JPH0522387B2 - - Google Patents

Info

Publication number
JPH0522387B2
JPH0522387B2 JP59188402A JP18840284A JPH0522387B2 JP H0522387 B2 JPH0522387 B2 JP H0522387B2 JP 59188402 A JP59188402 A JP 59188402A JP 18840284 A JP18840284 A JP 18840284A JP H0522387 B2 JPH0522387 B2 JP H0522387B2
Authority
JP
Japan
Prior art keywords
insulating film
epitaxial layer
active region
interface
selective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59188402A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6165447A (ja
Inventor
Shiro Hine
Masao Yamawaki
Naoki Yuya
Masafumi Ueno
Satoshi Yamakawa
Masaaki Kimata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP18840284A priority Critical patent/JPS6165447A/ja
Publication of JPS6165447A publication Critical patent/JPS6165447A/ja
Publication of JPH0522387B2 publication Critical patent/JPH0522387B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Element Separation (AREA)
JP18840284A 1984-09-07 1984-09-07 半導体装置の製造方法 Granted JPS6165447A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18840284A JPS6165447A (ja) 1984-09-07 1984-09-07 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18840284A JPS6165447A (ja) 1984-09-07 1984-09-07 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS6165447A JPS6165447A (ja) 1986-04-04
JPH0522387B2 true JPH0522387B2 (enrdf_load_stackoverflow) 1993-03-29

Family

ID=16223013

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18840284A Granted JPS6165447A (ja) 1984-09-07 1984-09-07 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS6165447A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02137244A (ja) * 1988-11-17 1990-05-25 Nec Corp 半導体装置の製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5179590A (ja) * 1975-01-06 1976-07-10 Hitachi Ltd Handotaisochinoseizohoho
JPS56158446A (en) * 1980-05-12 1981-12-07 Matsushita Electric Ind Co Ltd Manufacture of semiconductor integrated circuit

Also Published As

Publication number Publication date
JPS6165447A (ja) 1986-04-04

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