JPH11274050A - 露光装置およびデバイス製造方法 - Google Patents

露光装置およびデバイス製造方法

Info

Publication number
JPH11274050A
JPH11274050A JP10077345A JP7734598A JPH11274050A JP H11274050 A JPH11274050 A JP H11274050A JP 10077345 A JP10077345 A JP 10077345A JP 7734598 A JP7734598 A JP 7734598A JP H11274050 A JPH11274050 A JP H11274050A
Authority
JP
Japan
Prior art keywords
exposure apparatus
ozone
exposure
substrate
wavelength
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP10077345A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11274050A5 (enExample
Inventor
Yoshinori Miwa
良則 三輪
Yukio Yamane
幸男 山根
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP10077345A priority Critical patent/JPH11274050A/ja
Priority to US09/274,112 priority patent/US6590631B2/en
Publication of JPH11274050A publication Critical patent/JPH11274050A/ja
Priority to US10/407,236 priority patent/US6762822B2/en
Publication of JPH11274050A5 publication Critical patent/JPH11274050A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP10077345A 1998-03-25 1998-03-25 露光装置およびデバイス製造方法 Withdrawn JPH11274050A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP10077345A JPH11274050A (ja) 1998-03-25 1998-03-25 露光装置およびデバイス製造方法
US09/274,112 US6590631B2 (en) 1998-03-25 1999-03-23 Exposure apparatus and device manufacturing method using the same
US10/407,236 US6762822B2 (en) 1998-03-25 2003-04-07 Exposure apparatus and manufacturing method using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10077345A JPH11274050A (ja) 1998-03-25 1998-03-25 露光装置およびデバイス製造方法

Publications (2)

Publication Number Publication Date
JPH11274050A true JPH11274050A (ja) 1999-10-08
JPH11274050A5 JPH11274050A5 (enExample) 2005-07-14

Family

ID=13631340

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10077345A Withdrawn JPH11274050A (ja) 1998-03-25 1998-03-25 露光装置およびデバイス製造方法

Country Status (2)

Country Link
US (2) US6590631B2 (enExample)
JP (1) JPH11274050A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000055891A1 (en) * 1999-03-12 2000-09-21 Nikon Corporation Exposure device, exposure method, and device manufacturing method
KR100463237B1 (ko) * 2000-06-28 2004-12-23 주식회사 하이닉스반도체 감광막패턴의 형성 방법
JP2007142020A (ja) * 2005-11-16 2007-06-07 Canon Inc 露光装置

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11274050A (ja) * 1998-03-25 1999-10-08 Canon Inc 露光装置およびデバイス製造方法
KR100733128B1 (ko) * 2002-02-01 2007-06-27 에이에스엠엘 네델란즈 비.브이. 리소그래피장치 및 디바이스 제조방법

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4999671A (en) * 1986-07-11 1991-03-12 Canon Kabushiki Kaisha Reticle conveying device
US5166530A (en) * 1991-12-20 1992-11-24 General Signal Corporation Illuminator for microlithographic integrated circuit manufacture
US5430303A (en) * 1992-07-01 1995-07-04 Nikon Corporation Exposure apparatus
JP3031790B2 (ja) * 1992-12-10 2000-04-10 キヤノン株式会社 半導体製造装置
JP3084332B2 (ja) 1993-01-19 2000-09-04 キヤノン株式会社 露光装置
US5559584A (en) * 1993-03-08 1996-09-24 Nikon Corporation Exposure apparatus
JP3412193B2 (ja) * 1993-06-29 2003-06-03 株式会社ニコン 露光装置
BE1007907A3 (nl) * 1993-12-24 1995-11-14 Asm Lithography Bv Lenzenstelsel met in gasgevulde houder aangebrachte lenselementen en fotolithografisch apparaat voorzien van een dergelijk stelsel.
KR970067591A (ko) * 1996-03-04 1997-10-13 오노 시게오 투영노광장치
JP3218425B2 (ja) * 1996-03-25 2001-10-15 東京エレクトロン株式会社 処理方法及び処理装置
JPH09270385A (ja) * 1996-03-29 1997-10-14 Nikon Corp 露光装置の環境制御装置
JPH1055944A (ja) * 1996-08-08 1998-02-24 Toshiba Corp パターン転写装置
JP3571471B2 (ja) * 1996-09-03 2004-09-29 東京エレクトロン株式会社 処理方法，塗布現像処理システム及び処理システム
US5980187A (en) * 1997-04-16 1999-11-09 Kla-Tencor Corporation Mechanism for transporting semiconductor-process masks
JPH11204396A (ja) * 1998-01-08 1999-07-30 Canon Inc 半導体製造システムおよびデバイス製造方法
JPH11274050A (ja) * 1998-03-25 1999-10-08 Canon Inc 露光装置およびデバイス製造方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000055891A1 (en) * 1999-03-12 2000-09-21 Nikon Corporation Exposure device, exposure method, and device manufacturing method
US6842221B1 (en) 1999-03-12 2005-01-11 Nikon Corporation Exposure apparatus and exposure method, and device manufacturing method
KR100463237B1 (ko) * 2000-06-28 2004-12-23 주식회사 하이닉스반도체 감광막패턴의 형성 방법
JP2007142020A (ja) * 2005-11-16 2007-06-07 Canon Inc 露光装置

Also Published As

Publication number Publication date
US6590631B2 (en) 2003-07-08
US20020145710A1 (en) 2002-10-10
US6762822B2 (en) 2004-07-13
US20030169408A1 (en) 2003-09-11

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