TW409198B - Illumination system and REMA objective with lens shift and the operation method thereof - Google Patents
Illumination system and REMA objective with lens shift and the operation method thereof Download PDFInfo
- Publication number
- TW409198B TW409198B TW088103276A TW88103276A TW409198B TW 409198 B TW409198 B TW 409198B TW 088103276 A TW088103276 A TW 088103276A TW 88103276 A TW88103276 A TW 88103276A TW 409198 B TW409198 B TW 409198B
- Authority
- TW
- Taiwan
- Prior art keywords
- patent application
- scope
- item
- lighting system
- imaging
- Prior art date
Links
- 238000005286 illumination Methods 0.000 title claims abstract description 22
- 241000022563 Rema Species 0.000 title claims description 41
- 238000000034 method Methods 0.000 title claims description 10
- 230000003287 optical effect Effects 0.000 claims abstract description 46
- 238000003384 imaging method Methods 0.000 claims description 14
- 230000002079 cooperative effect Effects 0.000 claims description 5
- 210000001747 pupil Anatomy 0.000 claims description 4
- 238000011017 operating method Methods 0.000 claims 2
- 230000015572 biosynthetic process Effects 0.000 abstract 2
- 238000001393 microlithography Methods 0.000 abstract 1
- 239000010453 quartz Substances 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 238000010586 diagram Methods 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000004075 alteration Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 210000000887 face Anatomy 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70183—Zoom systems for adjusting beam diameter
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lenses (AREA)
- Microscoopes, Condenser (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19809395A DE19809395A1 (de) | 1998-03-05 | 1998-03-05 | Beleuchtungssystem und REMA-Objektiv mit Linsenverschiebung und Betriebsverfahren dafür |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW409198B true TW409198B (en) | 2000-10-21 |
Family
ID=7859786
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW088103276A TW409198B (en) | 1998-03-05 | 1999-03-04 | Illumination system and REMA objective with lens shift and the operation method thereof |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6295122B1 (enExample) |
| EP (1) | EP0940722A3 (enExample) |
| JP (1) | JPH11329963A (enExample) |
| KR (1) | KR100632812B1 (enExample) |
| DE (1) | DE19809395A1 (enExample) |
| TW (1) | TW409198B (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6856377B2 (en) | 2000-08-11 | 2005-02-15 | Nikon Corporation | Relay image optical system, and illuminating optical device and exposure system provided with the optical system |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4238390B2 (ja) | 1998-02-27 | 2009-03-18 | 株式会社ニコン | 照明装置、該照明装置を備えた露光装置および該露光装置を用いて半導体デバイスを製造する方法 |
| US6833904B1 (en) | 1998-02-27 | 2004-12-21 | Nikon Corporation | Exposure apparatus and method of fabricating a micro-device using the exposure apparatus |
| TWI283798B (en) * | 2000-01-20 | 2007-07-11 | Asml Netherlands Bv | A microlithography projection apparatus |
| DE10010131A1 (de) * | 2000-03-03 | 2001-09-06 | Zeiss Carl | Mikrolithographie - Projektionsbelichtung mit tangentialer Polarisartion |
| US6717651B2 (en) | 2000-04-12 | 2004-04-06 | Nikon Corporation | Exposure apparatus, method for manufacturing thereof and method for manufacturing microdevice |
| DE10029852A1 (de) * | 2000-06-16 | 2001-12-20 | Sick Ag | Objekterkennung |
| TW498408B (en) * | 2000-07-05 | 2002-08-11 | Asm Lithography Bv | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| JP2002231619A (ja) * | 2000-11-29 | 2002-08-16 | Nikon Corp | 照明光学装置および該照明光学装置を備えた露光装置 |
| JP3826047B2 (ja) * | 2002-02-13 | 2006-09-27 | キヤノン株式会社 | 露光装置、露光方法、及びそれを用いたデバイス製造方法 |
| JP4332331B2 (ja) * | 2002-08-05 | 2009-09-16 | キヤノン株式会社 | 露光方法 |
| DE10329793A1 (de) * | 2003-07-01 | 2005-01-27 | Carl Zeiss Smt Ag | Projektionsobjektiv für eine mikrolithographische Projektionsbelichtungsanlage |
| US7714983B2 (en) * | 2003-09-12 | 2010-05-11 | Carl Zeiss Smt Ag | Illumination system for a microlithography projection exposure installation |
| JP4455129B2 (ja) * | 2004-04-06 | 2010-04-21 | キヤノン株式会社 | 収差計測方法及びそれを用いた投影露光装置 |
| JP4599936B2 (ja) * | 2004-08-17 | 2010-12-15 | 株式会社ニコン | 照明光学装置、照明光学装置の調整方法、露光装置、および露光方法 |
| DE102008007449A1 (de) * | 2008-02-01 | 2009-08-13 | Carl Zeiss Smt Ag | Beleuchtungsoptik zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage für die Mikrolithographie |
| CN107144947B (zh) * | 2017-06-26 | 2019-11-26 | 吉林工程技术师范学院 | 非球面变焦系统及照明光学系统 |
| DE102023210777A1 (de) | 2023-10-31 | 2025-04-30 | Carl Zeiss Smt Gmbh | Optisches System zur Führung von Beleuchtungs- und Abbildungslicht von einer Lichtquelle hin zu einem Bildfeld |
| DE102024205221A1 (de) | 2024-06-06 | 2025-02-20 | Carl Zeiss Smt Gmbh | Verfahren zur Bestimmung einer Abbildungsqualität einer optischen Baugruppe eines optischen Systems |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4851882A (en) * | 1985-12-06 | 1989-07-25 | Canon Kabushiki Kaisha | Illumination optical system |
| JPS6461716A (en) * | 1987-08-31 | 1989-03-08 | Canon Kk | Illuminator |
| JP3282167B2 (ja) * | 1993-02-01 | 2002-05-13 | 株式会社ニコン | 露光方法、走査型露光装置、及びデバイス製造方法 |
| JPH0737798A (ja) * | 1993-07-20 | 1995-02-07 | Nippon Telegr & Teleph Corp <Ntt> | 投影露光装置 |
| EP0687956B2 (de) * | 1994-06-17 | 2005-11-23 | Carl Zeiss SMT AG | Beleuchtungseinrichtung |
| JP2705609B2 (ja) * | 1995-02-21 | 1998-01-28 | 日本電気株式会社 | 露光装置および露光方法 |
| KR960042227A (ko) * | 1995-05-19 | 1996-12-21 | 오노 시게오 | 투영노광장치 |
| JPH08316123A (ja) * | 1995-05-19 | 1996-11-29 | Nikon Corp | 投影露光装置 |
| DE19548805A1 (de) * | 1995-12-27 | 1997-07-03 | Zeiss Carl Fa | REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen |
| KR100472866B1 (ko) * | 1996-02-23 | 2005-10-06 | 에이에스엠엘 네델란즈 비.브이. | 광학적장치용조명유닛 |
| JPH09325275A (ja) * | 1996-06-04 | 1997-12-16 | Canon Inc | 照明装置及びそれを用いた投影露光装置 |
| JP2891219B2 (ja) * | 1996-12-20 | 1999-05-17 | キヤノン株式会社 | 露光装置及びそれを用いた素子製造方法 |
-
1998
- 1998-03-05 DE DE19809395A patent/DE19809395A1/de not_active Withdrawn
-
1999
- 1999-02-05 EP EP99102271A patent/EP0940722A3/de not_active Ceased
- 1999-02-25 KR KR1019990006260A patent/KR100632812B1/ko not_active Expired - Fee Related
- 1999-03-04 TW TW088103276A patent/TW409198B/zh not_active IP Right Cessation
- 1999-03-05 JP JP11058033A patent/JPH11329963A/ja active Pending
- 1999-03-05 US US09/264,137 patent/US6295122B1/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6856377B2 (en) | 2000-08-11 | 2005-02-15 | Nikon Corporation | Relay image optical system, and illuminating optical device and exposure system provided with the optical system |
Also Published As
| Publication number | Publication date |
|---|---|
| KR100632812B1 (ko) | 2006-10-11 |
| EP0940722A3 (de) | 2001-06-20 |
| US6295122B1 (en) | 2001-09-25 |
| EP0940722A2 (de) | 1999-09-08 |
| JPH11329963A (ja) | 1999-11-30 |
| DE19809395A1 (de) | 1999-09-09 |
| KR19990077474A (ko) | 1999-10-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GD4A | Issue of patent certificate for granted invention patent | ||
| MM4A | Annulment or lapse of patent due to non-payment of fees |