JPH1110048A - 塗布装置および塗布方法 - Google Patents
塗布装置および塗布方法Info
- Publication number
- JPH1110048A JPH1110048A JP16296697A JP16296697A JPH1110048A JP H1110048 A JPH1110048 A JP H1110048A JP 16296697 A JP16296697 A JP 16296697A JP 16296697 A JP16296697 A JP 16296697A JP H1110048 A JPH1110048 A JP H1110048A
- Authority
- JP
- Japan
- Prior art keywords
- coating liquid
- coating
- substrate
- nozzle
- gap
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 426
- 239000011248 coating agent Substances 0.000 title claims abstract description 416
- 239000007788 liquid Substances 0.000 claims abstract description 395
- 239000000758 substrate Substances 0.000 claims abstract description 204
- 230000009471 action Effects 0.000 claims description 25
- 238000013459 approach Methods 0.000 claims description 16
- 238000009825 accumulation Methods 0.000 abstract 3
- 239000010408 film Substances 0.000 description 38
- 238000000926 separation method Methods 0.000 description 26
- 230000007246 mechanism Effects 0.000 description 18
- 238000010586 diagram Methods 0.000 description 11
- 238000000034 method Methods 0.000 description 10
- 230000000630 rising effect Effects 0.000 description 8
- 229910000831 Steel Inorganic materials 0.000 description 7
- 239000010959 steel Substances 0.000 description 7
- 238000004891 communication Methods 0.000 description 6
- 238000004528 spin coating Methods 0.000 description 6
- 239000002245 particle Substances 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 5
- 238000011109 contamination Methods 0.000 description 4
- 238000007599 discharging Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000009434 installation Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 230000000149 penetrating effect Effects 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 238000012790 confirmation Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 101100524645 Toxoplasma gondii ROM5 gene Proteins 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000001174 ascending effect Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001846 repelling effect Effects 0.000 description 1
- 230000029058 respiratory gaseous exchange Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Landscapes
- Coating Apparatus (AREA)
- Liquid Crystal (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16296697A JPH1110048A (ja) | 1997-06-19 | 1997-06-19 | 塗布装置および塗布方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16296697A JPH1110048A (ja) | 1997-06-19 | 1997-06-19 | 塗布装置および塗布方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH1110048A true JPH1110048A (ja) | 1999-01-19 |
| JPH1110048A5 JPH1110048A5 (enExample) | 2004-12-09 |
Family
ID=15764669
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16296697A Pending JPH1110048A (ja) | 1997-06-19 | 1997-06-19 | 塗布装置および塗布方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH1110048A (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001113214A (ja) * | 1999-10-19 | 2001-04-24 | Casio Comput Co Ltd | 薄膜の形成方法、及び形成装置 |
| JP2013243262A (ja) * | 2012-05-21 | 2013-12-05 | Tokyo Electron Ltd | 塗布方法、塗布装置、及びコンピュータ可読記憶媒体 |
| CN119076315A (zh) * | 2024-11-08 | 2024-12-06 | 尚泰传感科技(南通)有限公司 | 一种压差传感器制造用注胶装置 |
-
1997
- 1997-06-19 JP JP16296697A patent/JPH1110048A/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001113214A (ja) * | 1999-10-19 | 2001-04-24 | Casio Comput Co Ltd | 薄膜の形成方法、及び形成装置 |
| JP2013243262A (ja) * | 2012-05-21 | 2013-12-05 | Tokyo Electron Ltd | 塗布方法、塗布装置、及びコンピュータ可読記憶媒体 |
| CN119076315A (zh) * | 2024-11-08 | 2024-12-06 | 尚泰传感科技(南通)有限公司 | 一种压差传感器制造用注胶装置 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A977 | Report on retrieval |
Effective date: 20060317 Free format text: JAPANESE INTERMEDIATE CODE: A971007 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20060704 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20060904 |
|
| A02 | Decision of refusal |
Effective date: 20061024 Free format text: JAPANESE INTERMEDIATE CODE: A02 |