JPS6225422A - Semiconductor manufacturing equipment - Google Patents

Abstract

PURPOSE:To prevent an erroneous operation due to an error of a parameter at main operation starting time by displaying the prescribed operation parameter in case of inputting a main operation start command, and further inputting a confirmation signal. CONSTITUTION:When an operator turns ON a power source of this manufacturing apparatus, a console unit 30 becomes a command queue state. Then, a console CPU 31 displays, when a start command is input from a keyboard 12, the prescribed parameter of many parameters stored in an external memory 32 on a CRT 11. Here, the prescribed parameter displayed on the CRT 11 has large possibility of modifying in case of starting a main operation by an operator. Then, when a confirmation signal is input, the main operation is started according to the displayed parameter. Thus, the operator can effectively confirm an essential parameter at process starting time to prevent an erroneous operation for starting the main operation while the parameter is erroneous.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of the Invention] The present invention relates to an apparatus for manufacturing semiconductor devices such as LSI and VLSI. The present invention also relates to a semiconductor manufacturing apparatus that can perform the process reliably.

Background of the Invention] As the degree of integration of semiconductor integrated circuits increases, efforts are being made to improve the functionality and performance of semiconductor manufacturing equipment.

As these machines become more sophisticated and have higher performance, the parameters for operating this type of equipment have also increased.

For example, in a step-and-repeat projection exposure apparatus, the number of such parameters may range from tens to even hundreds.

On the other hand, in conventional semiconductor manufacturing equipment, when an operator inputs an operation start command by operating a start switch or keyboard, the equipment starts running immediately. Therefore, for example, it is necessary to change to another mask process immediately after inputting an operation start command. Even if you realize that something was wrong or that you should have changed the parameters, you have already started working on some wafers, and some of them may be defective, or you may have to remove the resist and try again. If you don't mind the trouble of applying it, you have to apply it.

In addition, in order to check the parameter setting status when switching to mask process or lot 1, it is necessary to check a huge number of parameters as described above. This may even be impossible for operators who are primarily assigned to perform routine start and stop operations.For this reason, for example, it is necessary to memorize the optimum values of parameters for each mask process, and to Devices have also been proposed in which parameter values that are stored once they are determined are set all at once. However, even in this case, the focus position, exposure time, etc. are likely to change depending on the atmosphere, time, etc., and they cannot be changed. If you are using a conventional device and want to change some of the parameters, you may need to search for the desired one from among the hundreds of parameters listed above using a list, etc.
After specifying the code name of the parameter by key input, the parameter was changed and set, and it was easy to search for the code name incorrectly or input it incorrectly. In other words, it is very difficult for the operator to change the parameters, and there is a high risk of erroneous operation and failure of the semiconductor product.

[Object of the Invention] In view of the problems of the conventional type described above, the present invention prevents erroneous operations due to incorrect parameters at the start of main operation, and allows an operator to easily, quickly and reliably check and change parameters. The purpose is to provide semiconductor manufacturing equipment.

[Explanation of Examples] Hereinafter, the present invention will be described in detail with reference to the drawings.

FIG. 1 shows the appearance of a projection exposure apparatus according to an embodiment of the present invention. In the figure, reference numeral 1 denotes a mask having an integrated circuit pattern, and also includes mask alignment marks and mask-wafer alignment marks. 2 is a mask stage that holds mask 1 and moves mask 1 within a plane (XY
direction) and rotational direction (θ direction). 3 is a reduction projection lens, 4 is a wafer provided with a photosensitive layer, and is provided with a mask/wafer alignment mark and a television/wafer alignment mark. 5 is a wafer stage. The wafer stage 5 holds the wafer 4 and moves it in the plane and in the rotational direction, and also moves between the wafer printing position (inside the projection field) and the television/wafer alignment position. 6 is an objective lens of a television/wafer alignment detection device; 7 is an image pickup tube or a solid-state imaging device; and 9 is a binocular unit, which serves to observe the surface of the wafer 4 through the projection lens 3. 10 is an illumination optical system and a mask/
This is the upper unit that houses the sensing device for wafer alignment. 11 is a console monitor receiver (console CRT) for giving commands to the main body of the projection exposure apparatus, and 12 is a keyboard for giving commands to the apparatus and inputting parameters.

FIG. 2 is a block diagram showing the electrical circuit configuration of the projection exposure apparatus of FIG. 1. In the same figure, 21 is ¥fi! The main body CPU is in charge of overall control and consists of a central processing unit such as a microcomputer or minicomputer. 2
2 is a wafer stage drive device, 23 is an alignment detection system, 24 is a reticle stage drive device, 25G is an illumination system, 26 is a shutter drive device, 27 is a focus detection system, 28 is a Z drive device, and these are the main body CP. U 21
controlled by 29 is a conveyance system.

Reference numeral 30 denotes a console unit for giving various commands and parameters regarding the operation of the exposure apparatus to the main body CPU 21. 31 is a console CPU, and 32 is an external memory for storing parameters and the like. In addition, CRT
ll and keyboard 12 are identical to those of FIG.

Next, the operation of the apparatus shown in FIGS. 1 and 2 will be described with reference to the flowchart in FIG. 3 and the example of both display surfaces in FIG. 4.

First, when an operator or the like turns on the power of this device, the console CPU 31 and main body CPU 21 each execute initialization processing (step S1), and the console unit 30 enters a state of waiting for command input (step S2). In this state, the display screen of the CRTll becomes as shown in screen D1 in FIG. 4. Screen D
1 has a command input canister at the top, which allows various commands input from the keyboard 12 to be input to the main body of the device to be monitored. The console CPU 31 determines whether the command input by the operator or the like from the keyboard 12 is a start (main operation start) command (step S3), and if not, processes each input command. After that (step $4), the command is input again (step S2).
). When a start command is input, only predetermined parameters among the many parameters stored in the external storage device are displayed on the CR'T11 (step S5).
. The screen display in this state is as shown in screen D2 in FIG.

rsTJ at the top of screen D2 is the start command input in the command input area. Predetermined parameters are displayed in the middle row.

Here, the predetermined parameters displayed in the middle of the screen are likely to be changed by the operator when starting the main operation. Therefore, when inputting the start command of the device,
By automatically displaying predetermined parameters as shown in screen D2, the operator can reliably check the main parameters at the start of processing, and can avoid erroneous operations such as starting the main operation with incorrect parameters. It can be prevented. Furthermore, these display parameters are limited to those that are originally likely to be changed by the operator, and do not include parameters that do not need to be referenced.

Therefore, since the number of culms is not long, confirmation can be performed easily and quickly. Additionally, by displaying the parameters used in the previous exposure operation, parameter changes can be made only when it is necessary to change exposure conditions such as process changes, which can simplify the work. can.

A prompt message prompting the next input is displayed at the bottom of the screen D2. When rYJ is input from step S6 and the state of screen D2, the main operation, that is, in the case of this embodiment, the exposure execution process is started according to the displayed variable makeup.

Enter "N" to wait for command input again (step 8).
Return to 2). Furthermore, if "C" is input, parameter change processing (step 87) can be performed.

In the parameter change process, first, a prompt message to specify the change item number is displayed. The screen display at this time is as shown in screen D3 in FIG. Parameter 9 of number 3 C Exposure time (EXPO8
URE TIME) and its value is 200 m3. Display at the bottom of screen D3 rcHANGE No, O
REND? J is a prompt message. Here, when "3" is keyed in as the number of the change data, in step S7), the display screen becomes as shown in double-sided D4 in FIG. 4. rEXPO8URET I in the lower row of D4
M E 20On+S J indicates the current value of the operation parameter number 3, indicating that this item is currently being changed. This value was stored in the external memory 32. To change this 2001S, change data is input (step S8). Here, 150 is keyed in to change the exposure time to 150 m5. As a result, the exposure time of pick-up 3 is changed and the display screen becomes something like D5 (without r E J i, t). If there are further items to be changed, the above parameter changing operation may be repeated from step S1. Also, if you want to end the parameter change operation, enter rEJ as the end code as shown in screen D5.
The sequence returns to step S6, and at the same time the display screen changes to D.
It becomes 2.

As mentioned above, in the projection exposure apparatus of this embodiment, the operating parameters that are automatically displayed after turning on the power are as follows:
This is a predetermined item that is likely to be changed by the operator before starting the main operation. Therefore, the operator can easily check these parameters on the display screen, but also when changing these parameters,
There is no need to search among all parameters as in the conventional method, and operation parameters can be changed easily and quickly.

Furthermore, since the number of displayed parameters is not so large, erroneous operations are reduced and changing operations are made more reliable.

In addition, in the example described above, the parameters that can be changed are the type of main operation (JOB NAME), the focus position (Focus), and the exposure time (EXPO8UR).
E TIME). This is based on the fact that in the IQ light exposure apparatus, the above three parameters are checked and changed by the operator on a daily basis. Currently, in the projection body xi, the operator hardly needs to check or change any parameters other than these. However, the parameters that can be displayed and changed can be changed as appropriate depending on various conditions such as the type of device. For example, J3 in the above embodiment can be easily changed by changing the program executed by the console CPU.

[Effects of the Invention] As explained above, according to the present invention, in semiconductor manufacturing equipment, when a main operation start command is input, a predetermined operation that is likely to be used by a person operating the equipment, such as an operator, is performed. Since the parameters are displayed and a confirmation signal is input, it is possible to prevent erroneous operations such as starting the main operation with incorrect operation parameters, and to confirm the main parameters easily, quickly and reliably. can. Further, when changing the operating parameters, there is no need to search all parameters, and it is possible to simply, quickly and reliably change only the operating parameters that are likely to be used by the person operating the device.

[Brief explanation of the drawing]

FIG. 1 is an external view of a projection exposure apparatus according to an embodiment of the present invention, FIG. 2 is a block diagram showing a control circuit of the projection exposure apparatus of the above embodiment, and FIG. 3 is an operation of the above embodiment. FIG. 4 is a flowchart for explaining the operation and an example of a display screen. 11... CRT for monitor, 12... Keyboard, 2
1...Main CPU, 30...Console, 31...
- Console CPU 132...external memory.

Claims (1)

[Claims] 1. A main operation start command input means, a means for displaying only predetermined parameters among a large number of operation parameters in the main operation, and a confirmation signal input means, the main operation start command being input. When the predetermined parameter is displayed on the display means, the main operation is started after the confirmation signal is input. 2. The main motion according to claim 1, wherein the main motion is classified into a plurality of types according to the settings of the motion parameters, and the display means displays the type of the main motion together with the predetermined parameter. Semiconductor manufacturing equipment. 3. The semiconductor manufacturing apparatus according to claim 2, wherein the input means is a keyboard, and the displayed data can be rewritten based on key input from the keyboard. 4. The semiconductor manufacturing apparatus according to claim 3, wherein when the main operation type data is rewritten, operation parameters corresponding to the rewritten main operation type are displayed. 5. The semiconductor manufacturing apparatus according to claim 2, wherein when the confirmation signal is input, the main operation is started in accordance with the displayed operation parameters regardless of whether display data is rewritten or not. 6. Claims 1 to 6, wherein the main operation is an exposure operation.
The semiconductor manufacturing apparatus according to any one of Item 5. 7. The semiconductor manufacturing apparatus according to claim 6, wherein the display data is a focus position and an exposure time parameter.