JPH0572733B2 - - Google Patents

Info

Publication number
JPH0572733B2
JPH0572733B2 JP59038237A JP3823784A JPH0572733B2 JP H0572733 B2 JPH0572733 B2 JP H0572733B2 JP 59038237 A JP59038237 A JP 59038237A JP 3823784 A JP3823784 A JP 3823784A JP H0572733 B2 JPH0572733 B2 JP H0572733B2
Authority
JP
Japan
Prior art keywords
magnetic field
substrate
thin film
magnetic
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59038237A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60182711A (ja
Inventor
Koji Matsuzawa
Hiromichi Enomoto
Juji Kasanuki
Shozo Ishibashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP3823784A priority Critical patent/JPS60182711A/ja
Publication of JPS60182711A publication Critical patent/JPS60182711A/ja
Publication of JPH0572733B2 publication Critical patent/JPH0572733B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Thin Magnetic Films (AREA)
JP3823784A 1984-02-29 1984-02-29 磁性薄膜の形成方法およびその装置 Granted JPS60182711A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3823784A JPS60182711A (ja) 1984-02-29 1984-02-29 磁性薄膜の形成方法およびその装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3823784A JPS60182711A (ja) 1984-02-29 1984-02-29 磁性薄膜の形成方法およびその装置

Publications (2)

Publication Number Publication Date
JPS60182711A JPS60182711A (ja) 1985-09-18
JPH0572733B2 true JPH0572733B2 (enrdf_load_stackoverflow) 1993-10-12

Family

ID=12519689

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3823784A Granted JPS60182711A (ja) 1984-02-29 1984-02-29 磁性薄膜の形成方法およびその装置

Country Status (1)

Country Link
JP (1) JPS60182711A (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62232911A (ja) * 1986-04-03 1987-10-13 Hitachi Ltd 磁性膜形成装置
JP2643149B2 (ja) * 1987-06-03 1997-08-20 株式会社ブリヂストン 表面処理方法
JPH0229455U (enrdf_load_stackoverflow) * 1988-08-18 1990-02-26
JP2755776B2 (ja) * 1990-04-20 1998-05-25 三菱重工業株式会社 高速成膜スパッタリング装置
JP5116078B2 (ja) * 2006-11-30 2013-01-09 株式会社神戸製鋼所 対向ターゲットスパッタ装置及び対向ターゲットスパッタ方法
JP4854569B2 (ja) * 2007-04-02 2012-01-18 長州産業株式会社 ミラートロンスパッタ装置
JP5681879B2 (ja) * 2012-05-09 2015-03-11 Tdk株式会社 垂直磁気記録媒体の製造方法及び製造装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5778123A (en) * 1980-11-04 1982-05-15 Hitachi Ltd Manufacture of anisotropic thin magnetic film
JPS5855566A (ja) * 1981-09-29 1983-04-01 Teijin Ltd 対向タ−ゲツト式スパツタ装置

Also Published As

Publication number Publication date
JPS60182711A (ja) 1985-09-18

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