DE19809395A1 - Beleuchtungssystem und REMA-Objektiv mit Linsenverschiebung und Betriebsverfahren dafür - Google Patents

Beleuchtungssystem und REMA-Objektiv mit Linsenverschiebung und Betriebsverfahren dafür

Info

Publication number
DE19809395A1
DE19809395A1 DE19809395A DE19809395A DE19809395A1 DE 19809395 A1 DE19809395 A1 DE 19809395A1 DE 19809395 A DE19809395 A DE 19809395A DE 19809395 A DE19809395 A DE 19809395A DE 19809395 A1 DE19809395 A1 DE 19809395A1
Authority
DE
Germany
Prior art keywords
lens
lighting system
rema
optical path
lighting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19809395A
Other languages
German (de)
English (en)
Inventor
Joerg Schultz
Johannes Wangler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Carl Zeiss AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH, Carl Zeiss AG filed Critical Carl Zeiss SMT GmbH
Priority to DE19809395A priority Critical patent/DE19809395A1/de
Priority to EP99102271A priority patent/EP0940722A3/de
Priority to KR1019990006260A priority patent/KR100632812B1/ko
Priority to TW088103276A priority patent/TW409198B/zh
Priority to US09/264,137 priority patent/US6295122B1/en
Priority to JP11058033A priority patent/JPH11329963A/ja
Publication of DE19809395A1 publication Critical patent/DE19809395A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70183—Zoom systems for adjusting beam diameter
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
  • Microscoopes, Condenser (AREA)
DE19809395A 1998-03-05 1998-03-05 Beleuchtungssystem und REMA-Objektiv mit Linsenverschiebung und Betriebsverfahren dafür Withdrawn DE19809395A1 (de)

Priority Applications (6)

Application Number Priority Date Filing Date Title
DE19809395A DE19809395A1 (de) 1998-03-05 1998-03-05 Beleuchtungssystem und REMA-Objektiv mit Linsenverschiebung und Betriebsverfahren dafür
EP99102271A EP0940722A3 (de) 1998-03-05 1999-02-05 Beleuchtungssystem und REMA- (Retikel-Maskierungs-) Objektiv mit Linsenverschiebung und Betriebsverfahren dafür
KR1019990006260A KR100632812B1 (ko) 1998-03-05 1999-02-25 렌즈가 이동되는 ｒｅｍａ 대물렌즈, 조명 시스템 및 그 작동 프로세스
TW088103276A TW409198B (en) 1998-03-05 1999-03-04 Illumination system and REMA objective with lens shift and the operation method thereof
US09/264,137 US6295122B1 (en) 1998-03-05 1999-03-05 Illumination system and REMA objective with lens displacement and operating process therefor
JP11058033A JPH11329963A (ja) 1998-03-05 1999-03-05 レンズの摺動を伴う照明光学系及びｒｅｍａ対物レンズと、その動作方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19809395A DE19809395A1 (de) 1998-03-05 1998-03-05 Beleuchtungssystem und REMA-Objektiv mit Linsenverschiebung und Betriebsverfahren dafür

Publications (1)

Publication Number Publication Date
DE19809395A1 true DE19809395A1 (de) 1999-09-09

Family

ID=7859786

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19809395A Withdrawn DE19809395A1 (de) 1998-03-05 1998-03-05 Beleuchtungssystem und REMA-Objektiv mit Linsenverschiebung und Betriebsverfahren dafür

Country Status (6)

Country Link
US (1) US6295122B1 (enExample)
EP (1) EP0940722A3 (enExample)
JP (1) JPH11329963A (enExample)
KR (1) KR100632812B1 (enExample)
DE (1) DE19809395A1 (enExample)
TW (1) TW409198B (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1164408A1 (de) * 2000-06-16 2001-12-19 Sick Ag Objekterkennung mit abgeflachter Intensitätsverteilung
US6856377B2 (en) 2000-08-11 2005-02-15 Nikon Corporation Relay image optical system, and illuminating optical device and exposure system provided with the optical system

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6833904B1 (en) 1998-02-27 2004-12-21 Nikon Corporation Exposure apparatus and method of fabricating a micro-device using the exposure apparatus
JP4238390B2 (ja) 1998-02-27 2009-03-18 株式会社ニコン 照明装置、該照明装置を備えた露光装置および該露光装置を用いて半導体デバイスを製造する方法
TWI283798B (en) * 2000-01-20 2007-07-11 Asml Netherlands Bv A microlithography projection apparatus
DE10010131A1 (de) * 2000-03-03 2001-09-06 Zeiss Carl Mikrolithographie - Projektionsbelichtung mit tangentialer Polarisartion
US6717651B2 (en) 2000-04-12 2004-04-06 Nikon Corporation Exposure apparatus, method for manufacturing thereof and method for manufacturing microdevice
TW498408B (en) * 2000-07-05 2002-08-11 Asm Lithography Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP2002231619A (ja) * 2000-11-29 2002-08-16 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
JP3826047B2 (ja) * 2002-02-13 2006-09-27 キヤノン株式会社 露光装置、露光方法、及びそれを用いたデバイス製造方法
JP4332331B2 (ja) * 2002-08-05 2009-09-16 キヤノン株式会社 露光方法
DE10329793A1 (de) * 2003-07-01 2005-01-27 Carl Zeiss Smt Ag Projektionsobjektiv für eine mikrolithographische Projektionsbelichtungsanlage
EP1668421A2 (en) * 2003-09-12 2006-06-14 Carl Zeiss SMT AG Illumination system for a microlithography projection exposure installation
JP4455129B2 (ja) * 2004-04-06 2010-04-21 キヤノン株式会社 収差計測方法及びそれを用いた投影露光装置
JP4599936B2 (ja) * 2004-08-17 2010-12-15 株式会社ニコン 照明光学装置、照明光学装置の調整方法、露光装置、および露光方法
DE102008007449A1 (de) * 2008-02-01 2009-08-13 Carl Zeiss Smt Ag Beleuchtungsoptik zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage für die Mikrolithographie
CN107144947B (zh) * 2017-06-26 2019-11-26 吉林工程技术师范学院 非球面变焦系统及照明光学系统
DE102023210777A1 (de) 2023-10-31 2025-04-30 Carl Zeiss Smt Gmbh Optisches System zur Führung von Beleuchtungs- und Abbildungslicht von einer Lichtquelle hin zu einem Bildfeld
DE102024205221A1 (de) 2024-06-06 2025-02-20 Carl Zeiss Smt Gmbh Verfahren zur Bestimmung einer Abbildungsqualität einer optischen Baugruppe eines optischen Systems

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4851882A (en) * 1985-12-06 1989-07-25 Canon Kabushiki Kaisha Illumination optical system
JPS6461716A (en) * 1987-08-31 1989-03-08 Canon Kk Illuminator
JP3282167B2 (ja) * 1993-02-01 2002-05-13 株式会社ニコン 露光方法、走査型露光装置、及びデバイス製造方法
JPH0737798A (ja) * 1993-07-20 1995-02-07 Nippon Telegr & Teleph Corp <Ntt> 投影露光装置
EP0687956B2 (de) * 1994-06-17 2005-11-23 Carl Zeiss SMT AG Beleuchtungseinrichtung
JP2705609B2 (ja) * 1995-02-21 1998-01-28 日本電気株式会社 露光装置および露光方法
KR960042227A (ko) * 1995-05-19 1996-12-21 오노 시게오 투영노광장치
JPH08316123A (ja) * 1995-05-19 1996-11-29 Nikon Corp 投影露光装置
DE19548805A1 (de) * 1995-12-27 1997-07-03 Zeiss Carl Fa REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen
EP0823073B1 (en) * 1996-02-23 2001-04-11 Asm Lithography B.V. Illumination unit for an optical apparatus
JPH09325275A (ja) 1996-06-04 1997-12-16 Canon Inc 照明装置及びそれを用いた投影露光装置
JP2891219B2 (ja) * 1996-12-20 1999-05-17 キヤノン株式会社 露光装置及びそれを用いた素子製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1164408A1 (de) * 2000-06-16 2001-12-19 Sick Ag Objekterkennung mit abgeflachter Intensitätsverteilung
DE10029852A1 (de) * 2000-06-16 2001-12-20 Sick Ag Objekterkennung
US6856377B2 (en) 2000-08-11 2005-02-15 Nikon Corporation Relay image optical system, and illuminating optical device and exposure system provided with the optical system

Also Published As

Publication number Publication date
EP0940722A3 (de) 2001-06-20
TW409198B (en) 2000-10-21
EP0940722A2 (de) 1999-09-08
KR100632812B1 (ko) 2006-10-11
KR19990077474A (ko) 1999-10-25
JPH11329963A (ja) 1999-11-30
US6295122B1 (en) 2001-09-25

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Legal Events

Date Code Title Description
8127 New person/name/address of the applicant

Owner name: CARL ZEISS SMT AG, 73447 OBERKOCHEN, DE

8110 Request for examination paragraph 44
8139 Disposal/non-payment of the annual fee