JPH0447979B2 - - Google Patents

Info

Publication number
JPH0447979B2
JPH0447979B2 JP58206413A JP20641383A JPH0447979B2 JP H0447979 B2 JPH0447979 B2 JP H0447979B2 JP 58206413 A JP58206413 A JP 58206413A JP 20641383 A JP20641383 A JP 20641383A JP H0447979 B2 JPH0447979 B2 JP H0447979B2
Authority
JP
Japan
Prior art keywords
insulating layer
wiring
opening
vertical wiring
semiconductor substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58206413A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6098654A (ja
Inventor
Tadayoshi Enomoto
Masaaki Yasumoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP58206413A priority Critical patent/JPS6098654A/ja
Publication of JPS6098654A publication Critical patent/JPS6098654A/ja
Publication of JPH0447979B2 publication Critical patent/JPH0447979B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10W90/00—
    • H10W72/07251—
    • H10W72/20—
    • H10W90/297—
    • H10W90/722—

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP58206413A 1983-11-02 1983-11-02 半導体装置の製造方法 Granted JPS6098654A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58206413A JPS6098654A (ja) 1983-11-02 1983-11-02 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58206413A JPS6098654A (ja) 1983-11-02 1983-11-02 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS6098654A JPS6098654A (ja) 1985-06-01
JPH0447979B2 true JPH0447979B2 (index.php) 1992-08-05

Family

ID=16522951

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58206413A Granted JPS6098654A (ja) 1983-11-02 1983-11-02 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS6098654A (index.php)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6215834A (ja) * 1985-07-15 1987-01-24 Nec Corp 多層配線
JPS62219954A (ja) * 1986-03-20 1987-09-28 Fujitsu Ltd 三次元ｉｃの製造方法
US6809421B1 (en) 1996-12-02 2004-10-26 Kabushiki Kaisha Toshiba Multichip semiconductor device, chip therefor and method of formation thereof
JP4110390B2 (ja) * 2002-03-19 2008-07-02 セイコーエプソン株式会社 半導体装置の製造方法
JP2004342990A (ja) 2003-05-19 2004-12-02 Seiko Epson Corp 半導体装置及びその製造方法、回路基板並びに電子機器
JP5526529B2 (ja) * 2008-11-18 2014-06-18 株式会社ニコン 積層半導体装置及び積層半導体装置の製造方法

Also Published As

Publication number Publication date
JPS6098654A (ja) 1985-06-01

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