JP2891219B2 (ja) * 1996-12-20 1999-05-17 キヤノン株式会社 露光装置及びそれを用いた素子製造方法

Also Published As

Publication number Publication date
EP0940722A3 (de) 2001-06-20
US6295122B1 (en) 2001-09-25
EP0940722A2 (de) 1999-09-08
TW409198B (en) 2000-10-21
JPH11329963A (ja) 1999-11-30
DE19809395A1 (de) 1999-09-09
KR19990077474A (ko) 1999-10-25

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