DE3446181A1 - Verfahren zum bestimmen der relativlage zwischen zwei teilen - Google Patents

Verfahren zum bestimmen der relativlage zwischen zwei teilen

Info

Publication number
DE3446181A1
DE3446181A1 DE19843446181 DE3446181A DE3446181A1 DE 3446181 A1 DE3446181 A1 DE 3446181A1 DE 19843446181 DE19843446181 DE 19843446181 DE 3446181 A DE3446181 A DE 3446181A DE 3446181 A1 DE3446181 A1 DE 3446181A1
Authority
DE
Germany
Prior art keywords
output signal
detector
marking
signal
synchronous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE19843446181
Other languages
German (de)
English (en)
Other versions
DE3446181C2 (en, 2012
Inventor
Nobuo Yokohama Kanagawa Shibuya
Mitsuo Tabata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Publication of DE3446181A1 publication Critical patent/DE3446181A1/de
Application granted granted Critical
Publication of DE3446181C2 publication Critical patent/DE3446181C2/de
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Transform (AREA)
DE19843446181 1983-12-19 1984-12-18 Verfahren zum bestimmen der relativlage zwischen zwei teilen Granted DE3446181A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58239392A JPH067043B2 (ja) 1983-12-19 1983-12-19 位置検出方法

Publications (2)

Publication Number Publication Date
DE3446181A1 true DE3446181A1 (de) 1985-07-04
DE3446181C2 DE3446181C2 (en, 2012) 1992-06-17

Family

ID=17044098

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19843446181 Granted DE3446181A1 (de) 1983-12-19 1984-12-18 Verfahren zum bestimmen der relativlage zwischen zwei teilen

Country Status (4)

Country Link
US (1) US4642468A (en, 2012)
JP (1) JPH067043B2 (en, 2012)
DE (1) DE3446181A1 (en, 2012)
GB (1) GB2151778B (en, 2012)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0268455A1 (en) * 1986-11-17 1988-05-25 Tektronix, Inc. Optical detector storage effects reduction

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4861162A (en) * 1985-05-16 1989-08-29 Canon Kabushiki Kaisha Alignment of an object
JP2526546B2 (ja) * 1986-04-21 1996-08-21 日本電気株式会社 位置合わせ装置
JPH0810123B2 (ja) * 1986-09-12 1996-01-31 株式会社ニコン 光学装置
US4780616A (en) * 1986-09-25 1988-10-25 Nippon Kogaku K. K. Projection optical apparatus for mask to substrate alignment
GB8727963D0 (en) * 1987-11-30 1988-01-06 Atomic Energy Authority Uk Displacement monitoring
EP0320122A3 (en) * 1987-11-30 1992-04-29 United Kingdom Atomic Energy Authority A method of position monitoring and apparatus therefor
DE68904426T2 (de) * 1989-07-08 1993-07-15 Ibm Verfahren und vorrichtung zur bestimmung einer linienmitte in einem mikrominiaturelement.
US6376836B1 (en) * 1999-03-12 2002-04-23 University Of Maryland Disentangling sample topography and physical properties in scanning near-field microwave microscopy
JP3844940B2 (ja) * 2000-03-27 2006-11-15 株式会社東芝 マーク位置検出装置およびマーク位置検出方法
GB0420441D0 (en) 2004-09-14 2004-10-20 Ncr Int Inc Sensing arrangement
US11956738B2 (en) * 2019-08-16 2024-04-09 Mediatek Inc. Automatic gain control for serving cell activation based on two different reference signals

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1448854B1 (de) * 1963-02-23 1970-01-15 Leitz Ernst Gmbh Anordnung zur Bestimmung der Lage von Marken

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1919991C3 (de) * 1969-04-19 1973-11-29 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Anordnung zur automatischen Aus richtung von zwei aufeinander einzu justierenden Objekten

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1448854B1 (de) * 1963-02-23 1970-01-15 Leitz Ernst Gmbh Anordnung zur Bestimmung der Lage von Marken

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
HEINECKE, K.: Photoelektrisches Einfangen von Strichmarken. In: Feinwerktechnik 71. Jg. 1967, H. 4, S. 160-166 *
Nikon Tech. J., No. 2,24, 1973, "About Photo-electric Microscope", Bd. I des Servo Technology Manual, New Technology Development Center, III-72 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0268455A1 (en) * 1986-11-17 1988-05-25 Tektronix, Inc. Optical detector storage effects reduction

Also Published As

Publication number Publication date
GB8431533D0 (en) 1985-01-23
US4642468A (en) 1987-02-10
JPH067043B2 (ja) 1994-01-26
GB2151778A (en) 1985-07-24
GB2151778B (en) 1987-06-03
JPS60129604A (ja) 1985-07-10
DE3446181C2 (en, 2012) 1992-06-17

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee