WO2004099873A2 - Beleuchtungssystem für eine mikrolithographie-projektionsbelichtungsanlage - Google Patents
Beleuchtungssystem für eine mikrolithographie-projektionsbelichtungsanlage Download PDFInfo
- Publication number
- WO2004099873A2 WO2004099873A2 PCT/EP2004/004875 EP2004004875W WO2004099873A2 WO 2004099873 A2 WO2004099873 A2 WO 2004099873A2 EP 2004004875 W EP2004004875 W EP 2004004875W WO 2004099873 A2 WO2004099873 A2 WO 2004099873A2
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- WO
- WIPO (PCT)
- Prior art keywords
- light mixing
- light
- lighting system
- mixing device
- plane
- Prior art date
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
Definitions
- the invention relates to an illumination system for a microlithography projection exposure system for illuminating an illumination field with illuminating radiation with a predeterminable degree of coherence.
- the performance of projection exposure systems for the microlithographic production of semiconductor components and other finely structured components is largely determined by the imaging properties of the projection objectives.
- the image quality and the wafer throughput that can be achieved with the system are essentially determined by the properties of the lighting system upstream of the projection lens. This must be able to prepare the light of a primary light source, for example a laser, with the highest possible degree of efficiency and thereby produce an intensity distribution that is as uniform as possible in an illumination field of the lighting system.
- it should be possible to set different lighting modes on the lighting system for example to optimize the lighting according to the structures of the individual templates (masks, reticles) to be imaged.
- the non-conventional tional lighting settings for generating off-axis, oblique lighting can serve, among other things, to increase the depth of focus through double-beam interference and to increase the resolution.
- EP 0 747 772 describes an illumination system with a zoom axicon lens, in the object plane of which a first diffractive raster element with a two-dimensional raster structure is arranged.
- This raster element serves to slightly increase the light conductance of the incident laser radiation by introducing an aperture and to change the shape of the light distribution so that, for example, an approximate circular distribution or a quadrupole distribution results.
- the first raster elements may be exchanged.
- a second raster element which is located in the exit pupil of the objective, is illuminated with the corresponding light distribution and forms a rectangular light distribution, the shape of which corresponds to the entry surface of a subsequent rod-shaped light mixing element (rod integrator).
- the degree of coherence ⁇ is defined here as the ratio of the numerical aperture on the output side of the lighting system to the numerical aperture on the input side of a subsequent projection object.
- degrees of coherence for example from the range between approximately 0.1 and 0.2 to 0.25, can also be set.
- Such little ones Degrees of coherence which are also referred to here as “ultra-small settings”, can be useful, for example, when using phase-shifting masks, which are advantageously illuminated with light that is largely perpendicular to the mask plane.
- the setting options of conventional lighting systems are to be expanded to small degrees of coherence with justifiable design effort, essentially without sacrificing performance in the previously customary lighting settings.
- the invention provides a lighting system with the features of claim 1.
- Advantageous further developments are specified in the dependent claims. The wording of all claims is incorporated by reference into the content of the description.
- An inventive lighting system of the type mentioned at the outset has a first optical system for receiving light from a light source and for producing a predeterminable light distribution in an entry plane of a light mixing device, and a light mixing device for homogenizing the radiation coming from the first optical system and for emitting a homogenized light distribution in one Exit plane of the light mixing device.
- the first optical system and the light mixing device can each be switched over between a first configuration belonging to a first coherence degree range and at least one second configuration belonging to a second coherence degree range, the first and the second coherence degree range overall having a total coherence degree range. include rich that is greater than the first or the second coherence degree range.
- the overall degree of coherence degree preferably extends into the range of ultra-small ⁇ values, for example with minimum adjustable degrees of coherence ⁇ m in in the range from approximately 0.1 to 0.15.
- the upper limit ⁇ ma ⁇ of the overall degree of coherence degree can correspond to that of conventional systems and, for example, be between 0.9 and 1 for ⁇ values.
- the lighting system comprises two subsystems that are coordinated with one another, namely the first optical system and the light mixing device, each of which can be changed in its optical effect in a coordinated manner, so that a larger overall coherence degree range is covered compared to conventional systems can be impaired without affecting other parameters that are important for the lighting, such as, for example, the uniformity of the illumination of the lighting field.
- the first optical system is assigned at least one beam shaping changing device with at least two different beam shaping elements, each of which contributes to the shaping of the radiation directed onto the entry plane of the light mixing device and which is optional for switching the first optical system between the first configuration and the second configuration can be inserted into the beam path of the first optical system.
- At least one of the beam shaping elements is preferably an optical raster element with a two-dimensional raster structure.
- Advantageous embodiments of such raster elements are described, for example, in EP 0 747 772, the disclosure content of which is made the content of this description by reference becomes.
- They can be diffractive optical elements (DOE), that is to say optical elements in which the radiation emitted is essentially formed by light diffraction (in contrast to light refraction).
- Refractive optical elements (ROE) for example elements with two-dimensional field arrangements of lenses, are also suitable as beam shaping elements.
- a beam shaping element in the sense of this application is designed to convert the incident radiation into emitted radiation which has a predetermined angular distribution.
- two-dimensional intensity distributions of the radiation with a predefinable shape can be set in a targeted manner in planes which are arranged at a distance behind such an element.
- beam shaping elements are suitable for changing the geometric light conductance of the incident radiation.
- the geometric light conductance which is also referred to here as etendue, is defined as the product of the numerical aperture of the radiation and the associated field size.
- the first optical system has a lens with an object plane and an exit pupil and the beam shaper changing device is designed such that the beam shaping elements can be inserted in the area of the exit pupil of the lens.
- the lens can contain a zoom lens, which can have, for example, a double to four times zoom range. Such moderate zoom systems can be implemented with reasonable design effort.
- the lens can also contain an adjustable pair of Axicon, which can be used to generate ring-shaped illuminations. It is advantageous if the Axicon pair and the zoom system can be set independently of one another.
- the radiation distribution, which can be variably adjusted with the objective, can be further modified by the following interchangeable beam shaping elements are set to fall on the subsequent light mixing device, optionally set for the different coherence degree ranges.
- the first optical system also has at least one beam shaping element which is arranged or can be arranged in the region of the object surface of the objective for changing the angular distribution of the radiation coming from the light source.
- This can also be designed as an optical raster element with a two-dimensional raster structure and in particular as a diffractive optical element. If necessary, these elements can also be interchangeable in order to take over part of the contributions required for switching between different coherence degree ranges to influence the light conductance.
- the light conductance of the radiation passing through must be suitably influenced, which can be achieved by the measures described above.
- the illumination field be illuminated as homogeneously as possible, which can be achieved by suitable homogenization or light mixing.
- the shape and size of the lighting field should vary as little as possible with different lighting modes.
- the light mixing device of preferred embodiments has a first light mixing unit and at least one second light mixing unit as well as a light mixer changing device for optionally arranging the first light mixing unit or the second light mixing unit in the region of the optical axis of the light mixing device.
- the light mixing device of a preferred embodiment has a slide which can be moved transversely to the optical axis and on which the first and second light mixing units are mounted in such a way that they can optionally be moved into the region of the optical axis. It has been shown that a linear displacement that is possible as a result when changing the light mixing units can be controlled with great accuracy and carried out very quickly. Alternatively, for example, turret changing devices would be possible.
- control device which enables coordinated control of the beam former changing device and the light mixer changing device.
- the control device and the mechanical design of the changeover devices are preferably configured such that a switchover between a first configuration and a second configuration of the corresponding systems can be carried out within a switchover time that is essentially of the order of a switchover time of the first optical system between different lighting systems. settings corresponds.
- the time for switching between the light mixing devices and the beam shaping elements can be on the order of a few seconds. This means that there is no noticeable delay in the operation of the projection exposure system when an operator makes a setting on the device which requires a change between the different configurations of the first optical system and the light mixing device.
- the first light mixing unit has at least one integrator rod with a first, preferably rectangular cross-sectional area and a first length, which is preferably dimensioned such that an entry surface of the integrator rod can coincide with the entry plane of the light mixing device and the exit surface of the integrator rod can coincide with the exit plane of the light mixing device ,
- the cross-sectional area and the first length are preferably dimensioned such that the integrator rod in the first coherence degree range, which includes the larger, also conventionally achievable coherence degrees, reliably enables a sufficient number of internal (total) reflections at the entry angles of the radiation that occur cause a good homogenization of the radiation.
- a light mixing unit with integrator rod is characterized, among other things, by reliable angle maintenance of the incident radiation and by a small size transverse to the optical axis, which facilitates the provision of several different light mixing devices.
- the second light mixing unit has at least one second integrator rod with a second cross-sectional area and a second length, the second, preferably rectangular cross-sectional area being smaller than the first cross-sectional area and the second length being shorter than the first length. Furthermore, an imaging system following the second integrator rod is provided for imaging an exit surface of the second integrator rod in the exit plane of the light mixing device.
- This light mixing unit can be dimensioned such that on the one hand it enables sufficient light mixing at the low numerical apertures required for the lower coherence degree range and on the other hand it produces an unchanged size of the illumination field.
- the second light mixing unit has a honeycomb condenser arrangement with at least one honeycomb condenser.
- the honeycomb condenser arrangement can have a first raster arrangement with first raster elements for receiving the radiation coming from the entrance surface and for generating a raster arrangement of secondary light sources, and a second raster arrangement with second raster elements for receiving light from the secondary light sources and for at least partially superimposing the light of the secondary light sources in the area of the exit plane of the light mixing device.
- this variant of a light mixing unit is preferably provided for the coherence degree range with the lowest degree of coherence, where the illuminated areas in the area of the honeycomb condenser also have only small diameters, such light mixing devices can have a relatively small, slim size transversely to the optical axis, which makes the installation in a light mixer changing device facilitates.
- the first and the second raster arrangement can each be formed by microlens arrays, which can be produced inexpensively, for example, by lithography.
- the miniaturization can ensure that even with the smallest degrees of coherence and correspondingly small illuminated areas of the
- Honeycomb condenser is available for a mixture sufficient number of fully illuminated optical channels.
- At least one scattering element with a suitable scattering angle distribution for example a diffusing screen or a diffractive optical element of comparable effect, is inserted into the beam path behind the rod integrator, for example directly at its exit surface or slightly axially offset from it.
- the plot can be “smeared”, that is, the intensity distribution in the pupil can be evened out.
- the scattering element can either be permanently installed or exchangeable, and the light mixing device can be reconfigured between configurations belonging to different coherence degree ranges by means of an exchangeable scattering element If necessary, the use of such scattering elements can be dispensed with to make the first optical system switchable.
- FIG. 1 shows a schematic overview of an embodiment of an illumination system according to the invention for a microlithography projection exposure system
- FIG. 2 shows a schematic perspective illustration of an embodiment of a light mixing device with a slide that can be moved transversely to the optical axis;
- FIG 3 shows a first embodiment of a second light mixing unit, which is optimized for small degrees of coherence
- FIG. 4 shows a second embodiment of a second light mixing unit, which is optimized for small degrees of coherence.
- an illumination system 1 of a microlithographic projection exposure system which can be used in the production of semiconductor components and other finely structured components and which works with light from the deep ultraviolet range in order to achieve resolutions down to fractions of a micrometer.
- An F 2 excimer laser with a working wavelength of approximately 157 nm is used as the light source 2, the light beam of which is aligned coaxially with the optical axis 3 of the lighting system.
- Other UV light Sources for example ArF excimer lasers with a working wavelength of 193nm, KrF excimer lasers with a working wavelength of 248nm or mercury vapor lamps with a working wavelength of 368nm or 436nm or light sources with wavelengths below 157nm are also possible.
- the light from the light source 2 first enters a beam expander 4, which can be designed, for example, as a mirror arrangement according to DE 41 24 31 1 and is used to reduce coherence and enlarge the beam cross section.
- a beam expander 4 which can be designed, for example, as a mirror arrangement according to DE 41 24 31 1 and is used to reduce coherence and enlarge the beam cross section.
- An optionally provided closure is replaced in the embodiment shown by a corresponding pulse control of the laser 2.
- a first diffractive, optical raster element 5 serving as a beam shaping element is arranged in the object plane 6 of an objective 7 arranged behind it in the beam path, in the image plane 8 or exit pupil of which a refractive second optical raster element 9 is arranged, which also serves as a beam shaping element.
- a coupling optics 10 arranged behind it transmits the light to the entrance plane 11 of a light mixing device 12 which mixes and homogenizes the light passing through.
- a reticle / masking system (REMA) 14 is arranged, which serves as an adjustable field diaphragm.
- the subsequent lens 15 images the intermediate field level with the masking system 14 on reticle 16 (mask, lithography template) and contains a first lens group 17, an intermediate pupil plane 18 into which filters or diaphragms can be introduced, a second and a third lens group 19 or 20 and in between a deflection mirror 21, which makes it possible to install the large lighting device (approx.
- this lighting system forms a projection exposure system for the microlithographic production of electronic components, but also of optically diffractive elements and other microstructured elements Divide.
- the optical elements or assemblies 4, 5, 7, 9 or 9 'and 10 between the light source and the light mixing device form a first optical system 30 for receiving light from the light source 2 and for generating a predeterminable light distribution in the entry plane of the light mixing device.
- the design of the parts upstream of the light mixing device 12, in particular of the optical raster elements 5 and 9, is selected such that a rectangular entry surface of the light mixing device is illuminated largely homogeneously and with the highest possible efficiency, that is to say without significant loss of light next to the entry surface.
- the parallel light beam coming from the beam expander 4 with a rectangular cross section and a non-rotationally symmetrical divergence is first changed by the first diffractive raster element 5 with the introduction of light conductance with regard to divergence and shape.
- the first raster element 5 has a multiplicity of hexagonal cells which generate an angular distribution of this shape.
- elements are preferred which introduce an aperture from the range 0.020 ⁇ NA ⁇ 0.027. With significantly lower apertures, there is a risk that possible divergence asymmetries in the incident radiation will be noticeable in the exit-side angular distribution. Significantly larger apertures can lead to overfill of the rod entry and thus to loss of light.
- the second optical raster element 9 is arranged here, which in the example is designed as a refractive optical element with a rectangular radiation characteristic.
- This beam shaping element generates the main part of the light conductance and adapts the light conductance to the field size, that is to say to the rectangular shape of the entry surface of the light mixing device 12, via the coupling optics 10.
- the structure of the previously described lighting system with the exception of the light mixing device can correspond, for example, to the structure described in EP 0 747 772, the disclosure content of which is made the content of this description by reference.
- the first optical system 30 is assigned a beam shaping changing device 40, which makes it possible to exchange the beam shaping elements 9 which serve to illuminate the field at the entrance of the light mixing device.
- a beam shaping changing device 40 which makes it possible to exchange the beam shaping elements 9 which serve to illuminate the field at the entrance of the light mixing device.
- the beam shaping element 9 can have a larger numerical aperture on the output side than the raster element 9 'provided for smaller ⁇ values.
- a reduction in the numerical aperture of the beam shaping element 9 alone is normally not sufficient to reach the range of very small ⁇ values without sacrificing the optical performance.
- a reduction in the numerical aperture of the beam shaping elements 9 alone would initially only lead to a reduction in the area illuminated at the entrance to the light mixing device.
- the field size would remain unchanged in the exit plane 13 or the optically conjugated reticle plane itself.
- light-free areas in the illuminating pupil would be enlarged due to rod underfilling (division of the pupil).
- the light mixing device 12 can be switched between two configurations, the first configuration corresponding to a first coherence degree range (for example the conventionally achievable coherence degree range (0.20-0.25) ⁇ ⁇ 1), while the second coherence degree range overlaps with the first coherence degree the area of smallest settings is enough.
- the light mixing device 12 has two independently operating light mixing units 40, 50, which are arranged in a common holder 51 parallel to one another and to the optical axis 3 and with the aid of a carriage 52 optionally transversely to the optical axis in the region the optical axis 3 are movable.
- the first light mixing unit 40 is formed by an integrator rod 41, the dimensions of which can correspond to the integrator rod of a comparable conventional lighting device.
- the integrator rod 41 has a length measured between the rectangular entry surface 42 and the rectangular exit surface 43, which corresponds to the distance between the entry plane and the exit plane of the light mixing device 12. If the light mixing device is operated in a first configuration, which corresponds to the coherence degree range with larger ⁇ values, this large light mixing rod can be centered around the optical axis, so that its entry surface coincides with the entry plane and its exit surface coincides with the exit plane of the light mixing device.
- the integrator rod 40 can be moved out of the region of the optical axis 3 by moving the carriage and the second light mixing unit 50 optimized for smaller ⁇ values can be moved in the region of the optical axis.
- the second light mixing unit 50 ′ has a second integrator rod 60, the cross section and length of which are reduced compared to the first integrator rod 41.
- the dimensions of the shorter and slimmer integrator rod 60 are designed such that the integrator rod is well filled in spite of the smaller numerical aperture of the associated upstream beam shaping element 9 '.
- the rectangular cross section is dimensioned such that it essentially corresponds to the field size generated by the associated raster element 9 'in the entrance plane 11 of the light mixing device.
- An afocal imaging lens 64 is arranged behind the integrator bar 60, which optically adjusts the bar outlet 63
- Magnification of the imaging optics 63 for example by a factor in the range of two, produces the size of the rectangular illumination field that is also achieved with the larger integrator rod 41.
- the magnifying imaging scale of the imaging optics 64 accordingly corresponds to the size ratio of the cross sections of the long one
- the light mixing device maintains the light conductance value at the
- the replacement of the raster element 9 'provided for small ⁇ values essentially reduces the size of the area illuminated in the entry surface of the light mixing device, while the reduction in the numerical aperture essentially reduces the enlarged image of the rod exit 63 in the exit plane 14 of the light mixing device.
- the light mixing unit 50 is designed as a honeycomb condenser arrangement (fly eyes integrator). It comprises a condenser lens 71, a grid arrangement 72 of first grid elements arranged at a distance behind it, a grid arrangement 73 of second grid elements arranged behind it and a field lens 74 arranged at a distance behind it.
- the first grid arrangement 72 is at a distance 2f behind the entrance plane 11 of the light mixing device , where f is the focal length of the condenser lens 71.
- the first raster arrangement 72 lies in a plane Fourier-transformed to the entry plane 11.
- the first raster arrangement 72 generates a raster arrangement of secondary light sources from the incident light, the number of which corresponds to the number of illuminated first raster elements 75.
- the shape of the first raster elements should essentially correspond to the shape of the field to be illuminated in the exit plane 13 of the light mixing device. They are therefore also called field honeycombs and are rectangular in the example.
- the subsequent second raster arrangement 73 serves to map the first raster elements 75 into the illumination surface 13 which contains the illumination field and to thereby overlay the light from the secondary light sources in the illumination field. This creates a light mix reached.
- the second raster elements 76 are often referred to as pupil honeycombs.
- the first and second raster elements are assigned to one another in pairs and form a number of optical channels, the different light intensities of which are superimposed in the lighting field in the sense of homogenizing the intensity distribution with the aid of the field lens 74.
- this embodiment of the second light mixing unit 50 is preferably provided for the second coherence degree range with small ⁇ values and accordingly the beam cross section in the region of the light mixing unit is relatively small, the diameters of all optical components of the honeycomb condenser light mixing device 50" can be kept small, so that an exchange with a similarly sized rod integrator is possible without significant modifications to the installation environment.
- the honeycomb condenser can be manufactured from two microlens arrays 72, 73, so that even with illuminated areas of only a small diameter, good light mixing can be achieved by illuminating a sufficient number of “optical channels”.
- the beamformer changing device 40 and the light mixing device 12 are controlled by a common control device 80, which coordinates the exchange of the raster elements 9 of the first optical system 30 and the change between different light mixing units in such a way that for each light distribution provided by the optical system 30 in the corresponding adapted light mixing unit is provided in the entry level 11 of the light mixing device by moving the slide 52 in a short time, usually within a few seconds, in the correct position with high positioning accuracy.
- a major advantage of this and comparable embodiments of the invention is that the insertion of the embodiments or comparable arrangements shown in FIG. 3 or 4 does not require a complete optical or mechanical re-design of the lighting device.
- existing lighting systems of the type described at the outset can be modified by installing corresponding changeover devices for the raster elements 9, 9 ′ and the light mixing device, and, if appropriate, for the raster elements 5 in such a way that the range of the smallest ⁇ values can also be set.
- This makes it possible, based on a lighting system platform, to provide either systems with or without the possibility of achieving ultra-small ⁇ values, depending on the requirements of the end user.
- the same integrator rod (see rod 41) with a large cross section can be used as the light mixer both for large settings of conventional systems and for ultra-small ⁇ values.
- the same integrator rod (see rod 41) with a large cross section can be used as the light mixer both for large settings of conventional systems and for ultra-small ⁇ values.
- E.g. By setting the first optical system and / or by inserting an aperture-limiting diaphragm in a plane 18 transformed to the reticle plane Fourier-transformed (pupil plane of the ReMa objective 15), this can lead to underfilling of the rod and an associated marked division of the illumination pupil , This can result in unacceptable system properties regarding ellipticity across the field or uniformity.
- At least one scattering element with a suitable scattering angle distribution for example a diffusing screen 90 (FIG. 1) or a diffractive optical element, behind the rod integrator, for example directly on its exit surface or slightly offset axially to this comparable effect, is used in the beam path.
- a diffusing screen 90 FIG. 1
- a diffractive optical element behind the rod integrator, for example directly on its exit surface or slightly offset axially to this comparable effect, is used in the beam path.
- the plot can be “smeared”, that is, the intensity distribution in the pupil can be made more uniform.
- the diffusing screen can be permanently installed or exchangeable, and can optionally also be inserted between the ReMa blades 14 and the entrance of the objective 15.
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Microscoopes, Condenser (AREA)
Abstract
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
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JP2006505396A JP2006526276A (ja) | 2003-05-12 | 2004-05-07 | マイクロリソグラフィー投影露光装置用照明系 |
US11/271,844 US20060126049A1 (en) | 2003-05-12 | 2005-11-14 | Illumination system for a microlithography projection exposure apparatus |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10322393.2 | 2003-05-12 | ||
DE10322393A DE10322393A1 (de) | 2003-05-12 | 2003-05-12 | Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
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US11/271,844 Continuation US20060126049A1 (en) | 2003-05-12 | 2005-11-14 | Illumination system for a microlithography projection exposure apparatus |
Publications (2)
Publication Number | Publication Date |
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WO2004099873A2 true WO2004099873A2 (de) | 2004-11-18 |
WO2004099873A3 WO2004099873A3 (de) | 2005-06-09 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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PCT/EP2004/004875 WO2004099873A2 (de) | 2003-05-12 | 2004-05-07 | Beleuchtungssystem für eine mikrolithographie-projektionsbelichtungsanlage |
Country Status (5)
Country | Link |
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US (1) | US20060126049A1 (de) |
JP (1) | JP2006526276A (de) |
KR (1) | KR20060015246A (de) |
DE (1) | DE10322393A1 (de) |
WO (1) | WO2004099873A2 (de) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102006038455A1 (de) | 2006-08-16 | 2008-02-21 | Carl Zeiss Smt Ag | Optisches System für die Halbleiterlithographie |
WO2008086827A1 (en) | 2007-01-16 | 2008-07-24 | Carl Zeiss Smt Ag | Projection exposure method and projection exposure system therefor |
US8115904B2 (en) * | 2008-05-30 | 2012-02-14 | Corning Incorporated | Illumination system for sizing focused spots of a patterning system for maskless lithography |
EP2942775A3 (de) | 2011-04-19 | 2015-12-30 | Koninklijke Philips N.V. | Lichtausgabeplatte und Vorrichtung damit |
DE102016100804A1 (de) | 2016-01-19 | 2017-07-20 | Gom Gmbh | Beleuchtungsvorrichtung |
DE102018201010A1 (de) * | 2018-01-23 | 2019-07-25 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Projektionslithographie |
DE102018201009A1 (de) * | 2018-01-23 | 2019-07-25 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Projektionslithographie |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6078380A (en) * | 1991-10-08 | 2000-06-20 | Nikon Corporation | Projection exposure apparatus and method involving variation and correction of light intensity distributions, detection and control of imaging characteristics, and control of exposure |
US6259512B1 (en) * | 1997-08-04 | 2001-07-10 | Canon Kabushiki Kaisha | Illumination system and exposure apparatus having the same |
US20020085276A1 (en) * | 2000-11-29 | 2002-07-04 | Nikon Corporation | Illumination optical apparatus and exposure apparatus provided with illumination optical apparatus |
US20020109827A1 (en) * | 1996-06-04 | 2002-08-15 | Nikon Corporation | Exposure apparatus and method |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4124311A1 (de) * | 1991-07-23 | 1993-01-28 | Zeiss Carl Fa | Anordnung zur kohaerenzreduktion und strahlformung eines laserstrahls |
JP3304378B2 (ja) * | 1992-02-25 | 2002-07-22 | 株式会社ニコン | 投影露光装置、及び素子製造方法 |
US6392742B1 (en) * | 1999-06-01 | 2002-05-21 | Canon Kabushiki Kaisha | Illumination system and projection exposure apparatus |
JP2002359176A (ja) * | 2001-05-31 | 2002-12-13 | Canon Inc | 照明装置、照明制御方法、露光装置、デバイス製造方法及びデバイス |
-
2003
- 2003-05-12 DE DE10322393A patent/DE10322393A1/de not_active Withdrawn
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2004
- 2004-05-07 KR KR1020057021596A patent/KR20060015246A/ko not_active Application Discontinuation
- 2004-05-07 JP JP2006505396A patent/JP2006526276A/ja active Pending
- 2004-05-07 WO PCT/EP2004/004875 patent/WO2004099873A2/de active Application Filing
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2005
- 2005-11-14 US US11/271,844 patent/US20060126049A1/en not_active Abandoned
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6078380A (en) * | 1991-10-08 | 2000-06-20 | Nikon Corporation | Projection exposure apparatus and method involving variation and correction of light intensity distributions, detection and control of imaging characteristics, and control of exposure |
US20020109827A1 (en) * | 1996-06-04 | 2002-08-15 | Nikon Corporation | Exposure apparatus and method |
US6259512B1 (en) * | 1997-08-04 | 2001-07-10 | Canon Kabushiki Kaisha | Illumination system and exposure apparatus having the same |
US20020085276A1 (en) * | 2000-11-29 | 2002-07-04 | Nikon Corporation | Illumination optical apparatus and exposure apparatus provided with illumination optical apparatus |
Also Published As
Publication number | Publication date |
---|---|
WO2004099873A3 (de) | 2005-06-09 |
US20060126049A1 (en) | 2006-06-15 |
JP2006526276A (ja) | 2006-11-16 |
DE10322393A1 (de) | 2004-12-02 |
KR20060015246A (ko) | 2006-02-16 |
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