JPH0556013B2 - - Google Patents
Info
- Publication number
- JPH0556013B2 JPH0556013B2 JP61286814A JP28681486A JPH0556013B2 JP H0556013 B2 JPH0556013 B2 JP H0556013B2 JP 61286814 A JP61286814 A JP 61286814A JP 28681486 A JP28681486 A JP 28681486A JP H0556013 B2 JPH0556013 B2 JP H0556013B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- thin plate
- electrostrictive element
- plate sample
- electrostrictive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000005684 electric field Effects 0.000 claims description 5
- 235000012431 wafers Nutrition 0.000 description 41
- 239000004065 semiconductor Substances 0.000 description 8
- 238000001179 sorption measurement Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61286814A JPS63141313A (ja) | 1986-12-03 | 1986-12-03 | 薄板変形装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61286814A JPS63141313A (ja) | 1986-12-03 | 1986-12-03 | 薄板変形装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63141313A JPS63141313A (ja) | 1988-06-13 |
| JPH0556013B2 true JPH0556013B2 (enEXAMPLES) | 1993-08-18 |
Family
ID=17709388
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61286814A Granted JPS63141313A (ja) | 1986-12-03 | 1986-12-03 | 薄板変形装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63141313A (enEXAMPLES) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101547077B1 (ko) | 2003-04-09 | 2015-08-25 | 가부시키가이샤 니콘 | 노광 방법 및 장치, 그리고 디바이스 제조 방법 |
| TWI573175B (zh) | 2003-10-28 | 2017-03-01 | 尼康股份有限公司 | 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法 |
| TWI385414B (zh) | 2003-11-20 | 2013-02-11 | 尼康股份有限公司 | 光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法 |
| TWI389174B (zh) | 2004-02-06 | 2013-03-11 | 尼康股份有限公司 | 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法 |
| WO2006025341A1 (ja) * | 2004-09-01 | 2006-03-09 | Nikon Corporation | 基板ホルダ及びステージ装置並びに露光装置 |
| KR20180128526A (ko) | 2005-05-12 | 2018-12-03 | 가부시키가이샤 니콘 | 투영 광학계, 노광 장치 및 디바이스 제조 방법 |
| JP5267029B2 (ja) | 2007-10-12 | 2013-08-21 | 株式会社ニコン | 照明光学装置、露光装置及びデバイスの製造方法 |
| US8379187B2 (en) | 2007-10-24 | 2013-02-19 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| US9116346B2 (en) | 2007-11-06 | 2015-08-25 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
-
1986
- 1986-12-03 JP JP61286814A patent/JPS63141313A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63141313A (ja) | 1988-06-13 |
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