JPH0517700B2 - - Google Patents

Info

Publication number
JPH0517700B2
JPH0517700B2 JP57225248A JP22524882A JPH0517700B2 JP H0517700 B2 JPH0517700 B2 JP H0517700B2 JP 57225248 A JP57225248 A JP 57225248A JP 22524882 A JP22524882 A JP 22524882A JP H0517700 B2 JPH0517700 B2 JP H0517700B2
Authority
JP
Japan
Prior art keywords
processing
sample
container
processed
processing liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57225248A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59115763A (ja
Inventor
Takayoshi Matsuyama
Terukazu Sasa
Setsuo Nagashima
Satoshi Araihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP22524882A priority Critical patent/JPS59115763A/ja
Publication of JPS59115763A publication Critical patent/JPS59115763A/ja
Publication of JPH0517700B2 publication Critical patent/JPH0517700B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Special Spraying Apparatus (AREA)
  • Apparatuses For Generation Of Mechanical Vibrations (AREA)
  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP22524882A 1982-12-21 1982-12-21 超音波フオグ処理装置 Granted JPS59115763A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22524882A JPS59115763A (ja) 1982-12-21 1982-12-21 超音波フオグ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22524882A JPS59115763A (ja) 1982-12-21 1982-12-21 超音波フオグ処理装置

Publications (2)

Publication Number Publication Date
JPS59115763A JPS59115763A (ja) 1984-07-04
JPH0517700B2 true JPH0517700B2 (enrdf_load_stackoverflow) 1993-03-09

Family

ID=16826321

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22524882A Granted JPS59115763A (ja) 1982-12-21 1982-12-21 超音波フオグ処理装置

Country Status (1)

Country Link
JP (1) JPS59115763A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02194527A (ja) * 1989-01-23 1990-08-01 Dan Sangyo Kk 被膜除去方法
JP2680933B2 (ja) * 1990-12-14 1997-11-19 信越半導体株式会社 シリコンウェハの洗浄方法及びその洗浄装置
JP2002096004A (ja) * 2000-09-21 2002-04-02 Inoue Kinzoku Kogyo Co Ltd 塗工装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5636339A (en) * 1979-08-30 1981-04-09 Sekisui Prefab Homes Ltd Punching device

Also Published As

Publication number Publication date
JPS59115763A (ja) 1984-07-04

Similar Documents

Publication Publication Date Title
JPH01143218A (ja) 半導体基板の加工方法
US6355397B1 (en) Method and apparatus for improving resist pattern developing
JPH0517700B2 (enrdf_load_stackoverflow)
JPS6238034B2 (enrdf_load_stackoverflow)
JP2002110624A (ja) 半導体基板の表面処理方法及び装置
JPH01278310A (ja) 半導体ウェハーのダイシング方法
JPS62210467A (ja) レジスト塗布方法
JPH0790628A (ja) 薄膜のエッチング装置およびエッチング方法
JPS59132127A (ja) レジストパタ−ンの形成方法及び装置
JP2563689B2 (ja) プラズマ反応装置
JPS5599725A (en) Method and device for manufacturing semiconductor device
JP2001127032A (ja) 基板の洗浄・乾燥装置および洗浄・乾燥方法
JPH076944A (ja) 薬液処理方法および装置
JPS6413730A (en) Lift-off flatting method
JPH0777810A (ja) 感光性ポリマ被膜の現像装置および現像方法
JPS6241792B2 (enrdf_load_stackoverflow)
JP3137244B2 (ja) 洗浄物の乾燥装置及びその乾燥方法
JPH04335645A (ja) フォトレジストの現像方法および現像装置
JPH0281050A (ja) フォトレジストの表面処理方法およびその装置
JPH021298B2 (enrdf_load_stackoverflow)
JPS62165937A (ja) 処理方法
JPH04167515A (ja) 半導体装置の製造方法及びその装置
JPS62241337A (ja) プラズマエツチング装置
JPH07147220A (ja) 塗布膜の乾燥方法
JPH04162514A (ja) レジスト剥離装置