JPH0553725B2 - - Google Patents
Info
- Publication number
- JPH0553725B2 JPH0553725B2 JP89127854A JP12785489A JPH0553725B2 JP H0553725 B2 JPH0553725 B2 JP H0553725B2 JP 89127854 A JP89127854 A JP 89127854A JP 12785489 A JP12785489 A JP 12785489A JP H0553725 B2 JPH0553725 B2 JP H0553725B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- aqueous solution
- scrubber
- water
- ppm
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000007789 gas Substances 0.000 description 121
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 39
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 38
- 239000007864 aqueous solution Substances 0.000 description 35
- 238000000034 method Methods 0.000 description 34
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 19
- 239000011734 sodium Substances 0.000 description 15
- GVGCUCJTUSOZKP-UHFFFAOYSA-N nitrogen trifluoride Chemical compound FN(F)F GVGCUCJTUSOZKP-UHFFFAOYSA-N 0.000 description 12
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 description 9
- 238000003860 storage Methods 0.000 description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 7
- 238000004817 gas chromatography Methods 0.000 description 7
- 239000010439 graphite Substances 0.000 description 7
- 229910002804 graphite Inorganic materials 0.000 description 7
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 7
- 235000019345 sodium thiosulphate Nutrition 0.000 description 7
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000012535 impurity Substances 0.000 description 6
- UJMWVICAENGCRF-UHFFFAOYSA-N oxygen difluoride Chemical compound FOF UJMWVICAENGCRF-UHFFFAOYSA-N 0.000 description 6
- 229910000127 oxygen difluoride Inorganic materials 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- 238000005868 electrolysis reaction Methods 0.000 description 5
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 5
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 5
- 238000009423 ventilation Methods 0.000 description 5
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229910000043 hydrogen iodide Inorganic materials 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 4
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 3
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 3
- 229910017855 NH 4 F Inorganic materials 0.000 description 3
- 229910002092 carbon dioxide Inorganic materials 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 238000001312 dry etching Methods 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000000746 purification Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 229910021536 Zeolite Inorganic materials 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000002808 molecular sieve Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 2
- 239000011775 sodium fluoride Substances 0.000 description 2
- 229910052979 sodium sulfide Inorganic materials 0.000 description 2
- GRVFOGOEDUUMBP-UHFFFAOYSA-N sodium sulfide (anhydrous) Chemical compound [Na+].[Na+].[S-2] GRVFOGOEDUUMBP-UHFFFAOYSA-N 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 239000010457 zeolite Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000003889 chemical engineering Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- DUQAODNTUBJRGF-ONEGZZNKSA-N dinitrogen difluoride Chemical compound F\N=N\F DUQAODNTUBJRGF-ONEGZZNKSA-N 0.000 description 1
- VDQVEACBQKUUSU-UHFFFAOYSA-M disodium;sulfanide Chemical compound [Na+].[Na+].[SH-] VDQVEACBQKUUSU-UHFFFAOYSA-M 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 239000001272 nitrous oxide Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
- C01B21/083—Compounds containing nitrogen and non-metals and optionally metals containing one or more halogen atoms
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
- C01B21/083—Compounds containing nitrogen and non-metals and optionally metals containing one or more halogen atoms
- C01B21/0832—Binary compounds of nitrogen with halogens
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
- Y02C20/00—Capture or disposal of greenhouse gases
- Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Treating Waste Gases (AREA)
- Gas Separation By Absorption (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63-135061 | 1988-06-01 | ||
| JP13506188 | 1988-06-01 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0280310A JPH0280310A (ja) | 1990-03-20 |
| JPH0553725B2 true JPH0553725B2 (US20080094685A1-20080424-C00004.png) | 1993-08-10 |
Family
ID=15142972
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1127854A Granted JPH0280310A (ja) | 1988-06-01 | 1989-05-23 | 三弗化窒素ガスの精製方法 |
Country Status (6)
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01261208A (ja) * | 1988-04-11 | 1989-10-18 | Mitsui Toatsu Chem Inc | 三弗化窒素ガスの精製方法 |
| US5069690A (en) * | 1991-02-21 | 1991-12-03 | Air Products And Chemicals, Inc. | Process for kinetic gas-solid chromatographic separations |
| US5426944A (en) * | 1993-08-31 | 1995-06-27 | American Air Liquide, Inc. | Chemical purification for semiconductor processing by partial condensation |
| US6759018B1 (en) * | 1997-05-16 | 2004-07-06 | Advanced Technology Materials, Inc. | Method for point-of-use treatment of effluent gas streams |
| US20010009652A1 (en) * | 1998-05-28 | 2001-07-26 | Jose I. Arno | Apparatus and method for point-of-use abatement of fluorocompounds |
| US6458249B2 (en) * | 1997-11-10 | 2002-10-01 | E. I. Du Pont De Nemours And Company | Process for purifying perfluorinated products |
| US8231851B2 (en) * | 1997-11-14 | 2012-07-31 | Hitachi, Ltd. | Method for processing perfluorocarbon, and apparatus therefor |
| KR100432593B1 (ko) * | 2001-09-07 | 2004-05-24 | 주식회사 소디프신소재 | 삼불화 질소 가스의 정제 방법 |
| KR100481795B1 (ko) * | 2002-07-31 | 2005-04-11 | 주식회사 소디프신소재 | 고 순도의 삼불화 질소 가스 제조 방법 |
| US7074378B2 (en) * | 2004-01-23 | 2006-07-11 | Air Products And Chemicals, Inc. | Process for the purification of NF3 |
| ES2392981T3 (es) * | 2004-07-08 | 2012-12-17 | Hyosung Corporation | Procedimiento para refinar gas de trifluoruro de nitrógeno usando zeolita intercambiada iónicamente con un metal alcalinotérreo |
| US7718145B2 (en) * | 2005-04-05 | 2010-05-18 | Mitsui Chemicals, Inc. | Polyisocyanate production system and gas treatment apparatus |
| KR100777576B1 (ko) | 2006-12-15 | 2007-11-28 | 동부일렉트로닉스 주식회사 | Ｎｆ３를 클리닝 가스로 사용하는 ｃｖｄ 공정에서의 가스스크러버 및 이의 운전 방법 |
| KR100945520B1 (ko) | 2008-03-12 | 2010-03-09 | 엔텍이앤씨 주식회사 | 악취 가스 제거 방법 |
| JP2010105825A (ja) * | 2008-10-28 | 2010-05-13 | Central Glass Co Ltd | ハロゲンまたはハロゲン化合物を不純物として含む三フッ化窒素の精製方法 |
| JP2013539717A (ja) * | 2010-09-15 | 2013-10-28 | ソルヴェイ（ソシエテ アノニム） | ガスからのｆ２および／またはｏｆ２の除去方法 |
| WO2017094417A1 (ja) * | 2015-12-01 | 2017-06-08 | 昭和電工株式会社 | フッ素元素を含有する排ガスの処理方法 |
| JPWO2017094418A1 (ja) * | 2015-12-01 | 2018-09-20 | 昭和電工株式会社 | フッ素元素を含有する排ガスの処理方法 |
| CN111039266A (zh) * | 2019-12-29 | 2020-04-21 | 中船重工（邯郸）派瑞特种气体有限公司 | 一种除去三氟化氮中氧化亚氮的装置及方法 |
| CN112742158B (zh) * | 2020-12-30 | 2022-11-25 | 中船(邯郸)派瑞特种气体股份有限公司 | 一种三氟化氮电解制备过程中氟化氢废气处理系统及方法 |
| CN114524421A (zh) * | 2022-03-08 | 2022-05-24 | 中船(邯郸)派瑞特种气体股份有限公司 | 一种从冷阱排污气体中回收三氟化氮并制备氢氟酸的方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4193976A (en) * | 1978-04-06 | 1980-03-18 | Air Products & Chemicals, Inc. | Removal of dinitrogen difluoride from nitrogen trifluoride |
| US4156598A (en) * | 1978-06-08 | 1979-05-29 | Air Products And Chemicals, Inc. | Purification of nitrogen trifluoride atmospheres |
| JPS6071503A (ja) * | 1983-09-27 | 1985-04-23 | Central Glass Co Ltd | Νｆ↓３の製造法 |
| JPS61247609A (ja) * | 1985-04-26 | 1986-11-04 | Showa Denko Kk | 三弗化窒素の精製方法 |
| JPH03151608A (ja) * | 1989-11-09 | 1991-06-27 | Toshiba Corp | リード線支持装置 |
-
1989
- 1989-05-23 JP JP1127854A patent/JPH0280310A/ja active Granted
- 1989-05-24 DE DE89109439T patent/DE68905379T2/de not_active Expired - Lifetime
- 1989-05-24 US US07/356,179 patent/US4980144A/en not_active Expired - Lifetime
- 1989-05-24 EP EP89109439A patent/EP0344612B1/en not_active Expired - Lifetime
- 1989-05-26 CA CA000600886A patent/CA1316330C/en not_active Expired - Lifetime
- 1989-06-01 KR KR1019890007523A patent/KR920010082B1/ko not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| KR920010082B1 (ko) | 1992-11-14 |
| DE68905379T2 (de) | 1993-10-21 |
| EP0344612A3 (en) | 1990-05-30 |
| JPH0280310A (ja) | 1990-03-20 |
| EP0344612B1 (en) | 1993-03-17 |
| US4980144A (en) | 1990-12-25 |
| EP0344612A2 (en) | 1989-12-06 |
| KR900000288A (ko) | 1990-01-30 |
| CA1316330C (en) | 1993-04-20 |
| DE68905379D1 (de) | 1993-04-22 |
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