JPS57212406A - Method and device for focusing - Google Patents

Method and device for focusing

Info

Publication number
JPS57212406A
JPS57212406A JP56096660A JP9666081A JPS57212406A JP S57212406 A JPS57212406 A JP S57212406A JP 56096660 A JP56096660 A JP 56096660A JP 9666081 A JP9666081 A JP 9666081A JP S57212406 A JPS57212406 A JP S57212406A
Authority
JP
Japan
Prior art keywords
image
reticle
wafer
projected
basement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56096660A
Other languages
Japanese (ja)
Inventor
Susumu Komoriya
Nobuyuki Irikita
Hiroshi Maejima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56096660A priority Critical patent/JPS57212406A/en
Publication of JPS57212406A publication Critical patent/JPS57212406A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/28—Systems for automatic generation of focusing signals
    • G02B7/30—Systems for automatic generation of focusing signals using parallactic triangle with a base line
    • G02B7/32—Systems for automatic generation of focusing signals using parallactic triangle with a base line using active means, e.g. light emitter

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Variable Magnification In Projection-Type Copying Machines (AREA)
  • Automatic Focus Adjustment (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To realize the automatic focusing in a short time with high accuracy, by projecting a minute light transmission part formed at a part of an object to be projected on the surface of an exposed object and image-forming again the reflected light at the position of the object to be projected to detect the light volume of transmission. CONSTITUTION:When a pattern formed to a reticle 10 is projected with exposure to a wafer 11, the reticle 10 is set at a fixed position with the wafer 11 put on a basement 12 which can move up and down. Then a lower basement 13 is horizontally shifted by a motor 14, and an upper basement 15 is shited vertically with a minute extent. At the same time, a light transmission part 19 image- formed at a part of the reticle 10 is formed into an image on the wafer 11, and this reflected light moves back through an image-forming lens 18 to be formed again into an image on the reticle 10. The reflected light is then made incident to a photoelectric element 24 via a half mirror 20 and a lens 22. Then the output of the element 24 is detected 25 to control 26 the motor 14 on the basis of the output of a mercury lamp 16 which is detected by a photoelectric element 23 via the mirror 20. In such way, the highly accurate focusing is automatically possible in a short time.
JP56096660A 1981-06-24 1981-06-24 Method and device for focusing Pending JPS57212406A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56096660A JPS57212406A (en) 1981-06-24 1981-06-24 Method and device for focusing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56096660A JPS57212406A (en) 1981-06-24 1981-06-24 Method and device for focusing

Publications (1)

Publication Number Publication Date
JPS57212406A true JPS57212406A (en) 1982-12-27

Family

ID=14170975

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56096660A Pending JPS57212406A (en) 1981-06-24 1981-06-24 Method and device for focusing

Country Status (1)

Country Link
JP (1) JPS57212406A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6015614A (en) * 1983-07-07 1985-01-26 Fuji Photo Film Co Ltd Auto-focusing mechanism of mount film
JPS6225422A (en) * 1985-07-25 1987-02-03 Canon Inc Semiconductor manufacturing equipment
JPS6225419A (en) * 1985-07-25 1987-02-03 Canon Inc Semiconductor manufacturing equipment
JPH01286418A (en) * 1988-05-13 1989-11-17 Canon Inc Projection aligner
US5424552A (en) * 1991-07-09 1995-06-13 Nikon Corporation Projection exposing apparatus
JPH08102440A (en) * 1995-07-28 1996-04-16 Canon Inc Projection exposure
JPH08102441A (en) * 1995-07-28 1996-04-16 Canon Inc Projection exposure device
EP1091229A2 (en) * 1999-10-07 2001-04-11 Agilent Technologies Inc. (a Delaware Corporation) Apparatus and method for autofocus

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6015614A (en) * 1983-07-07 1985-01-26 Fuji Photo Film Co Ltd Auto-focusing mechanism of mount film
JPS6225422A (en) * 1985-07-25 1987-02-03 Canon Inc Semiconductor manufacturing equipment
JPS6225419A (en) * 1985-07-25 1987-02-03 Canon Inc Semiconductor manufacturing equipment
JPH0535567B2 (en) * 1985-07-25 1993-05-26 Canon Kk
JPH0535568B2 (en) * 1985-07-25 1993-05-26 Canon Kk
JPH01286418A (en) * 1988-05-13 1989-11-17 Canon Inc Projection aligner
JPH0652706B2 (en) * 1988-05-13 1994-07-06 キヤノン株式会社 Projection exposure device
US5424552A (en) * 1991-07-09 1995-06-13 Nikon Corporation Projection exposing apparatus
JPH08102440A (en) * 1995-07-28 1996-04-16 Canon Inc Projection exposure
JPH08102441A (en) * 1995-07-28 1996-04-16 Canon Inc Projection exposure device
EP1091229A2 (en) * 1999-10-07 2001-04-11 Agilent Technologies Inc. (a Delaware Corporation) Apparatus and method for autofocus
EP1091229A3 (en) * 1999-10-07 2003-09-17 Agilent Technologies, Inc. (a Delaware corporation) Apparatus and method for autofocus

Similar Documents

Publication Publication Date Title
JPS56110961A (en) Exposure device of electrophotographic copier
JPS57212406A (en) Method and device for focusing
JPS55111929A (en) Automatic focusing device
JPS5428133A (en) Optical path extension device with focus detection function
JPS5299820A (en) Focusing glass
IE833082L (en) Automatic focus control device
JPS5332728A (en) Focus control device for camera
JPS5677864A (en) Method and device for automatic exposure control for copying machine
JPS6410228A (en) Copying machine
JPS57200029A (en) Exposing device
JPS572063A (en) Exposure extent controller of electrophotographic device
JPS556361A (en) Focus measuring position assigning device in auto-focusing camera
JPS56109321A (en) Single-lens reflex camera system providing ttl photometry
JPS57198418A (en) Automatic focusing device
JPS57113311A (en) Measuring device for surface coarseness of object
JPS57120926A (en) Copying machine for microfilm
JPS55120020A (en) Focus detection and indicating device of camera
JPS552232A (en) Focusing optical device for camera
JPS556324A (en) Photographing method
JPS55130523A (en) Automatic focus system single-lens reflex camera
JPS55106425A (en) Single-lens reflex camera
JPS54134623A (en) Photograhic apparatus
JPS56110962A (en) Exposure device of electrophotographic copier
JPS57190246A (en) Detector for lens defect
JPS5778031A (en) Reflection photometer for single-lens reflex camera