JPH0483367A - 電力用半導体装置 - Google Patents
電力用半導体装置Info
- Publication number
- JPH0483367A JPH0483367A JP2196330A JP19633090A JPH0483367A JP H0483367 A JPH0483367 A JP H0483367A JP 2196330 A JP2196330 A JP 2196330A JP 19633090 A JP19633090 A JP 19633090A JP H0483367 A JPH0483367 A JP H0483367A
- Authority
- JP
- Japan
- Prior art keywords
- fixed
- plate
- metal base
- insulating substrate
- ceramic insulating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 34
- 229910052751 metal Inorganic materials 0.000 claims abstract description 33
- 239000002184 metal Substances 0.000 claims abstract description 33
- 239000008188 pellet Substances 0.000 claims abstract description 32
- 239000000919 ceramic Substances 0.000 claims abstract description 27
- 239000000758 substrate Substances 0.000 claims abstract description 25
- 238000004519 manufacturing process Methods 0.000 abstract description 9
- 229910000679 solder Inorganic materials 0.000 abstract description 8
- 238000000034 method Methods 0.000 abstract description 6
- 229910052782 aluminium Inorganic materials 0.000 abstract description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 5
- 230000005855 radiation Effects 0.000 abstract 3
- 239000012212 insulator Substances 0.000 abstract 1
- 239000010949 copper Substances 0.000 description 19
- 230000017525 heat dissipation Effects 0.000 description 8
- 238000010586 diagram Methods 0.000 description 5
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 239000011733 molybdenum Substances 0.000 description 3
- 238000005476 soldering Methods 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
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- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/40—Mountings or securing means for detachable cooling or heating arrangements ; fixed by friction, plugs or springs
-
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- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
- H01L23/3735—Laminates or multilayers, e.g. direct bond copper ceramic substrates
-
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- H01L23/043—Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls the container being a hollow construction and having a conductive base as a mounting as well as a lead for the semiconductor body
- H01L23/047—Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls the container being a hollow construction and having a conductive base as a mounting as well as a lead for the semiconductor body the other leads being parallel to the base
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- H01L2224/45001—Core members of the connector
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- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/45117—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950°C
- H01L2224/45124—Aluminium (Al) as principal constituent
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- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
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- H01L2224/484—Connecting portions
- H01L2224/48463—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
- H01L2224/48465—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area being a wedge bond, i.e. ball-to-wedge, regular stitch
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- H01L2224/4847—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond
- H01L2224/48472—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond the other connecting portion not on the bonding area also being a wedge bond, i.e. wedge-to-wedge
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/4912—Layout
- H01L2224/49175—Parallel arrangements
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Abstract
め要約のデータは記録されません。
Description
レットサイズの大きい電力用半導体装置に関する。
プの電力用半導体装置の構成図である。
する際、金属とシリコンの熱膨張差によるペレットのク
ラック防止対策として放熱金属ベース21とペレット2
2との間には金属板、例えばモリブデン板23が挿入さ
れており、放熱金属ベース21、モリブデン板23及び
ペレット22の相互間は例えば、はんだ24により固着
されている。また、電極取出し部は、放熱金属ベース2
1上にメタライズセラミック26及びCu(銅)からな
る電極27が順次はんだ24によりマウントされている
。ペレット22と電極27とはアルミニウムワイヤ28
により配線されている。
だ付は工程数と共に部品点数が多くなるので、マウント
、ボンディング工程の自動化が困難であり、手作業によ
る組み立てラインを構成するのが現状である。
共に部品点数が多くなってしまい、マウント、ボンディ
ング工程の自動化が困難であり、手作業による組み立て
ラインにより製造コストが高いという欠点があった。
あり、その目的は、部品点数を削減すると共に製造工程
数を削減し、組み立てラインの自動化を図ることができ
る電力用半導体装置を提供することにある。
と、前記セラミック系絶縁基板の表面から一側面を介し
裏面に連続して巻き付くように固着された第1の導電板
と、前記第1の導電板の両側の前記セラミック系絶縁基
板の表面にそれぞれ固着された第2の導電板と、前記セ
ラミック系絶縁基板の表面における第1の導電板上に固
着された半導体ペレットと、前記半導体ペレットの電極
パッドと前記第2の導電板とを配線するボンディング用
のワイヤと、前記前記半導体ペレットが固着されていな
いセラミック系絶縁基板の裏面における第1の導電板と
固着される放熱金属ベースとから構成される。
ラミック系絶縁基板の表面から一側面を介して裏面に連
続的に存在する構成を用いることにより、製造工程数が
大幅に削減する。また、後に固着される放熱金属ベース
と半導体ペレットとの電気的接続を付属部品なしに実現
する。
。
数の削減については、D B C(DirectBon
d Copper)基板と呼ばれる、セラミック板とC
u板を直接張り付けた基板を用いることで、大略達成さ
れる。
ースの上に固定した斜視図である。放熱金属ベース11
は、例えばCu板にニッケルメッキしたものやアルミニ
ウム板が使われる。この放熱金属ベースll上にDBC
基板12が固定されている。
レットが固着されるCu板14、半導体ペレットの電極
となるCu板15が固定されているものである。セラミ
ック板13とCu板14.15とは例えば高温の酸化性
雰囲気中で固着される。図示しないが、セラミック板1
3の裏面にもCu板が固着されている。
で固着される。ここで、半導体ペレットが固着されるC
u板14と放熱金属ベース11とは電気的に接続される
必要がある。この場合、Cu板14と放熱金属ベース1
1とは、その間に絶縁体のセラミック板13を介在させ
ており、このままでは半導体ペレットと放熱金属ベース
11とは電気的に接続されない。そこで、ターミナル金
属1Bによるはんだ付けで、半導体ペレットが搭載され
るCu板14は放熱金属ベース11と電気的に接続され
る構造をとっている。
難にさせる原因にもなっており、量産性の向上を妨げて
いる。
が不要になるようなりBC基板を構成する。
係るDBC基板の構成を示す斜視図であり、(a)は半
導体ペレットが固着される面(表面)、(b)は放熱金
属ベースが固着される面(裏面)を示している。そして
、第1図(C)は同図(a)もしくは(b)のA−A’
線に沿った断面図である。
2の表面から一つの側面を介して裏面に巻き付くように
固着されている。セラミック板lの半導体ペレットが固
着される表面上において、このCu板1の両側は半導体
ペレットの電極となるCu板3が固着されている。セラ
ミック板2とCu板1.3とは例えば高温の酸化性雰囲
気中で固着される。このようにしてDEC基板4が構成
される。
u板lのU字形の溝にセラミック板2を差し込むことが
できるので、構造が簡単なうえ固定し易く、裏面への熱
伝導性も良くなるという利点が得られる。
組み立てを実施した場合の構成図である。
んだ6等によりマウントされている。ペレット5とCu
板3 (電極)とはアルミニウムワイヤ7により配線さ
れている。
れる。この場合、Cu板1は絶縁体のセラミック板2の
表面から裏面にかけて連続的に存在するので、放熱金属
ベース8とDBCEC基板4はんだ6等による通常の接
着のみで半導体ペレット5と放熱金属ベース8とが電気
的に接続される。
不要になる。
立てラインの自動化が可能となり、製品コストの削減を
図ることができる。
が固着されるCu板かDBC基板の表面から裏面にかけ
て連続的に存在する構成を用いることにより、部品点数
を削減すると共に製造工程数を削減し、組み立てライン
の自動化を図ることができる電力用半導体装置が提供で
きる。
係るDEC基板の構成を示す斜視図、第1図(c)は同
図(a)または(b)のA−A′線に沿った断面図、 第2図は上記第1図(a、)〜(c)で示すDBC基板
を用いて電力用半導体装置の組み立てを実施した場合の
構成図、 第3図はこの発明の前提となるDEC基板を放熱金属ベ
ースの上に固定した斜視図、 第4図は従来の放熱金属ベースより電極を取り出すタイ
プの電力用半導体装置の構成図である。 ■、3・・・Cu板、 2・・・セラミック板、4・・
・DEC基板、5・・・半導体ペレット、6・・・はん
だ、7・・・アルミニウムワイヤ、8・・・放熱金属ベ
ース。 出願人代理人 弁理士 鈴江武彦 第1図
Claims (1)
- 【特許請求の範囲】 セラミック系絶縁基板と、 前記セラミック系絶縁基板の表面から一側面を介し裏面
に連続して巻き付くように固着された第1の導電板と、 前記第1の導電板の両側の前記セラミック系絶縁基板の
表面にそれぞれ固着された第2の導電板と、 前記セラミック系絶縁基板の表面における第1の導電板
上に固着された半導体ペレットと、前記半導体ペレット
の電極パッドと前記第2の導電板とを配線するボンディ
ング用のワイヤと、前記半導体ペレットが固着されてい
ないセラミック系絶縁基板の裏面における第1の導電板
と固着される放熱金属ベースと を具備したことを特徴とする電力用半導体装置。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2196330A JP2504610B2 (ja) | 1990-07-26 | 1990-07-26 | 電力用半導体装置 |
DE69123298T DE69123298T2 (de) | 1990-07-26 | 1991-07-24 | Leistungshalbleiteranordnung, geeignet zur Automation der Herstellung |
EP91112419A EP0468475B1 (en) | 1990-07-26 | 1991-07-24 | Power semiconductor device suitable for automation of production |
KR1019910012787A KR950000203B1 (ko) | 1990-07-26 | 1991-07-25 | 전력용 반도체 장치 |
US07/736,230 US5216279A (en) | 1990-07-26 | 1991-07-26 | Power semiconductor device suitable for automation of production |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2196330A JP2504610B2 (ja) | 1990-07-26 | 1990-07-26 | 電力用半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0483367A true JPH0483367A (ja) | 1992-03-17 |
JP2504610B2 JP2504610B2 (ja) | 1996-06-05 |
Family
ID=16356033
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2196330A Expired - Lifetime JP2504610B2 (ja) | 1990-07-26 | 1990-07-26 | 電力用半導体装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US5216279A (ja) |
EP (1) | EP0468475B1 (ja) |
JP (1) | JP2504610B2 (ja) |
KR (1) | KR950000203B1 (ja) |
DE (1) | DE69123298T2 (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5727727A (en) * | 1995-02-02 | 1998-03-17 | Vlt Corporation | Flowing solder in a gap |
US5808358A (en) * | 1994-11-10 | 1998-09-15 | Vlt Corporation | Packaging electrical circuits |
US5876859A (en) * | 1994-11-10 | 1999-03-02 | Vlt Corporation | Direct metal bonding |
US5945130A (en) * | 1994-11-15 | 1999-08-31 | Vlt Corporation | Apparatus for circuit encapsulation |
US8587105B2 (en) | 2011-09-21 | 2013-11-19 | Kabushiki Kaisha Toshiba | Semiconductor device |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5616421A (en) * | 1991-04-08 | 1997-04-01 | Aluminum Company Of America | Metal matrix composites containing electrical insulators |
US5444300A (en) * | 1991-08-09 | 1995-08-22 | Sharp Kabushiki Kaisha | Semiconductor apparatus with heat sink |
US5309014A (en) * | 1992-04-02 | 1994-05-03 | Motorola Inc. | Transistor package |
DE4300516C2 (de) * | 1993-01-12 | 2001-05-17 | Ixys Semiconductor Gmbh | Leistungshalbleitermodul |
US5395679A (en) * | 1993-03-29 | 1995-03-07 | Delco Electronics Corp. | Ultra-thick thick films for thermal management and current carrying capabilities in hybrid circuits |
US5480727A (en) * | 1994-02-03 | 1996-01-02 | Motorola, Inc. | Electronic device assembly and method for making |
US5565705A (en) * | 1994-05-02 | 1996-10-15 | Motorola, Inc. | Electronic module for removing heat from a semiconductor die |
US5956231A (en) * | 1994-10-07 | 1999-09-21 | Hitachi, Ltd. | Semiconductor device having power semiconductor elements |
DE69603664T2 (de) * | 1995-05-30 | 2000-03-16 | Motorola Inc | Hybrid-Multichip-Modul und Verfahren zur seiner Herstellung |
US5798566A (en) * | 1996-01-11 | 1998-08-25 | Ngk Spark Plug Co., Ltd. | Ceramic IC package base and ceramic cover |
EP0805492B1 (de) * | 1996-04-03 | 2004-06-30 | Jürgen Dr.-Ing. Schulz-Harder | Gewölbtes Metall-Keramik-Substrat |
US6316737B1 (en) | 1999-09-09 | 2001-11-13 | Vlt Corporation | Making a connection between a component and a circuit board |
US6777784B1 (en) * | 2000-10-17 | 2004-08-17 | National Semiconductor Corporation | Bipolar transistor-based electrostatic discharge (ESD) protection structure with a heat sink |
US7443229B1 (en) | 2001-04-24 | 2008-10-28 | Picor Corporation | Active filtering |
US6985341B2 (en) * | 2001-04-24 | 2006-01-10 | Vlt, Inc. | Components having actively controlled circuit elements |
JP4806803B2 (ja) * | 2003-10-21 | 2011-11-02 | Dowaメタルテック株式会社 | 金属−セラミックス接合基板およびその製造方法 |
EP2302688A1 (de) | 2009-09-23 | 2011-03-30 | Robert Bosch GmbH | Verfahren zur Herstellung eines Substrats mit einer farbigen Interferenzfilterschicht, dieses Substrat, enthaltend eine farbige Interferenzfilterschicht, die Verwendung dieses Substrats als farbige Solarzelle oder als farbiges Solarmodul oder als Bestandteil hiervon sowie ein Array, umfassend mindestens zwei dieser Substrate |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3994430A (en) * | 1975-07-30 | 1976-11-30 | General Electric Company | Direct bonding of metals to ceramics and metals |
US4518982A (en) * | 1981-02-27 | 1985-05-21 | Motorola, Inc. | High current package with multi-level leads |
JPS60113931A (ja) * | 1983-11-25 | 1985-06-20 | Toshiba Corp | 半導体装置 |
JPH0810710B2 (ja) * | 1984-02-24 | 1996-01-31 | 株式会社東芝 | 良熱伝導性基板の製造方法 |
JPS6142928A (ja) * | 1984-07-31 | 1986-03-01 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 半導体パワ−・デバイス・パツケ−ジ |
DE3477531D1 (en) * | 1984-11-15 | 1989-05-03 | Fuji Electric Co Ltd | Semiconductor device comprising a support body |
IT1202657B (it) * | 1987-03-09 | 1989-02-09 | Sgs Microelettronica Spa | Procedimento di fabbricazione di un dispositivo modulare di potenza a semiconduttore e dispositivo con esso ottenento |
US5012324A (en) * | 1987-07-03 | 1991-04-30 | Doduco Gmbh And Co. Dr. Eugen Durrwachter | Flat body, particularly for use as a heat sink for electronic power components |
DE3813364A1 (de) * | 1988-04-21 | 1989-11-02 | Bodenseewerk Geraetetech | Vorrichtung zur waermeabfuhr von bauelementen auf einer leiterplatte |
DE3922485C1 (ja) * | 1989-07-08 | 1990-06-13 | Doduco Gmbh + Co Dr. Eugen Duerrwaechter, 7530 Pforzheim, De |
-
1990
- 1990-07-26 JP JP2196330A patent/JP2504610B2/ja not_active Expired - Lifetime
-
1991
- 1991-07-24 EP EP91112419A patent/EP0468475B1/en not_active Expired - Lifetime
- 1991-07-24 DE DE69123298T patent/DE69123298T2/de not_active Expired - Lifetime
- 1991-07-25 KR KR1019910012787A patent/KR950000203B1/ko not_active IP Right Cessation
- 1991-07-26 US US07/736,230 patent/US5216279A/en not_active Expired - Lifetime
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5808358A (en) * | 1994-11-10 | 1998-09-15 | Vlt Corporation | Packaging electrical circuits |
US5876859A (en) * | 1994-11-10 | 1999-03-02 | Vlt Corporation | Direct metal bonding |
US5906310A (en) * | 1994-11-10 | 1999-05-25 | Vlt Corporation | Packaging electrical circuits |
US5938104A (en) * | 1994-11-10 | 1999-08-17 | Vlt Corporation | Direct metal bonding |
US6096981A (en) * | 1994-11-10 | 2000-08-01 | Vlt Corporation | Packaging electrical circuits |
US6159772A (en) * | 1994-11-10 | 2000-12-12 | Vlt Corporation | Packaging electrical circuits |
US5945130A (en) * | 1994-11-15 | 1999-08-31 | Vlt Corporation | Apparatus for circuit encapsulation |
US6403009B1 (en) * | 1994-11-15 | 2002-06-11 | Vlt Corporation | Circuit encapsulation |
US6710257B2 (en) | 1994-11-15 | 2004-03-23 | Vlt Corporation | Circuit encapsulation |
US5727727A (en) * | 1995-02-02 | 1998-03-17 | Vlt Corporation | Flowing solder in a gap |
US8587105B2 (en) | 2011-09-21 | 2013-11-19 | Kabushiki Kaisha Toshiba | Semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
EP0468475A1 (en) | 1992-01-29 |
KR950000203B1 (ko) | 1995-01-11 |
EP0468475B1 (en) | 1996-11-27 |
DE69123298T2 (de) | 1997-04-24 |
US5216279A (en) | 1993-06-01 |
JP2504610B2 (ja) | 1996-06-05 |
KR920003485A (ko) | 1992-02-29 |
DE69123298D1 (de) | 1997-01-09 |
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