JPH0466094B2 - - Google Patents
Info
- Publication number
- JPH0466094B2 JPH0466094B2 JP10531085A JP10531085A JPH0466094B2 JP H0466094 B2 JPH0466094 B2 JP H0466094B2 JP 10531085 A JP10531085 A JP 10531085A JP 10531085 A JP10531085 A JP 10531085A JP H0466094 B2 JPH0466094 B2 JP H0466094B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- pattern
- mask
- section
- mask plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 238000000034 method Methods 0.000 description 6
- 239000011521 glass Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000002950 deficient Effects 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60105310A JPS61263124A (ja) | 1985-05-16 | 1985-05-16 | 半導体装置製造用のマスク板 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60105310A JPS61263124A (ja) | 1985-05-16 | 1985-05-16 | 半導体装置製造用のマスク板 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61263124A JPS61263124A (ja) | 1986-11-21 |
| JPH0466094B2 true JPH0466094B2 (enrdf_load_stackoverflow) | 1992-10-22 |
Family
ID=14404129
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60105310A Granted JPS61263124A (ja) | 1985-05-16 | 1985-05-16 | 半導体装置製造用のマスク板 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61263124A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003022987A (ja) * | 2001-07-09 | 2003-01-24 | Sanyo Electric Co Ltd | 化合物半導体装置の製造方法 |
-
1985
- 1985-05-16 JP JP60105310A patent/JPS61263124A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61263124A (ja) | 1986-11-21 |
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