JPH05198664A - ウェハーキャリヤ - Google Patents
ウェハーキャリヤInfo
- Publication number
- JPH05198664A JPH05198664A JP21642692A JP21642692A JPH05198664A JP H05198664 A JPH05198664 A JP H05198664A JP 21642692 A JP21642692 A JP 21642692A JP 21642692 A JP21642692 A JP 21642692A JP H05198664 A JPH05198664 A JP H05198664A
- Authority
- JP
- Japan
- Prior art keywords
- carrier
- wafer
- diamond
- base portion
- wafer carrier
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000576 coating method Methods 0.000 claims abstract description 41
- 229910003460 diamond Inorganic materials 0.000 claims abstract description 39
- 239000010432 diamond Substances 0.000 claims abstract description 39
- 239000000463 material Substances 0.000 claims abstract description 39
- 239000011248 coating agent Substances 0.000 claims abstract description 37
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 10
- 238000005229 chemical vapour deposition Methods 0.000 claims abstract description 3
- 239000013078 crystal Substances 0.000 claims abstract description 3
- 239000003610 charcoal Substances 0.000 claims abstract 2
- -1 polyallyletherketone Polymers 0.000 claims description 16
- 239000004696 Poly ether ether ketone Substances 0.000 claims description 6
- 239000004743 Polypropylene Substances 0.000 claims description 6
- 229920002530 polyetherether ketone Polymers 0.000 claims description 6
- 229920001155 polypropylene Polymers 0.000 claims description 6
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 claims description 5
- 229920001643 poly(ether ketone) Polymers 0.000 claims description 5
- 229920000515 polycarbonate Polymers 0.000 claims description 5
- 239000004417 polycarbonate Substances 0.000 claims description 5
- 239000004698 Polyethylene Substances 0.000 claims description 4
- 229910000831 Steel Inorganic materials 0.000 claims description 4
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 claims description 4
- 229920000573 polyethylene Polymers 0.000 claims description 4
- 239000010959 steel Substances 0.000 claims description 4
- 239000012815 thermoplastic material Substances 0.000 claims description 4
- 229920001652 poly(etherketoneketone) Polymers 0.000 claims description 3
- 229920001187 thermosetting polymer Polymers 0.000 claims description 2
- 239000004695 Polyether sulfone Substances 0.000 claims 1
- 229920003208 poly(ethylene sulfide) Polymers 0.000 claims 1
- 229920006393 polyether sulfone Polymers 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 abstract description 89
- 238000000034 method Methods 0.000 abstract description 19
- 238000011109 contamination Methods 0.000 abstract description 4
- 239000007921 spray Substances 0.000 abstract description 2
- 239000000969 carrier Substances 0.000 description 18
- 239000000126 substance Substances 0.000 description 16
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 12
- 239000007789 gas Substances 0.000 description 10
- 239000002245 particle Substances 0.000 description 7
- 229920003023 plastic Polymers 0.000 description 7
- 239000004033 plastic Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 239000004813 Perfluoroalkoxy alkane Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229920011301 perfluoro alkoxyl alkane Polymers 0.000 description 5
- 239000010453 quartz Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical group [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 239000004809 Teflon Substances 0.000 description 4
- 229920006362 Teflon® Polymers 0.000 description 4
- 229920000049 Carbon (fiber) Polymers 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 description 3
- 239000004917 carbon fiber Substances 0.000 description 3
- 230000005611 electricity Effects 0.000 description 3
- 229920002313 fluoropolymer Polymers 0.000 description 3
- 239000004811 fluoropolymer Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 238000010884 ion-beam technique Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 3
- 239000004810 polytetrafluoroethylene Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- 230000003068 static effect Effects 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000012876 carrier material Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229920001903 high density polyethylene Polymers 0.000 description 2
- 239000004700 high-density polyethylene Substances 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 230000003014 reinforcing effect Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 239000004812 Fluorinated ethylene propylene Substances 0.000 description 1
- 229920001774 Perfluoroether Polymers 0.000 description 1
- 229920012266 Poly(ether sulfone) PES Polymers 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000010943 off-gassing Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 229920009441 perflouroethylene propylene Polymers 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67326—Horizontal carrier comprising wall type elements whereby the substrates are vertically supported, e.g. comprising sidewalls
- H01L21/6733—Horizontal carrier comprising wall type elements whereby the substrates are vertically supported, e.g. comprising sidewalls characterized by a material, a roughness, a coating or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67366—Closed carriers characterised by materials, roughness, coatings or the like
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Packaging Frangible Articles (AREA)
- Packaging Of Annular Or Rod-Shaped Articles, Wearing Apparel, Cassettes, Or The Like (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US73479491A | 1991-07-23 | 1991-07-23 | |
US734794 | 1991-07-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH05198664A true JPH05198664A (ja) | 1993-08-06 |
Family
ID=24953096
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21642692A Pending JPH05198664A (ja) | 1991-07-23 | 1992-07-22 | ウェハーキャリヤ |
Country Status (6)
Country | Link |
---|---|
JP (1) | JPH05198664A (it) |
KR (1) | KR930003300A (it) |
DE (1) | DE4223326A1 (it) |
FR (1) | FR2679524A1 (it) |
GB (1) | GB2257986A (it) |
IT (1) | IT1257386B (it) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002046793A (ja) * | 2000-04-26 | 2002-02-12 | Asahi Glass Co Ltd | 光学部材用収納ケース |
JP2006347570A (ja) * | 2005-06-14 | 2006-12-28 | Toshiba Logistics Corp | パネル状物品の収納トレイ |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4300205A1 (de) * | 1993-01-07 | 1994-07-14 | Deutsche Bundespost Telekom | Probenhalterung in Kassettenform |
US6039186A (en) * | 1997-04-16 | 2000-03-21 | Fluoroware, Inc. | Composite transport carrier |
JP3282584B2 (ja) * | 1998-06-02 | 2002-05-13 | 信越ポリマー株式会社 | 精密部材用収納容器 |
DE10149037A1 (de) * | 2001-10-05 | 2003-04-24 | Infineon Technologies Ag | Waferhorde und Verfahren |
DE10215283B4 (de) * | 2002-04-05 | 2004-06-03 | Astec Halbleitertechnologie Gmbh | Vorrichtung zur Aufnahme von Substraten |
DE102010041230A1 (de) * | 2010-09-23 | 2012-03-29 | Evonik Degussa Gmbh | Verwendung von Diamond Like Carbon Schichten bei der Aufbringung metallionenfreier Halbleitertinten |
CN111270218B (zh) * | 2020-01-23 | 2021-07-06 | 电子科技大学 | 化学气相沉积碳修饰片状FeSiAl合金的制备方法 |
EP3929969B1 (de) * | 2020-06-22 | 2023-12-06 | Siltronic AG | Verfahren zum herstellen eines prozessbehälters für halbleiterwerkstücke und prozessbehälter |
EP4068343A1 (de) | 2021-04-01 | 2022-10-05 | Siltronic AG | Vorrichtung zum transport von halbleiterscheiben |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2514743B1 (fr) * | 1981-10-21 | 1986-05-09 | Rca Corp | Pellicule amorphe a base de carbone, du type diamant, et son procede de fabrication |
US4872554A (en) * | 1987-07-02 | 1989-10-10 | Fluoroware, Inc. | Reinforced carrier with embedded rigid insert |
JPH01201095A (ja) * | 1988-02-04 | 1989-08-14 | Idemitsu Petrochem Co Ltd | ダイヤモンド状炭素膜とその製造方法 |
JPH01259172A (ja) * | 1988-04-09 | 1989-10-16 | Idemitsu Petrochem Co Ltd | 粉砕機 |
JPH02186656A (ja) * | 1989-01-13 | 1990-07-20 | Hitachi Ltd | 低発塵装置 |
JP2816864B2 (ja) * | 1989-07-07 | 1998-10-27 | 大塚化学株式会社 | 搬送用ウエーハバスケット及び収納ケース |
-
1992
- 1992-07-09 KR KR1019920012200A patent/KR930003300A/ko not_active Application Discontinuation
- 1992-07-10 GB GB9214697A patent/GB2257986A/en not_active Withdrawn
- 1992-07-16 DE DE4223326A patent/DE4223326A1/de not_active Withdrawn
- 1992-07-17 IT ITTO920613A patent/IT1257386B/it active IP Right Grant
- 1992-07-22 JP JP21642692A patent/JPH05198664A/ja active Pending
- 1992-07-22 FR FR9209037A patent/FR2679524A1/fr active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002046793A (ja) * | 2000-04-26 | 2002-02-12 | Asahi Glass Co Ltd | 光学部材用収納ケース |
JP2006347570A (ja) * | 2005-06-14 | 2006-12-28 | Toshiba Logistics Corp | パネル状物品の収納トレイ |
JP4616086B2 (ja) * | 2005-06-14 | 2011-01-19 | 東芝物流株式会社 | パネル状物品の収納トレイ |
Also Published As
Publication number | Publication date |
---|---|
ITTO920613A0 (it) | 1992-07-17 |
GB2257986A (en) | 1993-01-27 |
ITTO920613A1 (it) | 1994-01-17 |
KR930003300A (ko) | 1993-02-24 |
DE4223326A1 (de) | 1993-01-28 |
IT1257386B (it) | 1996-01-15 |
FR2679524A1 (fr) | 1993-01-29 |
GB9214697D0 (en) | 1992-08-19 |
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