JPH0733153Y2 - 表面分析装置 - Google Patents

表面分析装置

Info

Publication number
JPH0733153Y2
JPH0733153Y2 JP8213490U JP8213490U JPH0733153Y2 JP H0733153 Y2 JPH0733153 Y2 JP H0733153Y2 JP 8213490 U JP8213490 U JP 8213490U JP 8213490 U JP8213490 U JP 8213490U JP H0733153 Y2 JPH0733153 Y2 JP H0733153Y2
Authority
JP
Japan
Prior art keywords
axis
sample
coordinate data
sample surface
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP8213490U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0441654U (enrdf_load_stackoverflow
Inventor
清弘 小原
典顯 中西
秀人 古味
健俊 野地
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP8213490U priority Critical patent/JPH0733153Y2/ja
Publication of JPH0441654U publication Critical patent/JPH0441654U/ja
Application granted granted Critical
Publication of JPH0733153Y2 publication Critical patent/JPH0733153Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Analysing Materials By The Use Of Radiation (AREA)
JP8213490U 1990-07-31 1990-07-31 表面分析装置 Expired - Lifetime JPH0733153Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8213490U JPH0733153Y2 (ja) 1990-07-31 1990-07-31 表面分析装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8213490U JPH0733153Y2 (ja) 1990-07-31 1990-07-31 表面分析装置

Publications (2)

Publication Number Publication Date
JPH0441654U JPH0441654U (enrdf_load_stackoverflow) 1992-04-08
JPH0733153Y2 true JPH0733153Y2 (ja) 1995-07-31

Family

ID=31628677

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8213490U Expired - Lifetime JPH0733153Y2 (ja) 1990-07-31 1990-07-31 表面分析装置

Country Status (1)

Country Link
JP (1) JPH0733153Y2 (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH0441654U (enrdf_load_stackoverflow) 1992-04-08

Similar Documents

Publication Publication Date Title
CN107717211A (zh) 机器人系统和激光加工方法
JP2004257927A (ja) ３次元形状測定システムおよび３次元形状測定方法
JP2002257535A (ja) 位置測定装置
JP2003117778A (ja) 工作機械の精度測定装置
JP2004205288A (ja) 計測装置及びこれを備えた精度解析装置
JP2004085565A (ja) レーザ三次元デジタル化センサのキャリブレーション法およびキャリブレーション装置
JPH0733153Y2 (ja) 表面分析装置
JPH09304703A (ja) フォーカシング装置
JP4821987B2 (ja) Ｘ線ｃｔ装置
JPH08106873A (ja) 電子顕微鏡装置
JPH08300171A (ja) 三次元レーザ加工機における法線検出方法およびその装置
Chetwynd High-precision measurement of small balls
JP4045442B2 (ja) Ｘ線ｃｔ装置における回転中心軸の較正方法およびｘ線ｃｔ装置
JP3088516B2 (ja) Ｘ線回折測定方法及び装置
JPH08327332A (ja) クリームはんだ膜厚測定装置
JP4524345B2 (ja) 水平制御機構及びこの機構を備えたレーザー墨出し器
JP3299359B2 (ja) 傾斜角位置決め装置
JP3691524B2 (ja) 駆動装置
JPH0663819A (ja) 歯車検査装置
JP4132914B2 (ja) ワーク姿勢制御装置及びワーク姿勢制御方法、傾斜測定装置及びその測定動作方法
JP2951366B2 (ja) 干渉測定装置とそのアライメント検出方法
JP7470521B2 (ja) パラメータ取得装置とパラメータ取得方法
JP5220469B2 (ja) 荷電粒子ビーム装置の試料装置
US20240099677A1 (en) Position monitoring method and medical mobile x-ray device
JPH10103937A (ja) レーザー光の光軸傾斜測定方法及びその装置