JPH0370889B2 - - Google Patents

Info

Publication number
JPH0370889B2
JPH0370889B2 JP60047439A JP4743985A JPH0370889B2 JP H0370889 B2 JPH0370889 B2 JP H0370889B2 JP 60047439 A JP60047439 A JP 60047439A JP 4743985 A JP4743985 A JP 4743985A JP H0370889 B2 JPH0370889 B2 JP H0370889B2
Authority
JP
Japan
Prior art keywords
thin film
target
permalloy
permalloy thin
coercive force
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60047439A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61207006A (ja
Inventor
Masato Sugyama
Takashi Tomie
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teijin Ltd
Original Assignee
Teijin Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teijin Ltd filed Critical Teijin Ltd
Priority to JP4743985A priority Critical patent/JPS61207006A/ja
Publication of JPS61207006A publication Critical patent/JPS61207006A/ja
Publication of JPH0370889B2 publication Critical patent/JPH0370889B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/30—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE]
    • H01F41/302—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE] for applying spin-exchange-coupled multilayers, e.g. nanostructured superlattices

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Magnetic Record Carriers (AREA)
  • Thin Magnetic Films (AREA)
JP4743985A 1985-03-12 1985-03-12 パーマロイ薄膜及び垂直磁気記録媒体の製造方法 Granted JPS61207006A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4743985A JPS61207006A (ja) 1985-03-12 1985-03-12 パーマロイ薄膜及び垂直磁気記録媒体の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4743985A JPS61207006A (ja) 1985-03-12 1985-03-12 パーマロイ薄膜及び垂直磁気記録媒体の製造方法

Publications (2)

Publication Number Publication Date
JPS61207006A JPS61207006A (ja) 1986-09-13
JPH0370889B2 true JPH0370889B2 (enrdf_load_stackoverflow) 1991-11-11

Family

ID=12775181

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4743985A Granted JPS61207006A (ja) 1985-03-12 1985-03-12 パーマロイ薄膜及び垂直磁気記録媒体の製造方法

Country Status (1)

Country Link
JP (1) JPS61207006A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06104893B2 (ja) * 1985-10-16 1994-12-21 日立金属株式会社 スパッター用ターゲット部材およびその製造方法
AU2002340042A1 (en) * 2002-06-21 2004-01-06 Seagate Technology Llc Method of producing nife alloy films having magnetic anisotropy and magnetic storage media including such films

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5933629A (ja) * 1982-08-17 1984-02-23 Matsushita Electric Ind Co Ltd 垂直磁気記録媒体の製造方法

Also Published As

Publication number Publication date
JPS61207006A (ja) 1986-09-13

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