JPH0535567B2 - - Google Patents

Info

Publication number
JPH0535567B2
JPH0535567B2 JP60164800A JP16480085A JPH0535567B2 JP H0535567 B2 JPH0535567 B2 JP H0535567B2 JP 60164800 A JP60164800 A JP 60164800A JP 16480085 A JP16480085 A JP 16480085A JP H0535567 B2 JPH0535567 B2 JP H0535567B2
Authority
JP
Japan
Prior art keywords
file
password
parameters
operating parameters
semiconductor manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60164800A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6225419A (ja
Inventor
Ryuichi Sato
Masanori Numata
Fumyoshi Hamazaki
Naoki Ayada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP60164800A priority Critical patent/JPS6225419A/ja
Publication of JPS6225419A publication Critical patent/JPS6225419A/ja
Priority to US07/752,986 priority patent/US5197118A/en
Publication of JPH0535567B2 publication Critical patent/JPH0535567B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing And Monitoring For Control Systems (AREA)
JP60164800A 1985-07-25 1985-07-25 半導体製造装置 Granted JPS6225419A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60164800A JPS6225419A (ja) 1985-07-25 1985-07-25 半導体製造装置
US07/752,986 US5197118A (en) 1985-07-25 1991-09-03 Control system for a fine pattern printing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60164800A JPS6225419A (ja) 1985-07-25 1985-07-25 半導体製造装置

Publications (2)

Publication Number Publication Date
JPS6225419A JPS6225419A (ja) 1987-02-03
JPH0535567B2 true JPH0535567B2 (enrdf_load_stackoverflow) 1993-05-26

Family

ID=15800168

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60164800A Granted JPS6225419A (ja) 1985-07-25 1985-07-25 半導体製造装置

Country Status (1)

Country Link
JP (1) JPS6225419A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2607620B2 (ja) * 1988-04-26 1997-05-07 マツダ株式会社 シーケンスプログラム制御系モニタのグループ分け方法
JP2852696B2 (ja) * 1990-07-12 1999-02-03 キヤノン株式会社 露光装置
JP3847457B2 (ja) * 1998-06-17 2006-11-22 大日本スクリーン製造株式会社 基板処理装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5549713A (en) * 1978-10-02 1980-04-10 Nec Corp Automatic work processing system
JPS57212406A (en) * 1981-06-24 1982-12-27 Hitachi Ltd Method and device for focusing
JPS58156938A (ja) * 1982-03-12 1983-09-19 Hitachi Ltd 露光装置
JPS58159110A (ja) * 1982-03-18 1983-09-21 Mitsubishi Electric Corp 対話形図形デ−タベ−ス作成及び修正方式
JPS58179834A (ja) * 1982-04-14 1983-10-21 Canon Inc 投影露光装置及び方法
JPS60218116A (ja) * 1984-04-13 1985-10-31 Mitsubishi Electric Corp 電子ビ−ム加工機

Also Published As

Publication number Publication date
JPS6225419A (ja) 1987-02-03

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term