JPH047499B2 - - Google Patents

Info

Publication number
JPH047499B2
JPH047499B2 JP58000686A JP68683A JPH047499B2 JP H047499 B2 JPH047499 B2 JP H047499B2 JP 58000686 A JP58000686 A JP 58000686A JP 68683 A JP68683 A JP 68683A JP H047499 B2 JPH047499 B2 JP H047499B2
Authority
JP
Japan
Prior art keywords
plating
photoresist
composition
copper
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58000686A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59125726A (ja
Inventor
Hiroyuki Uchida
Jun Nakauchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Rayon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Rayon Co Ltd filed Critical Mitsubishi Rayon Co Ltd
Priority to JP68683A priority Critical patent/JPS59125726A/ja
Publication of JPS59125726A publication Critical patent/JPS59125726A/ja
Publication of JPH047499B2 publication Critical patent/JPH047499B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/085Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0073Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
JP68683A 1983-01-06 1983-01-06 光重合性樹脂組成物 Granted JPS59125726A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP68683A JPS59125726A (ja) 1983-01-06 1983-01-06 光重合性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP68683A JPS59125726A (ja) 1983-01-06 1983-01-06 光重合性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS59125726A JPS59125726A (ja) 1984-07-20
JPH047499B2 true JPH047499B2 (OSRAM) 1992-02-12

Family

ID=11480639

Family Applications (1)

Application Number Title Priority Date Filing Date
JP68683A Granted JPS59125726A (ja) 1983-01-06 1983-01-06 光重合性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS59125726A (OSRAM)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61186952A (ja) * 1985-02-15 1986-08-20 Mitsubishi Rayon Co Ltd 光重合性樹脂組成物
JPS61260237A (ja) * 1985-05-15 1986-11-18 Hitachi Chem Co Ltd 感光性樹脂組成物
JP2606259B2 (ja) * 1988-03-02 1997-04-30 東洋紡績株式会社 光重合性組成物
JPH0217697A (ja) * 1988-07-05 1990-01-22 Mitsubishi Electric Corp 高密度プリント回路板の製造方法
JPH0217698A (ja) * 1988-07-05 1990-01-22 Mitsubishi Electric Corp 高密度プリント回路板の製造方法
JP2596089B2 (ja) * 1988-09-21 1997-04-02 日立化成工業株式会社 感光性樹脂組成物および感光性樹脂組成物積層体
JPH0511439A (ja) * 1990-09-13 1993-01-22 Fuji Photo Film Co Ltd 光重合性組成物
GB9326553D0 (en) * 1993-12-30 1994-03-02 Hercules Inc Staining inhibitor for photopolymerizable compositions
IE941002A1 (en) * 1994-12-22 1996-06-26 Loctite Ireland Ltd Air-activatable polymerisable compositions containing¹tetrazoles

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS545292A (en) * 1977-06-15 1979-01-16 Mitsubishi Heavy Ind Ltd Grinding device

Also Published As

Publication number Publication date
JPS59125726A (ja) 1984-07-20

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