DE68905379T2 - Verfahren zur Reinigung von Stickstofftrifluoridgas. - Google Patents

Verfahren zur Reinigung von Stickstofftrifluoridgas.

Info

Publication number
DE68905379T2
DE68905379T2 DE89109439T DE68905379T DE68905379T2 DE 68905379 T2 DE68905379 T2 DE 68905379T2 DE 89109439 T DE89109439 T DE 89109439T DE 68905379 T DE68905379 T DE 68905379T DE 68905379 T2 DE68905379 T2 DE 68905379T2
Authority
DE
Germany
Prior art keywords
purification
nitrogen trifluoride
trifluoride gas
gas
nitrogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE89109439T
Other languages
English (en)
Other versions
DE68905379D1 (de
Inventor
Nobuhiko Koto
Toshihiko Nishitsuji
Naruyuki Iwanaga
Isao Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Chemicals Inc
Original Assignee
Mitsui Toatsu Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Toatsu Chemicals Inc filed Critical Mitsui Toatsu Chemicals Inc
Publication of DE68905379D1 publication Critical patent/DE68905379D1/de
Application granted granted Critical
Publication of DE68905379T2 publication Critical patent/DE68905379T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00Nitrogen; Compounds thereof
    • C01B21/082Compounds containing nitrogen and non-metals and optionally metals
    • C01B21/083Compounds containing nitrogen and non-metals and optionally metals containing one or more halogen atoms
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00Nitrogen; Compounds thereof
    • C01B21/082Compounds containing nitrogen and non-metals and optionally metals
    • C01B21/083Compounds containing nitrogen and non-metals and optionally metals containing one or more halogen atoms
    • C01B21/0832Binary compounds of nitrogen with halogens
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02CCAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00Capture or disposal of greenhouse gases
    • Y02C20/30Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Treating Waste Gases (AREA)
  • Gas Separation By Absorption (AREA)
DE89109439T 1988-06-01 1989-05-24 Verfahren zur Reinigung von Stickstofftrifluoridgas. Expired - Lifetime DE68905379T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13506188 1988-06-01

Publications (2)

Publication Number Publication Date
DE68905379D1 DE68905379D1 (de) 1993-04-22
DE68905379T2 true DE68905379T2 (de) 1993-10-21

Family

ID=15142972

Family Applications (1)

Application Number Title Priority Date Filing Date
DE89109439T Expired - Lifetime DE68905379T2 (de) 1988-06-01 1989-05-24 Verfahren zur Reinigung von Stickstofftrifluoridgas.

Country Status (6)

Country Link
US (1) US4980144A (de)
EP (1) EP0344612B1 (de)
JP (1) JPH0280310A (de)
KR (1) KR920010082B1 (de)
CA (1) CA1316330C (de)
DE (1) DE68905379T2 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01261208A (ja) * 1988-04-11 1989-10-18 Mitsui Toatsu Chem Inc 三弗化窒素ガスの精製方法
US5069690A (en) * 1991-02-21 1991-12-03 Air Products And Chemicals, Inc. Process for kinetic gas-solid chromatographic separations
US5426944A (en) * 1993-08-31 1995-06-27 American Air Liquide, Inc. Chemical purification for semiconductor processing by partial condensation
US6759018B1 (en) 1997-05-16 2004-07-06 Advanced Technology Materials, Inc. Method for point-of-use treatment of effluent gas streams
US20010009652A1 (en) * 1998-05-28 2001-07-26 Jose I. Arno Apparatus and method for point-of-use abatement of fluorocompounds
US6458249B2 (en) * 1997-11-10 2002-10-01 E. I. Du Pont De Nemours And Company Process for purifying perfluorinated products
US8231851B2 (en) * 1997-11-14 2012-07-31 Hitachi, Ltd. Method for processing perfluorocarbon, and apparatus therefor
KR100432593B1 (ko) * 2001-09-07 2004-05-24 주식회사 소디프신소재 삼불화 질소 가스의 정제 방법
KR100481795B1 (ko) * 2002-07-31 2005-04-11 주식회사 소디프신소재 고 순도의 삼불화 질소 가스 제조 방법
US7074378B2 (en) * 2004-01-23 2006-07-11 Air Products And Chemicals, Inc. Process for the purification of NF3
US7842125B2 (en) * 2004-07-08 2010-11-30 Hyosung Corporation Process for refining nitrogen trifluoride gas using alkali earth metal exchanged zeolite
EP2468387B1 (de) * 2005-04-05 2015-10-21 Mitsui Chemicals, Inc. Gasbehandlungsvorrichtung, insbesondere für ein Polyisocyanatherstellungssystem
KR100777576B1 (ko) 2006-12-15 2007-11-28 동부일렉트로닉스 주식회사 Nf3를 클리닝 가스로 사용하는 cvd 공정에서의 가스스크러버 및 이의 운전 방법
KR100945520B1 (ko) 2008-03-12 2010-03-09 엔텍이앤씨 주식회사 악취 가스 제거 방법
JP2010105825A (ja) * 2008-10-28 2010-05-13 Central Glass Co Ltd ハロゲンまたはハロゲン化合物を不純物として含む三フッ化窒素の精製方法
KR20130111554A (ko) * 2010-09-15 2013-10-10 솔베이(소시에떼아노님) 가스로부터 f2 및/또는 of2를 제거시키는 방법
KR20180075622A (ko) * 2015-12-01 2018-07-04 쇼와 덴코 가부시키가이샤 불소 원소를 함유하는 배기 가스의 처리 방법
WO2017094418A1 (ja) * 2015-12-01 2017-06-08 昭和電工株式会社 フッ素元素を含有する排ガスの処理方法
CN111039266A (zh) * 2019-12-29 2020-04-21 中船重工(邯郸)派瑞特种气体有限公司 一种除去三氟化氮中氧化亚氮的装置及方法
CN112742158B (zh) * 2020-12-30 2022-11-25 中船(邯郸)派瑞特种气体股份有限公司 一种三氟化氮电解制备过程中氟化氢废气处理系统及方法
CN114524421A (zh) * 2022-03-08 2022-05-24 中船(邯郸)派瑞特种气体股份有限公司 一种从冷阱排污气体中回收三氟化氮并制备氢氟酸的方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4193976A (en) * 1978-04-06 1980-03-18 Air Products & Chemicals, Inc. Removal of dinitrogen difluoride from nitrogen trifluoride
US4156598A (en) * 1978-06-08 1979-05-29 Air Products And Chemicals, Inc. Purification of nitrogen trifluoride atmospheres
JPS6071503A (ja) * 1983-09-27 1985-04-23 Central Glass Co Ltd Νf↓3の製造法
JPS61247609A (ja) * 1985-04-26 1986-11-04 Showa Denko Kk 三弗化窒素の精製方法
JPH03151608A (ja) * 1989-11-09 1991-06-27 Toshiba Corp リード線支持装置

Also Published As

Publication number Publication date
KR900000288A (ko) 1990-01-30
JPH0280310A (ja) 1990-03-20
EP0344612B1 (de) 1993-03-17
CA1316330C (en) 1993-04-20
DE68905379D1 (de) 1993-04-22
JPH0553725B2 (de) 1993-08-10
US4980144A (en) 1990-12-25
EP0344612A2 (de) 1989-12-06
KR920010082B1 (ko) 1992-11-14
EP0344612A3 (en) 1990-05-30

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: MITSUI CHEMICALS, INC., TOKIO/TOKYO, JP