JPH11160244A - マクロ検査装置 - Google Patents
マクロ検査装置Info
- Publication number
- JPH11160244A JPH11160244A JP32922697A JP32922697A JPH11160244A JP H11160244 A JPH11160244 A JP H11160244A JP 32922697 A JP32922697 A JP 32922697A JP 32922697 A JP32922697 A JP 32922697A JP H11160244 A JPH11160244 A JP H11160244A
- Authority
- JP
- Japan
- Prior art keywords
- connecting portion
- semiconductor wafer
- wafer
- macro inspection
- shaft
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007689 inspection Methods 0.000 claims abstract description 56
- 235000012431 wafers Nutrition 0.000 abstract description 100
- 230000008878 coupling Effects 0.000 abstract 7
- 238000010168 coupling process Methods 0.000 abstract 7
- 238000005859 coupling reaction Methods 0.000 abstract 7
- 239000004065 semiconductor Substances 0.000 description 66
- 230000007246 mechanism Effects 0.000 description 9
- 238000010586 diagram Methods 0.000 description 8
- 230000033001 locomotion Effects 0.000 description 5
- 230000007547 defect Effects 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000032258 transport Effects 0.000 description 2
- 125000002066 L-histidyl group Chemical group [H]N1C([H])=NC(C([H])([H])[C@](C(=O)[*])([H])N([H])[H])=C1[H] 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000009429 electrical wiring Methods 0.000 description 1
- 210000004247 hand Anatomy 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000007723 transport mechanism Effects 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
- 210000000707 wrist Anatomy 0.000 description 1
Landscapes
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32922697A JPH11160244A (ja) | 1997-11-28 | 1997-11-28 | マクロ検査装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP32922697A JPH11160244A (ja) | 1997-11-28 | 1997-11-28 | マクロ検査装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11160244A true JPH11160244A (ja) | 1999-06-18 |
| JPH11160244A5 JPH11160244A5 (enExample) | 2005-07-21 |
Family
ID=18219068
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP32922697A Pending JPH11160244A (ja) | 1997-11-28 | 1997-11-28 | マクロ検査装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11160244A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004524709A (ja) * | 2001-04-28 | 2004-08-12 | ライカ マイクロシステムス イェーナ ゲゼルシャフト ミット ベシュレンクテル ハフツング | ウェーハ用保持装置 |
| JP2010237048A (ja) * | 2009-03-31 | 2010-10-21 | Advanced Mask Inspection Technology Kk | パターン検査装置およびパターン検査方法 |
-
1997
- 1997-11-28 JP JP32922697A patent/JPH11160244A/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004524709A (ja) * | 2001-04-28 | 2004-08-12 | ライカ マイクロシステムス イェーナ ゲゼルシャフト ミット ベシュレンクテル ハフツング | ウェーハ用保持装置 |
| JP2010237048A (ja) * | 2009-03-31 | 2010-10-21 | Advanced Mask Inspection Technology Kk | パターン検査装置およびパターン検査方法 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20041129 |
|
| A621 | Written request for application examination |
Effective date: 20041129 Free format text: JAPANESE INTERMEDIATE CODE: A621 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20060113 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20060124 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20060327 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20060509 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20061003 |