JPH04948B2 - - Google Patents
Info
- Publication number
- JPH04948B2 JPH04948B2 JP60053277A JP5327785A JPH04948B2 JP H04948 B2 JPH04948 B2 JP H04948B2 JP 60053277 A JP60053277 A JP 60053277A JP 5327785 A JP5327785 A JP 5327785A JP H04948 B2 JPH04948 B2 JP H04948B2
- Authority
- JP
- Japan
- Prior art keywords
- target
- silicon nitride
- silicon
- density
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 17
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 17
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 11
- 239000000843 powder Substances 0.000 claims description 9
- 238000004544 sputter deposition Methods 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 4
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- 235000012239 silicon dioxide Nutrition 0.000 claims description 4
- 238000010304 firing Methods 0.000 claims description 3
- 239000010408 film Substances 0.000 description 20
- 230000015572 biosynthetic process Effects 0.000 description 9
- 230000001681 protective effect Effects 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 238000005245 sintering Methods 0.000 description 6
- 238000004040 coloring Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000000395 magnesium oxide Substances 0.000 description 3
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 3
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 238000005783 Kochi reaction Methods 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001739 density measurement Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011863 silicon-based powder Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Ceramic Products (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60053277A JPS61215259A (ja) | 1985-03-19 | 1985-03-19 | スパツタリング用窒化ケイ素タ−ゲツトの製法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60053277A JPS61215259A (ja) | 1985-03-19 | 1985-03-19 | スパツタリング用窒化ケイ素タ−ゲツトの製法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61215259A JPS61215259A (ja) | 1986-09-25 |
| JPH04948B2 true JPH04948B2 (de) | 1992-01-09 |
Family
ID=12938241
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60053277A Granted JPS61215259A (ja) | 1985-03-19 | 1985-03-19 | スパツタリング用窒化ケイ素タ−ゲツトの製法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61215259A (de) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0283261A (ja) * | 1988-09-21 | 1990-03-23 | Shin Etsu Chem Co Ltd | スパッタリング用窒化珪素系ターゲット材料 |
| JP5206111B2 (ja) * | 2008-05-19 | 2013-06-12 | 大日本印刷株式会社 | イオンプレーティング用蒸発源材料の原料粉末、イオンプレーティング用蒸発源材料及びその製造方法、ガスバリア性シートの製造方法 |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54123110A (en) * | 1978-03-17 | 1979-09-25 | Tokyo Shibaura Electric Co | Production of siliconee ceramics |
| JPS56141153A (en) * | 1980-04-03 | 1981-11-04 | Toshiba Corp | Target for x-ray tube |
| JPS56169773A (en) * | 1980-05-30 | 1981-12-26 | Sharp Corp | Target for spattering by plenar magnetron |
| JPS5774177A (en) * | 1980-10-29 | 1982-05-10 | Toshiba Corp | Thin film thermal head |
| JPS5874585A (ja) * | 1981-10-26 | 1983-05-06 | 三菱マテリアル株式会社 | 高速切削用表面被覆窒化けい素基焼結部材 |
| JPS58118273A (ja) * | 1982-01-06 | 1983-07-14 | Hitachi Ltd | 感熱記録ヘツド |
| JPS58161975A (ja) * | 1982-03-16 | 1983-09-26 | 日本特殊陶業株式会社 | 窒化珪素焼結体の製造方法 |
| JPS58204451A (ja) * | 1982-05-21 | 1983-11-29 | Seiko Epson Corp | Ｘ線発生装置 |
-
1985
- 1985-03-19 JP JP60053277A patent/JPS61215259A/ja active Granted
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54123110A (en) * | 1978-03-17 | 1979-09-25 | Tokyo Shibaura Electric Co | Production of siliconee ceramics |
| JPS56141153A (en) * | 1980-04-03 | 1981-11-04 | Toshiba Corp | Target for x-ray tube |
| JPS56169773A (en) * | 1980-05-30 | 1981-12-26 | Sharp Corp | Target for spattering by plenar magnetron |
| JPS5774177A (en) * | 1980-10-29 | 1982-05-10 | Toshiba Corp | Thin film thermal head |
| JPS5874585A (ja) * | 1981-10-26 | 1983-05-06 | 三菱マテリアル株式会社 | 高速切削用表面被覆窒化けい素基焼結部材 |
| JPS58118273A (ja) * | 1982-01-06 | 1983-07-14 | Hitachi Ltd | 感熱記録ヘツド |
| JPS58161975A (ja) * | 1982-03-16 | 1983-09-26 | 日本特殊陶業株式会社 | 窒化珪素焼結体の製造方法 |
| JPS58204451A (ja) * | 1982-05-21 | 1983-11-29 | Seiko Epson Corp | Ｘ線発生装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61215259A (ja) | 1986-09-25 |
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