JPS5643722A - Photoetching - Google Patents

Photoetching

Info

Publication number
JPS5643722A
JPS5643722A JP11967479A JP11967479A JPS5643722A JP S5643722 A JPS5643722 A JP S5643722A JP 11967479 A JP11967479 A JP 11967479A JP 11967479 A JP11967479 A JP 11967479A JP S5643722 A JPS5643722 A JP S5643722A
Authority
JP
Japan
Prior art keywords
developing solution
substrate
photoresist
supersonic wave
developed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11967479A
Other languages
Japanese (ja)
Inventor
Kaoru Konishigawa
Norio Nakajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP11967479A priority Critical patent/JPS5643722A/en
Publication of JPS5643722A publication Critical patent/JPS5643722A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3014—Imagewise removal using liquid means combined with ultrasonic means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To completely remove nonsensitized photoresist and to perform an accurate pattern formation by a method wherein an exposed substrate having a photoresist film is developed in developing solution which is oscillated by supersonic waves. CONSTITUTION:A copper foil 2 and a photoresist 16 are coated on the surface of an insulated substrate 1, a wiring pattern is exposed, then this substrate 1 is immersed into developing solution 19 and subsequently developing solution 22 is sprayed on it using a sprayer 21, for example. Next, the substrate is developed by soaking into the developing solution in a bath in which a gas-proof type supersonic wave exciter 23 is provided. The gas-proof type supersonic wave exciter 23 has a supersonic wave vibrator 26, an oscillator 27, a controller 28, a temperature sensor 29, a heater 30 and the like. Hence, no residue of photoresist film remains at all and a perfect developing can be performed in a short time.
JP11967479A 1979-09-17 1979-09-17 Photoetching Pending JPS5643722A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11967479A JPS5643722A (en) 1979-09-17 1979-09-17 Photoetching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11967479A JPS5643722A (en) 1979-09-17 1979-09-17 Photoetching

Publications (1)

Publication Number Publication Date
JPS5643722A true JPS5643722A (en) 1981-04-22

Family

ID=14767238

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11967479A Pending JPS5643722A (en) 1979-09-17 1979-09-17 Photoetching

Country Status (1)

Country Link
JP (1) JPS5643722A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0210824A (en) * 1988-06-29 1990-01-16 Matsushita Electric Ind Co Ltd Electron-beam resist developing method
CN107664263A (en) * 2016-07-29 2018-02-06 上海微电子装备（集团）股份有限公司 A kind of gas bath device and control method and application

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0210824A (en) * 1988-06-29 1990-01-16 Matsushita Electric Ind Co Ltd Electron-beam resist developing method
CN107664263A (en) * 2016-07-29 2018-02-06 上海微电子装备（集团）股份有限公司 A kind of gas bath device and control method and application
CN107664263B (en) * 2016-07-29 2019-04-12 上海微电子装备（集团）股份有限公司 A kind of gas bath device and control method and application

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