JPH07280462A - 均熱セラミックスヒーター - Google Patents

均熱セラミックスヒーター

Info

Publication number
JPH07280462A
JPH07280462A JP6071787A JP7178794A JPH07280462A JP H07280462 A JPH07280462 A JP H07280462A JP 6071787 A JP6071787 A JP 6071787A JP 7178794 A JP7178794 A JP 7178794A JP H07280462 A JPH07280462 A JP H07280462A
Authority
JP
Japan
Prior art keywords
insulating layer
soaking
heater
ceramics heater
layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6071787A
Other languages
English (en)
Japanese (ja)
Inventor
Yoshihiro Kubota
芳宏 久保田
Hiroshi Mogi
弘 茂木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP6071787A priority Critical patent/JPH07280462A/ja
Priority to KR1019950008432A priority patent/KR950033389A/ko
Priority to US08/400,847 priority patent/US5643483A/en
Priority to TW084102241A priority patent/TW287348B/zh
Publication of JPH07280462A publication Critical patent/JPH07280462A/ja
Pending legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B3/00—Hearth-type furnaces, e.g. of reverberatory type; Electric arc furnaces ; Tank furnaces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/065—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thick film techniques, e.g. serigraphy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/003—Thick film resistors
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
    • H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible
    • H05B3/26—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base
    • H05B3/265—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base the insulating base being an inorganic material, e.g. ceramic
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/032—Heaters specially adapted for heating by radiation heating

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electromagnetism (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Resistance Heating (AREA)
  • Surface Heating Bodies (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Furnace Details (AREA)
JP6071787A 1994-04-11 1994-04-11 均熱セラミックスヒーター Pending JPH07280462A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP6071787A JPH07280462A (ja) 1994-04-11 1994-04-11 均熱セラミックスヒーター
KR1019950008432A KR950033389A (ko) 1994-04-11 1995-01-11 세라믹 히터 및 그의 제조방법
US08/400,847 US5643483A (en) 1994-04-11 1995-03-08 Ceramic heater made of fused silica glass having roughened surface
TW084102241A TW287348B (en, 2012) 1994-04-11 1995-03-09

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6071787A JPH07280462A (ja) 1994-04-11 1994-04-11 均熱セラミックスヒーター

Publications (1)

Publication Number Publication Date
JPH07280462A true JPH07280462A (ja) 1995-10-27

Family

ID=13470643

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6071787A Pending JPH07280462A (ja) 1994-04-11 1994-04-11 均熱セラミックスヒーター

Country Status (4)

Country Link
US (1) US5643483A (en, 2012)
JP (1) JPH07280462A (en, 2012)
KR (1) KR950033389A (en, 2012)
TW (1) TW287348B (en, 2012)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002083858A (ja) * 2000-06-26 2002-03-22 Kyocera Corp ウエハ加熱装置
US6835916B2 (en) 1999-08-09 2004-12-28 Ibiden, Co., Ltd Ceramic heater
US6884972B2 (en) 1999-12-09 2005-04-26 Ibiden Co., Ltd. Ceramic plate for a semiconductor producing/inspecting apparatus
JP2008042127A (ja) * 2006-08-10 2008-02-21 Dainippon Screen Mfg Co Ltd 熱処理装置および熱処理用サセプタ
JP2010278461A (ja) * 2000-06-26 2010-12-09 Kyocera Corp ウエハ加熱装置
US8071916B2 (en) 2004-06-28 2011-12-06 Kyocera Corporation Wafer heating apparatus and semiconductor manufacturing apparatus
JP2013145859A (ja) * 2011-12-16 2013-07-25 Stanley Electric Co Ltd 半導体製造装置

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998051127A1 (en) 1997-05-06 1998-11-12 Thermoceramix, L.L.C. Deposited resistive coatings
JP2987354B2 (ja) * 1997-12-26 1999-12-06 株式会社インターセントラル 遠赤外線暖房装置
EP1123344B1 (en) * 1998-07-15 2006-06-21 Thermon Manufacturing Company A heating cable
US6379492B2 (en) * 1998-10-31 2002-04-30 Applied Materials, Inc. Corrosion resistant coating
US6262401B1 (en) * 1998-12-30 2001-07-17 Aos Holding Company Gold-plated water heater element and method of making same
EP1187511A1 (en) * 1999-05-07 2002-03-13 Ibiden Co., Ltd. Hot plate and method of producing the same
JP2001118664A (ja) 1999-08-09 2001-04-27 Ibiden Co Ltd セラミックヒータ
WO2001011921A1 (fr) * 1999-08-09 2001-02-15 Ibiden Co., Ltd. Dispositif de chauffe en ceramique
US6222166B1 (en) * 1999-08-09 2001-04-24 Watlow Electric Manufacturing Co. Aluminum substrate thick film heater
US6350664B1 (en) * 1999-09-02 2002-02-26 Matsushita Electric Industrial Co., Ltd. Semiconductor device and method of manufacturing the same
EP1137321A1 (en) * 1999-11-30 2001-09-26 Ibiden Co., Ltd. Ceramic heater
US6433319B1 (en) * 2000-12-15 2002-08-13 Brian A. Bullock Electrical, thin film termination
US6674053B2 (en) 2001-06-14 2004-01-06 Trebor International Electrical, thin film termination
US7081602B1 (en) 2000-02-01 2006-07-25 Trebor International, Inc. Fail-safe, resistive-film, immersion heater
US6580061B2 (en) * 2000-02-01 2003-06-17 Trebor International Inc Durable, non-reactive, resistive-film heater
US6663914B2 (en) 2000-02-01 2003-12-16 Trebor International Method for adhering a resistive coating to a substrate
US6494955B1 (en) 2000-02-15 2002-12-17 Applied Materials, Inc. Ceramic substrate support
US6887316B2 (en) 2000-04-14 2005-05-03 Ibiden Co., Ltd. Ceramic heater
EP1463097A1 (en) * 2000-06-02 2004-09-29 Ibiden Co., Ltd. Hot plate unit
US6878906B2 (en) * 2000-08-30 2005-04-12 Ibiden Co., Ltd. Ceramic heater for semiconductor manufacturing and inspecting equipment
EP1345472A1 (en) * 2000-11-24 2003-09-17 Ibiden Co., Ltd. Ceramic heater, and production method for ceramic heater
EP1346607B1 (en) 2000-11-29 2012-07-25 Thermoceramix, LLC Resistive heaters and uses thereof
JP4837192B2 (ja) * 2001-06-26 2011-12-14 ローム株式会社 加熱ヒータおよびその加熱ヒータを備えた定着装置
US6730175B2 (en) 2002-01-22 2004-05-04 Applied Materials, Inc. Ceramic substrate support
US6825681B2 (en) * 2002-07-19 2004-11-30 Delta Design, Inc. Thermal control of a DUT using a thermal control substrate
US6991003B2 (en) * 2003-07-28 2006-01-31 M.Braun, Inc. System and method for automatically purifying solvents
EP1688017B1 (en) * 2003-11-20 2008-01-16 Koninklijke Philips Electronics N.V. Thin-film heating element
CN101409961B (zh) * 2007-10-10 2010-06-16 清华大学 面热光源,其制备方法及应用其加热物体的方法
FR2927218B1 (fr) * 2008-02-06 2010-03-05 Hydromecanique & Frottement Procede de fabrication d'un element chauffant par depot de couches minces sur un substrat isolant et l'element obtenu
US8240036B2 (en) 2008-04-30 2012-08-14 Panasonic Corporation Method of producing a circuit board
BRPI0907675A2 (pt) * 2008-05-01 2015-07-14 Thermoceramix Inc Utensílios de cozimento usando revestimentos térmicos
US9332642B2 (en) * 2009-10-30 2016-05-03 Panasonic Corporation Circuit board
US8929092B2 (en) 2009-10-30 2015-01-06 Panasonic Corporation Circuit board, and semiconductor device having component mounted on circuit board
DE102015119763A1 (de) 2015-11-16 2017-05-18 Heraeus Quarzglas Gmbh & Co. Kg Infrarotstrahler

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2105845A5 (en, 2012) * 1970-09-09 1972-04-28 Delog Detag Flachglas Ag
JPH0353055A (ja) * 1989-07-19 1991-03-07 Kobe Steel Ltd 表面にセラミックスを溶射した金属ロール
JPH0432183A (ja) * 1990-05-25 1992-02-04 Toshiba Lighting & Technol Corp 赤外線ヒータ
JPH04141947A (ja) * 1990-09-30 1992-05-15 Toshiba Lighting & Technol Corp セラミック放電ランプ
JP2936351B2 (ja) * 1990-11-29 1999-08-23 京セラ株式会社 セラミック部材と金属部材の接合体
JPH05182750A (ja) * 1991-12-28 1993-07-23 Rohm Co Ltd 加熱ヒータ
JPH05238853A (ja) * 1992-02-28 1993-09-17 Tokyo Electric Power Co Inc:The セラミックス基材の表面改質方法
JPH05338235A (ja) * 1992-06-10 1993-12-21 Kyocera Corp サーマルヘッド
JP3057670B2 (ja) * 1992-10-28 2000-07-04 信越化学工業株式会社 複層セラミックスヒーター
EP0601613A1 (en) * 1992-12-11 1994-06-15 Shin-Etsu Chemical Co., Ltd. Silicon solar cell

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6835916B2 (en) 1999-08-09 2004-12-28 Ibiden, Co., Ltd Ceramic heater
US6884972B2 (en) 1999-12-09 2005-04-26 Ibiden Co., Ltd. Ceramic plate for a semiconductor producing/inspecting apparatus
JP2002083858A (ja) * 2000-06-26 2002-03-22 Kyocera Corp ウエハ加熱装置
JP2010278461A (ja) * 2000-06-26 2010-12-09 Kyocera Corp ウエハ加熱装置
US8071916B2 (en) 2004-06-28 2011-12-06 Kyocera Corporation Wafer heating apparatus and semiconductor manufacturing apparatus
US8519309B2 (en) 2004-06-28 2013-08-27 Kyocera Corporation Wafer heating apparatus and semiconductor manufacturing apparatus
JP2008042127A (ja) * 2006-08-10 2008-02-21 Dainippon Screen Mfg Co Ltd 熱処理装置および熱処理用サセプタ
US8355624B2 (en) 2006-08-10 2013-01-15 Dainippon Screen Mfg. Co., Ltd. Susceptor for heat treatment and heat treatment apparatus
JP2013145859A (ja) * 2011-12-16 2013-07-25 Stanley Electric Co Ltd 半導体製造装置

Also Published As

Publication number Publication date
US5643483A (en) 1997-07-01
TW287348B (en, 2012) 1996-10-01
KR950033389A (ko) 1995-12-26

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