JPH11116398A5 - - Google Patents
Info
- Publication number
- JPH11116398A5 JPH11116398A5 JP1997282223A JP28222397A JPH11116398A5 JP H11116398 A5 JPH11116398 A5 JP H11116398A5 JP 1997282223 A JP1997282223 A JP 1997282223A JP 28222397 A JP28222397 A JP 28222397A JP H11116398 A5 JPH11116398 A5 JP H11116398A5
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- silicon carbide
- producing
- single crystal
- crystal according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28222397A JP4122548B2 (ja) | 1997-10-15 | 1997-10-15 | 炭化珪素単結晶の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28222397A JP4122548B2 (ja) | 1997-10-15 | 1997-10-15 | 炭化珪素単結晶の製造方法 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008015928A Division JP4819069B2 (ja) | 2008-01-28 | 2008-01-28 | 炭化珪素単結晶の製造方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JPH11116398A JPH11116398A (ja) | 1999-04-27 |
JPH11116398A5 true JPH11116398A5 (enrdf_load_html_response) | 2005-03-17 |
JP4122548B2 JP4122548B2 (ja) | 2008-07-23 |
Family
ID=17649670
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP28222397A Expired - Lifetime JP4122548B2 (ja) | 1997-10-15 | 1997-10-15 | 炭化珪素単結晶の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4122548B2 (enrdf_load_html_response) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6547877B2 (en) * | 1996-01-22 | 2003-04-15 | The Fox Group, Inc. | Tantalum crucible fabrication and treatment |
US6562130B2 (en) * | 1997-01-22 | 2003-05-13 | The Fox Group, Inc. | Low defect axially grown single crystal silicon carbide |
US6537371B2 (en) * | 1997-01-22 | 2003-03-25 | The Fox Group, Inc. | Niobium crucible fabrication and treatment |
JP4691292B2 (ja) * | 1999-07-07 | 2011-06-01 | エスアイクリスタル アクチエンゲゼルシャフト | SiC種結晶の外周壁を有する種結晶ホルダ |
EP1200650B1 (de) | 1999-07-07 | 2003-04-09 | Siemens Aktiengesellschaft | Vorrichtung zur sublimationszüchtung eines sic-einkristalls mit folienausgekleidetem tiegel |
US6562131B2 (en) * | 1999-07-20 | 2003-05-13 | The Fox Group, Inc. | Method for growing single crystal silicon carbide |
US6824611B1 (en) * | 1999-10-08 | 2004-11-30 | Cree, Inc. | Method and apparatus for growing silicon carbide crystals |
US6514338B2 (en) * | 1999-12-27 | 2003-02-04 | Showa Denko Kabushiki Kaisha | Method and apparatus for producing silicon carbide single crystal |
US7056383B2 (en) | 2004-02-13 | 2006-06-06 | The Fox Group, Inc. | Tantalum based crucible |
JP2006001787A (ja) * | 2004-06-17 | 2006-01-05 | Hitachi Chem Co Ltd | フッ化カルシウム結晶育成ルツボ、フッ化カルシウム結晶の製造方法及びフッ化カルシウム結晶 |
JP4522898B2 (ja) * | 2005-03-25 | 2010-08-11 | 日本碍子株式会社 | 単結晶製造装置 |
EP2037011B1 (en) | 2006-06-16 | 2012-09-05 | Sumitomo Electric Industries, Ltd. | Method of growing a single crystal of nitride of group iii element |
JP2008120617A (ja) * | 2006-11-09 | 2008-05-29 | Bridgestone Corp | 炭化珪素単結晶の製造方法 |
JP5213096B2 (ja) * | 2007-03-23 | 2013-06-19 | 学校法人関西学院 | 単結晶炭化ケイ素の液相エピタキシャル成長方法、単結晶炭化ケイ素基板の製造方法、及び単結晶炭化ケイ素基板 |
JP5163445B2 (ja) * | 2008-11-25 | 2013-03-13 | 住友電気工業株式会社 | 結晶製造方法 |
US8535600B2 (en) | 2009-03-23 | 2013-09-17 | Kabushiki Kaisha Toyota Chuo Kenkyusho | High temperature-resistant article, method for producing the same, and high temperature-resistant adhesive |
CN107739209A (zh) * | 2011-08-05 | 2018-02-27 | 科卢斯博知识产权有限公司 | 坩埚材料 |
JP5548174B2 (ja) * | 2011-09-12 | 2014-07-16 | 東洋炭素株式会社 | PIT炭素芯TaCチューブの製造方法、及び、PIT炭素芯TaCチューブ |
JP2013189355A (ja) * | 2012-03-15 | 2013-09-26 | Sumitomo Electric Ind Ltd | 炭化珪素単結晶の製造方法および製造装置 |
JP5549722B2 (ja) * | 2012-10-26 | 2014-07-16 | 住友電気工業株式会社 | 結晶製造方法 |
CN108070909A (zh) * | 2016-11-17 | 2018-05-25 | 上海新昇半导体科技有限公司 | 坩埚、坩埚的制备方法及4H-SiC晶体的生长方法 |
KR102675266B1 (ko) | 2017-12-04 | 2024-06-14 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 탄화탄탈 피복 탄소 재료 및 그 제조 방법, 반도체 단결정 제조 장치용 부재 |
JP6609300B2 (ja) * | 2017-12-21 | 2019-11-20 | 國家中山科學研究院 | 特定形状の炭化ケイ素の育成装置 |
CN113122921A (zh) * | 2020-06-05 | 2021-07-16 | 北京世纪金光半导体有限公司 | 一种生长低碳包裹物大尺寸高纯单晶的装置及方法 |
CN116695089B (zh) * | 2023-08-09 | 2023-10-24 | 通威微电子有限公司 | 中继环碳化钽镀膜装置和方法 |
-
1997
- 1997-10-15 JP JP28222397A patent/JP4122548B2/ja not_active Expired - Lifetime
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