JPH05508744A - 複数の孔を有する被処理製品をその湿式化学処理時、例えば電気メッキ時に運動させる方法並びに該方法を実施する装置 - Google Patents
複数の孔を有する被処理製品をその湿式化学処理時、例えば電気メッキ時に運動させる方法並びに該方法を実施する装置Info
- Publication number
- JPH05508744A JPH05508744A JP91511324A JP51132491A JPH05508744A JP H05508744 A JPH05508744 A JP H05508744A JP 91511324 A JP91511324 A JP 91511324A JP 51132491 A JP51132491 A JP 51132491A JP H05508744 A JPH05508744 A JP H05508744A
- Authority
- JP
- Japan
- Prior art keywords
- product
- vibration
- processing
- motion
- frequency
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 28
- 239000011148 porous material Substances 0.000 title description 15
- 238000009713 electroplating Methods 0.000 title description 2
- 239000000126 substance Substances 0.000 title description 2
- 230000033001 locomotion Effects 0.000 claims description 54
- 238000012545 processing Methods 0.000 claims description 42
- 239000007788 liquid Substances 0.000 claims description 14
- 230000005540 biological transmission Effects 0.000 claims description 6
- 230000010355 oscillation Effects 0.000 claims description 5
- 230000001133 acceleration Effects 0.000 claims description 4
- 238000004140 cleaning Methods 0.000 claims description 4
- 230000007246 mechanism Effects 0.000 claims description 3
- 230000001154 acute effect Effects 0.000 claims description 2
- 238000012993 chemical processing Methods 0.000 claims description 2
- 230000000717 retained effect Effects 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- 230000000903 blocking effect Effects 0.000 claims 1
- 230000001483 mobilizing effect Effects 0.000 claims 1
- 230000008859 change Effects 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000003792 electrolyte Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 238000007704 wet chemistry method Methods 0.000 description 2
- 241000282994 Cervidae Species 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000013016 damping Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003534 oscillatory effect Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0085—Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor
- H05K3/0088—Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor for treatment of holes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/10—Agitating of electrolytes; Moving of racks
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/20—Electroplating using ultrasonics, vibrations
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Electroplating Methods And Accessories (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Coating With Molten Metal (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4021581,4 | 1990-07-06 | ||
| DE4021581A DE4021581A1 (de) | 1990-07-06 | 1990-07-06 | Verfahren zur bewegung eines bohrungen aufweisenden gutes bei dessen nasschemischer behandlung, z.b. galvanisierung, sowie vorrichtung zur durchfuehrung des verfahrens |
| PCT/DE1991/000557 WO1992001088A1 (de) | 1990-07-06 | 1991-07-04 | Verfahren zur bewegung eines bohrungen aufweisenden gutes bei dessen nasschemischer behandlung, z.b. galvanisierung, sowie vorrichtung zur durchführung des verfahrens |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH05508744A true JPH05508744A (ja) | 1993-12-02 |
Family
ID=6409800
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP91511324A Pending JPH05508744A (ja) | 1990-07-06 | 1991-07-04 | 複数の孔を有する被処理製品をその湿式化学処理時、例えば電気メッキ時に運動させる方法並びに該方法を実施する装置 |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP0539390A1 (cs) |
| JP (1) | JPH05508744A (cs) |
| KR (1) | KR930701641A (cs) |
| CA (1) | CA2086762A1 (cs) |
| DE (1) | DE4021581A1 (cs) |
| WO (1) | WO1992001088A1 (cs) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6261435B1 (en) | 1997-10-21 | 2001-07-17 | Nihon Techno Kabushiki Kaisha | Plating method |
| JP2013174016A (ja) * | 2007-06-06 | 2013-09-05 | Atotech Deutschland Gmbh | 板状製品の湿式化学処理用装置及び方法と、上記装置内に流量部材を取り付けるための方法 |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4133561C2 (de) * | 1991-10-10 | 1994-02-03 | Reinhard Kissler Gmbh | Verfahren und Vorrichtung zum Galvanisieren von Waren |
| DE4212045C1 (de) * | 1992-04-07 | 1993-12-02 | Schering Ag | Verfahren und Vorrichtung zur chemischen und/oder galvanischen Behandlung von Werkstücken |
| JPH10512101A (ja) * | 1995-01-05 | 1998-11-17 | ヒューベル エゴン | 超微細孔を有したプレート形状の加工材料の処理のための方法と装置 |
| DE10015349A1 (de) * | 2000-03-23 | 2001-10-25 | Atotech Deutschland Gmbh | Verfahren und Vorrichtung zum Behandeln von durchgehende Löcher und/oder Vertiefungen aufweisenden Schaltungsträgern sowie Anwendung des Verfahrens und Verwendung der Vorrichtung |
| DE10259367A1 (de) * | 2002-12-18 | 2004-07-08 | Siemens Ag | Verfahren zur Verbesserung der Wechselwirkung zwischen einem Medium und einem Bauteil |
| KR101303302B1 (ko) * | 2011-05-27 | 2013-09-03 | 박경이 | 도금용 플라이트 바 |
| KR101295339B1 (ko) * | 2011-06-09 | 2013-08-09 | 박경이 | 도금장치 |
| KR101346837B1 (ko) * | 2011-12-30 | 2014-01-03 | (주)포인텍 | 기판의 기포 제거장치 및 제거방법 |
| DE102012021144B3 (de) * | 2012-10-24 | 2013-10-10 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Erzeugung von Metallisierungen in Sackloch-Vias |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE953759C (de) * | 1954-10-20 | 1956-12-06 | W Kampschulte & Cie Dr | Verfahren und Vorrichtung zum Bewegen der Werkstuecktraeger od. dgl. bei galvanischen Baedern |
| US2833708A (en) * | 1955-05-05 | 1958-05-06 | Rockwell Spring & Axle Co | Electroplating apparatus |
| US3461045A (en) * | 1965-10-21 | 1969-08-12 | Teletype Corp | Method of plating through holes |
| DE3105313A1 (de) * | 1981-02-13 | 1982-08-19 | Dr.-Ing. Max Schlötter GmbH & Co KG, 7340 Geislingen | Verfahren und vorrichtung zur behandlung von werkstuecken |
| US4875982A (en) * | 1987-02-06 | 1989-10-24 | Velie Circuits, Inc. | Plating high aspect ratio holes in circuit boards |
| DE3905100A1 (de) * | 1989-02-20 | 1990-08-23 | Hans Henig | Verfahren und vorrichtung zum elektrolytaustausch vornehmlich in engen vertiefungen grossflaechiger werkstuecke |
-
1990
- 1990-07-06 DE DE4021581A patent/DE4021581A1/de active Granted
-
1991
- 1991-07-04 WO PCT/DE1991/000557 patent/WO1992001088A1/de not_active Ceased
- 1991-07-04 KR KR1019930700020A patent/KR930701641A/ko not_active Ceased
- 1991-07-04 JP JP91511324A patent/JPH05508744A/ja active Pending
- 1991-07-04 CA CA002086762A patent/CA2086762A1/en not_active Abandoned
- 1991-07-04 EP EP91911680A patent/EP0539390A1/de not_active Withdrawn
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6261435B1 (en) | 1997-10-21 | 2001-07-17 | Nihon Techno Kabushiki Kaisha | Plating method |
| JP2013174016A (ja) * | 2007-06-06 | 2013-09-05 | Atotech Deutschland Gmbh | 板状製品の湿式化学処理用装置及び方法と、上記装置内に流量部材を取り付けるための方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE4021581A1 (de) | 1992-01-09 |
| CA2086762A1 (en) | 1992-01-07 |
| WO1992001088A1 (de) | 1992-01-23 |
| KR930701641A (ko) | 1993-06-12 |
| EP0539390A1 (de) | 1993-05-05 |
| DE4021581C2 (cs) | 1993-09-02 |
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