JPH0519812B2 - - Google Patents

Info

Publication number
JPH0519812B2
JPH0519812B2 JP57144185A JP14418582A JPH0519812B2 JP H0519812 B2 JPH0519812 B2 JP H0519812B2 JP 57144185 A JP57144185 A JP 57144185A JP 14418582 A JP14418582 A JP 14418582A JP H0519812 B2 JPH0519812 B2 JP H0519812B2
Authority
JP
Japan
Prior art keywords
semiconductor device
type
region
field effect
gate electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57144185A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5934665A (ja
Inventor
Naoki Yokoyama
Hiroyuki Onodera
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP57144185A priority Critical patent/JPS5934665A/ja
Publication of JPS5934665A publication Critical patent/JPS5934665A/ja
Publication of JPH0519812B2 publication Critical patent/JPH0519812B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/80FETs having rectifying junction gate electrodes

Landscapes

  • Junction Field-Effect Transistors (AREA)
JP57144185A 1982-08-20 1982-08-20 電界効果半導体装置の製造方法 Granted JPS5934665A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57144185A JPS5934665A (ja) 1982-08-20 1982-08-20 電界効果半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57144185A JPS5934665A (ja) 1982-08-20 1982-08-20 電界効果半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS5934665A JPS5934665A (ja) 1984-02-25
JPH0519812B2 true JPH0519812B2 (enrdf_load_stackoverflow) 1993-03-17

Family

ID=15356173

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57144185A Granted JPS5934665A (ja) 1982-08-20 1982-08-20 電界効果半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS5934665A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6180868A (ja) * 1984-09-27 1986-04-24 Nec Corp 電界効果トランジスタ
US6222240B1 (en) 1998-07-22 2001-04-24 Advanced Micro Devices, Inc. Salicide and gate dielectric formed from a single layer of refractory metal

Also Published As

Publication number Publication date
JPS5934665A (ja) 1984-02-25

Similar Documents

Publication Publication Date Title
JPH0219975B2 (enrdf_load_stackoverflow)
US5182218A (en) Production methods for compound semiconductor device having lightly doped drain structure
JP2553699B2 (ja) 半導体装置の製造方法
US4519127A (en) Method of manufacturing a MESFET by controlling implanted peak surface dopants
USRE32613E (en) Method of making contact electrodes to silicon gate, and source and drain regions, of a semiconductor device
JPH0787195B2 (ja) ショットキゲート電界効果トランジスタの製造方法
EP0104094A1 (en) Method of producing a semiconductor device, using a radiation-sensitive resist
JPH0519812B2 (enrdf_load_stackoverflow)
KR0161201B1 (ko) T형 게이트와 자기정렬 ldd 구조를 갖는 전계효과 트랜지스터의 제조방법
DE3115596C2 (enrdf_load_stackoverflow)
US4024563A (en) Doped oxide buried channel charge-coupled device
US5640029A (en) Field-effect transistor and method of producing same
JPS62122170A (ja) Misトランジスタ及びその製造方法
JPH024133B2 (enrdf_load_stackoverflow)
JPS6160591B2 (enrdf_load_stackoverflow)
JP2709086B2 (ja) 半導体装置の電極形成方法
JPS588590B2 (ja) ショットキ障壁ゲ−ト型電界効果トランジスタの製造方法
JPS6364891B2 (enrdf_load_stackoverflow)
JPH063814B2 (ja) 半導体装置の製造方法
JPH0258771B2 (enrdf_load_stackoverflow)
JPH0213929B2 (enrdf_load_stackoverflow)
JPS58115861A (ja) 半導体装置及びその製造方法
JPS59127875A (ja) シヨツトキ−バリアゲ−ト型電界効果トランジスタの製造方法
JP3042004B2 (ja) 半導体装置の製造方法
JPS5914903B2 (ja) イオン注入法を用いた電界効果型トランジスタの製造方法