JPH0544662B2 - - Google Patents

Info

Publication number
JPH0544662B2
JPH0544662B2 JP58204803A JP20480383A JPH0544662B2 JP H0544662 B2 JPH0544662 B2 JP H0544662B2 JP 58204803 A JP58204803 A JP 58204803A JP 20480383 A JP20480383 A JP 20480383A JP H0544662 B2 JPH0544662 B2 JP H0544662B2
Authority
JP
Japan
Prior art keywords
photomask
shielding film
frame
transparent
glass substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58204803A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6097356A (ja
Inventor
Yasuhiro Koizumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58204803A priority Critical patent/JPS6097356A/ja
Publication of JPS6097356A publication Critical patent/JPS6097356A/ja
Publication of JPH0544662B2 publication Critical patent/JPH0544662B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP58204803A 1983-11-02 1983-11-02 ホトマスク Granted JPS6097356A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58204803A JPS6097356A (ja) 1983-11-02 1983-11-02 ホトマスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58204803A JPS6097356A (ja) 1983-11-02 1983-11-02 ホトマスク

Publications (2)

Publication Number Publication Date
JPS6097356A JPS6097356A (ja) 1985-05-31
JPH0544662B2 true JPH0544662B2 (en:Method) 1993-07-07

Family

ID=16496619

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58204803A Granted JPS6097356A (ja) 1983-11-02 1983-11-02 ホトマスク

Country Status (1)

Country Link
JP (1) JPS6097356A (en:Method)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20060101458A (ko) 2003-09-23 2006-09-25 코닌클리케 필립스 일렉트로닉스 엔.브이. 칩 생산에 사용된 레티클을 오염으로부터 보호하기 위한방법과 장치
US20060281014A1 (en) * 2003-09-23 2006-12-14 Koninklijke Phillips Electronics N.V. Method and apparatus for protecting a reticle used in chip production from contamination

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5428716A (en) * 1977-08-09 1979-03-03 Furukawa Electric Co Ltd:The Process for producing electroconductive highly heat-resisting aluminum alloy

Also Published As

Publication number Publication date
JPS6097356A (ja) 1985-05-31

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