JPH067043B2 - 位置検出方法 - Google Patents

位置検出方法

Info

Publication number
JPH067043B2
JPH067043B2 JP58239392A JP23939283A JPH067043B2 JP H067043 B2 JPH067043 B2 JP H067043B2 JP 58239392 A JP58239392 A JP 58239392A JP 23939283 A JP23939283 A JP 23939283A JP H067043 B2 JPH067043 B2 JP H067043B2
Authority
JP
Japan
Prior art keywords
mark
output
detection
position detection
conversion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58239392A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60129604A (ja
Inventor
光雄 田畑
信男 渋谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP58239392A priority Critical patent/JPH067043B2/ja
Priority to GB08431533A priority patent/GB2151778B/en
Priority to US06/681,491 priority patent/US4642468A/en
Priority to DE19843446181 priority patent/DE3446181A1/de
Publication of JPS60129604A publication Critical patent/JPS60129604A/ja
Publication of JPH067043B2 publication Critical patent/JPH067043B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Transform (AREA)
JP58239392A 1983-12-19 1983-12-19 位置検出方法 Expired - Lifetime JPH067043B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP58239392A JPH067043B2 (ja) 1983-12-19 1983-12-19 位置検出方法
GB08431533A GB2151778B (en) 1983-12-19 1984-12-13 Detecting the relaive positions of two members
US06/681,491 US4642468A (en) 1983-12-19 1984-12-13 Position detecting method for detecting the relative positions of the first and second members
DE19843446181 DE3446181A1 (de) 1983-12-19 1984-12-18 Verfahren zum bestimmen der relativlage zwischen zwei teilen

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58239392A JPH067043B2 (ja) 1983-12-19 1983-12-19 位置検出方法

Publications (2)

Publication Number Publication Date
JPS60129604A JPS60129604A (ja) 1985-07-10
JPH067043B2 true JPH067043B2 (ja) 1994-01-26

Family

ID=17044098

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58239392A Expired - Lifetime JPH067043B2 (ja) 1983-12-19 1983-12-19 位置検出方法

Country Status (4)

Country Link
US (1) US4642468A (en, 2012)
JP (1) JPH067043B2 (en, 2012)
DE (1) DE3446181A1 (en, 2012)
GB (1) GB2151778B (en, 2012)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4861162A (en) * 1985-05-16 1989-08-29 Canon Kabushiki Kaisha Alignment of an object
JP2526546B2 (ja) * 1986-04-21 1996-08-21 日本電気株式会社 位置合わせ装置
JPH0810123B2 (ja) * 1986-09-12 1996-01-31 株式会社ニコン 光学装置
US4780616A (en) * 1986-09-25 1988-10-25 Nippon Kogaku K. K. Projection optical apparatus for mask to substrate alignment
US4769534A (en) * 1986-11-17 1988-09-06 Tektronix, Inc. Optical detector with storage effects reduction
GB8727963D0 (en) * 1987-11-30 1988-01-06 Atomic Energy Authority Uk Displacement monitoring
EP0320122A3 (en) * 1987-11-30 1992-04-29 United Kingdom Atomic Energy Authority A method of position monitoring and apparatus therefor
DE68904426T2 (de) * 1989-07-08 1993-07-15 Ibm Verfahren und vorrichtung zur bestimmung einer linienmitte in einem mikrominiaturelement.
US6376836B1 (en) * 1999-03-12 2002-04-23 University Of Maryland Disentangling sample topography and physical properties in scanning near-field microwave microscopy
JP3844940B2 (ja) * 2000-03-27 2006-11-15 株式会社東芝 マーク位置検出装置およびマーク位置検出方法
GB0420441D0 (en) 2004-09-14 2004-10-20 Ncr Int Inc Sensing arrangement
US11956738B2 (en) * 2019-08-16 2024-04-09 Mediatek Inc. Automatic gain control for serving cell activation based on two different reference signals

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1448854B1 (de) * 1963-02-23 1970-01-15 Leitz Ernst Gmbh Anordnung zur Bestimmung der Lage von Marken
DE1919991C3 (de) * 1969-04-19 1973-11-29 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Anordnung zur automatischen Aus richtung von zwei aufeinander einzu justierenden Objekten

Also Published As

Publication number Publication date
GB8431533D0 (en) 1985-01-23
DE3446181A1 (de) 1985-07-04
US4642468A (en) 1987-02-10
GB2151778A (en) 1985-07-24
GB2151778B (en) 1987-06-03
JPS60129604A (ja) 1985-07-10
DE3446181C2 (en, 2012) 1992-06-17

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