|
JPS63232322A
(ja)
*
|
1987-03-20 |
1988-09-28 |
Canon Inc |
位置合せ方法
|
|
JPS63232326A
(ja)
*
|
1987-03-20 |
1988-09-28 |
Canon Inc |
位置合せ方法
|
|
JPS63232321A
(ja)
*
|
1987-03-20 |
1988-09-28 |
Canon Inc |
位置合せ方法
|
|
JPS63299122A
(ja)
*
|
1987-05-29 |
1988-12-06 |
Canon Inc |
露光装置の位置合せ方法
|
|
JP2517637B2
(ja)
*
|
1988-02-15 |
1996-07-24 |
キヤノン株式会社 |
マ―ク位置検出方法及びそれが適用される装置
|
|
JPH01243419A
(ja)
*
|
1988-03-25 |
1989-09-28 |
Hitachi Ltd |
位置合わせ方法
|
|
JP2711582B2
(ja)
*
|
1990-05-29 |
1998-02-10 |
キヤノン株式会社 |
位置合わせ方法
|
|
JP2698217B2
(ja)
*
|
1991-01-09 |
1998-01-19 |
株式会社日立製作所 |
半導体ウエハの位置合わせ方法
|
|
JP3991165B2
(ja)
*
|
1995-06-20 |
2007-10-17 |
株式会社ニコン |
位置合わせ方法及び露光方法
|
|
JPH09148217A
(ja)
*
|
1995-11-17 |
1997-06-06 |
Mitsubishi Electric Corp |
位置合わせ方法
|
|
JP2663939B2
(ja)
*
|
1996-06-13 |
1997-10-15 |
株式会社ニコン |
位置合わせ方法
|
|
JPH1079333A
(ja)
*
|
1996-09-03 |
1998-03-24 |
Mitsubishi Electric Corp |
位置合わせ方法
|
|
SG88824A1
(en)
|
1996-11-28 |
2002-05-21 |
Nikon Corp |
Projection exposure method
|
|
US6885908B2
(en)
|
1997-02-14 |
2005-04-26 |
Nikon Corporation |
Method of determining movement sequence, alignment apparatus, method and apparatus of designing optical system, and medium in which program realizing the designing method
|
|
JPH10303126A
(ja)
|
1997-02-28 |
1998-11-13 |
Nikon Corp |
移動シーケンスの決定方法
|
|
JP3634563B2
(ja)
*
|
1997-05-09 |
2005-03-30 |
キヤノン株式会社 |
露光方法および装置並びにデバイス製造方法
|
|
US6180289B1
(en)
|
1997-07-23 |
2001-01-30 |
Nikon Corporation |
Projection-microlithography mask with separate mask substrates
|
|
JPH11142121A
(ja)
|
1997-11-11 |
1999-05-28 |
Nikon Corp |
レチクルの歪み計測方法および歪み計測装置
|
|
AU1053199A
(en)
|
1997-11-14 |
1999-06-07 |
Nikon Corporation |
Exposure apparatus and method of manufacturing the same, and exposure method
|
|
KR20010032714A
(ko)
|
1997-12-03 |
2001-04-25 |
오노 시게오 |
기판 반송방법 및 기판 반송장치, 이것을 구비한 노광장치및 이 노광장치를 이용한 디바이스 제조방법
|
|
JP2000173897A
(ja)
|
1998-12-08 |
2000-06-23 |
Mitsubishi Electric Corp |
露光精度制御方法、装置および記録媒体
|
|
TW466542B
(en)
|
1999-02-26 |
2001-12-01 |
Nippon Kogaku Kk |
A stage device and a method of manufacturing same, a position controlling method, an exposure device and a method of manufacturing same, and a device and a method of manufacturing same
|
|
JP2000353657A
(ja)
|
1999-06-14 |
2000-12-19 |
Mitsubishi Electric Corp |
露光方法、露光装置およびその露光装置を用いて製造された半導体装置
|
|
US6958808B2
(en)
|
2000-11-16 |
2005-10-25 |
Nikon Corporation |
System and method for resetting a reaction mass assembly of a stage assembly
|
|
US6885430B2
(en)
|
2000-11-16 |
2005-04-26 |
Nikon Corporation |
System and method for resetting a reaction mass assembly of a stage assembly
|
|
US6788385B2
(en)
|
2001-06-21 |
2004-09-07 |
Nikon Corporation |
Stage device, exposure apparatus and method
|
|
TWI338323B
(en)
|
2003-02-17 |
2011-03-01 |
Nikon Corp |
Stage device, exposure device and manufacguring method of devices
|
|
JPWO2004075268A1
(ja)
|
2003-02-19 |
2006-06-01 |
株式会社ニコン |
移動方法、露光方法及び露光装置、並びにデバイス製造方法
|
|
KR101163435B1
(ko)
|
2003-04-09 |
2012-07-13 |
가부시키가이샤 니콘 |
노광 방법 및 장치, 그리고 디바이스 제조 방법
|
|
KR101475657B1
(ko)
|
2003-04-11 |
2014-12-22 |
가부시키가이샤 니콘 |
액침 리소그래피 머신에서 웨이퍼 교환동안 투영 렌즈 아래의 갭에서 액침 액체를 유지하는 장치 및 방법
|
|
KR101187617B1
(ko)
|
2003-06-19 |
2012-10-08 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조방법
|
|
EP1655765B1
(en)
|
2003-08-07 |
2009-04-15 |
Nikon Corporation |
Exposure method
|
|
TWI598934B
(zh)
|
2003-10-09 |
2017-09-11 |
Nippon Kogaku Kk |
Exposure apparatus, exposure method, and device manufacturing method
|
|
TWI569308B
(zh)
|
2003-10-28 |
2017-02-01 |
尼康股份有限公司 |
照明光學裝置、曝光裝置、曝光方法以及元件製造 方法
|
|
TWI385414B
(zh)
|
2003-11-20 |
2013-02-11 |
尼康股份有限公司 |
光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法
|
|
KR101389249B1
(ko)
|
2004-01-07 |
2014-04-24 |
가부시키가이샤 니콘 |
적층 장치 및 집적 회로 소자의 적층 방법
|
|
US7589822B2
(en)
|
2004-02-02 |
2009-09-15 |
Nikon Corporation |
Stage drive method and stage unit, exposure apparatus, and device manufacturing method
|
|
KR101945638B1
(ko)
|
2004-02-04 |
2019-02-07 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
|
TWI494972B
(zh)
|
2004-02-06 |
2015-08-01 |
尼康股份有限公司 |
偏光變換元件、光學照明裝置、曝光裝置以及曝光方法
|
|
US7728953B2
(en)
|
2004-03-01 |
2010-06-01 |
Nikon Corporation |
Exposure method, exposure system, and substrate processing apparatus
|
|
US7034917B2
(en)
|
2004-04-01 |
2006-04-25 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and device manufactured thereby
|
|
KR101206671B1
(ko)
|
2004-04-09 |
2012-11-29 |
가부시키가이샤 니콘 |
이동체의 구동 방법, 스테이지 장치 및 노광 장치
|
|
US7259828B2
(en)
*
|
2004-05-14 |
2007-08-21 |
Asml Netherlands B.V. |
Alignment system and method and device manufactured thereby
|
|
KR101119814B1
(ko)
|
2004-06-07 |
2012-03-06 |
가부시키가이샤 니콘 |
스테이지 장치, 노광 장치 및 노광 방법
|
|
KR101323967B1
(ko)
|
2004-06-09 |
2013-10-31 |
가부시키가이샤 니콘 |
기판 유지 장치 및 그것을 구비하는 노광 장치, 노광 방법, 디바이스 제조 방법, 그리고 발액 플레이트
|
|
KR101191057B1
(ko)
|
2004-08-19 |
2012-10-15 |
가부시키가이샤 니콘 |
얼라인먼트 정보 표시 방법과 그 프로그램, 얼라인먼트방법, 노광 방법, 디바이스 제조 방법, 표시 시스템, 표시장치, 프로그램 및 측정/검사 장치
|
|
JP2006140204A
(ja)
*
|
2004-11-10 |
2006-06-01 |
Nikon Corp |
計測条件の最適化方法、該最適化方法を使用した位置計測方法、該位置計測方法を使用した位置合わせ方法、該位置合わせ方法を使用したデバイス製造方法、計測条件の最適化システム、該最適化システムを使用した位置計測装置及び該位置計測装置を使用した露光装置
|
|
US7557529B2
(en)
|
2005-01-11 |
2009-07-07 |
Nikon Corporation |
Stage unit and exposure apparatus
|
|
EP1873816A4
(en)
|
2005-04-18 |
2010-11-24 |
Nikon Corp |
EXPOSURE DEVICE, EXPOSURE METHOD AND COMPONENTS MANUFACTURING METHOD
|
|
KR101762083B1
(ko)
|
2005-05-12 |
2017-07-26 |
가부시키가이샤 니콘 |
투영 광학계, 노광 장치 및 노광 방법
|
|
JP2006339303A
(ja)
*
|
2005-05-31 |
2006-12-14 |
Nikon Corp |
露光装置、露光方法及びデバイスの製造方法
|
|
JPWO2007055237A1
(ja)
|
2005-11-09 |
2009-04-30 |
株式会社ニコン |
露光装置及び露光方法、並びにデバイス製造方法
|
|
US8411271B2
(en)
|
2005-12-28 |
2013-04-02 |
Nikon Corporation |
Pattern forming method, pattern forming apparatus, and device manufacturing method
|
|
TWI457977B
(zh)
|
2005-12-28 |
2014-10-21 |
尼康股份有限公司 |
A pattern forming method and a pattern forming apparatus, and an element manufacturing method
|
|
CN102636966B
(zh)
|
2005-12-28 |
2014-12-03 |
株式会社尼康 |
曝光方法及曝光装置、以及元件制造方法
|
|
TWI574305B
(zh)
|
2006-01-19 |
2017-03-11 |
尼康股份有限公司 |
曝光裝置及曝光方法、以及元件製造方法
|
|
EP1986223A4
(en)
|
2006-02-16 |
2010-08-25 |
Nikon Corp |
EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
|
|
TW200801833A
(en)
|
2006-02-16 |
2008-01-01 |
Nikon Corp |
Exposure apparatus, exposure method and device manufacturing method
|
|
KR20080103564A
(ko)
|
2006-02-16 |
2008-11-27 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
|
US8134681B2
(en)
|
2006-02-17 |
2012-03-13 |
Nikon Corporation |
Adjustment method, substrate processing method, substrate processing apparatus, exposure apparatus, inspection apparatus, measurement and/or inspection system, processing apparatus, computer system, program and information recording medium
|
|
EP3115844B1
(en)
|
2006-02-21 |
2018-08-15 |
Nikon Corporation |
Exposure apparatus, exposure method and device manufacturing method
|
|
WO2007097380A1
(ja)
|
2006-02-21 |
2007-08-30 |
Nikon Corporation |
パターン形成装置及びパターン形成方法、移動体駆動システム及び移動体駆動方法、露光装置及び露光方法、並びにデバイス製造方法
|
|
JP5177674B2
(ja)
|
2006-02-21 |
2013-04-03 |
株式会社ニコン |
測定装置及び方法、パターン形成装置及び方法、並びにデバイス製造方法
|
|
JP5077770B2
(ja)
|
2006-03-07 |
2012-11-21 |
株式会社ニコン |
デバイス製造方法、デバイス製造システム及び測定検査装置
|
|
TWI454859B
(zh)
|
2006-03-30 |
2014-10-01 |
尼康股份有限公司 |
移動體裝置、曝光裝置與曝光方法以及元件製造方法
|
|
US8125613B2
(en)
|
2006-04-21 |
2012-02-28 |
Nikon Corporation |
Exposure apparatus, exposure method, and device manufacturing method
|
|
JP5217239B2
(ja)
|
2006-05-18 |
2013-06-19 |
株式会社ニコン |
露光方法及び装置、メンテナンス方法、並びにデバイス製造方法
|
|
TW200818256A
(en)
|
2006-05-22 |
2008-04-16 |
Nikon Corp |
Exposure method and apparatus, maintenance method, and device manufacturing method
|
|
TWI425318B
(zh)
|
2006-06-09 |
2014-02-01 |
尼康股份有限公司 |
移動體裝置、曝光裝置和曝光方法以及元件製造方法
|
|
JP4865414B2
(ja)
*
|
2006-06-22 |
2012-02-01 |
トッキ株式会社 |
アライメント方法
|
|
TWI572995B
(zh)
|
2006-08-31 |
2017-03-01 |
尼康股份有限公司 |
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|
|
TWI547771B
(zh)
|
2006-08-31 |
2016-09-01 |
尼康股份有限公司 |
Mobile body drive system and moving body driving method, pattern forming apparatus and method, exposure apparatus and method, component manufacturing method, and method of determining
|
|
CN101405840B
(zh)
|
2006-08-31 |
2012-01-18 |
株式会社尼康 |
移动体驱动方法和移动体驱动系统、图案形成方法和装置、曝光方法和装置、以及组件制造方法
|
|
TWI574304B
(zh)
|
2006-09-01 |
2017-03-11 |
尼康股份有限公司 |
Mobile body driving method and moving body driving system, pattern forming method and apparatus, exposure method and apparatus, component manufacturing method, and correcting method
|
|
TW201610608A
(zh)
|
2006-09-01 |
2016-03-16 |
尼康股份有限公司 |
移動體驅動方法及移動體驅動系統、圖案形成方法及裝置、曝光方法及裝置、以及元件製造方法
|
|
TWI457723B
(zh)
|
2006-09-08 |
2014-10-21 |
尼康股份有限公司 |
A mask, an exposure device, and an element manufacturing method
|
|
KR101549709B1
(ko)
|
2006-11-09 |
2015-09-11 |
가부시키가이샤 니콘 |
유지 장치, 위치 검출 장치 및 노광 장치, 이동 방법, 위치검출 방법, 노광 방법, 검출계의 조정 방법, 그리고 디바이스 제조 방법
|
|
US8164736B2
(en)
|
2007-05-29 |
2012-04-24 |
Nikon Corporation |
Exposure method, exposure apparatus, and method for producing device
|
|
US8098362B2
(en)
|
2007-05-30 |
2012-01-17 |
Nikon Corporation |
Detection device, movable body apparatus, pattern formation apparatus and pattern formation method, exposure apparatus and exposure method, and device manufacturing method
|
|
WO2009011119A1
(ja)
|
2007-07-13 |
2009-01-22 |
Nikon Corporation |
パターン形成方法及び装置、露光方法及び装置、並びにデバイス製造方法及びデバイス
|
|
KR101614666B1
(ko)
|
2007-07-18 |
2016-04-21 |
가부시키가이샤 니콘 |
계측 방법, 스테이지 장치, 및 노광 장치
|
|
TWI534408B
(zh)
*
|
2007-07-24 |
2016-05-21 |
尼康股份有限公司 |
Position measuring system, exposure apparatus, position measuring method, exposure method and component manufacturing method, and measuring tool and measuring method
|
|
US9304412B2
(en)
|
2007-08-24 |
2016-04-05 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and measuring method
|
|
US8867022B2
(en)
|
2007-08-24 |
2014-10-21 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and apparatus, and device manufacturing method
|
|
US8237919B2
(en)
|
2007-08-24 |
2012-08-07 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method for continuous position measurement of movable body before and after switching between sensor heads
|
|
US8023106B2
(en)
|
2007-08-24 |
2011-09-20 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
|
|
US8218129B2
(en)
|
2007-08-24 |
2012-07-10 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, measuring method, and position measurement system
|
|
JP5267029B2
(ja)
|
2007-10-12 |
2013-08-21 |
株式会社ニコン |
照明光学装置、露光装置及びデバイスの製造方法
|
|
US8379187B2
(en)
|
2007-10-24 |
2013-02-19 |
Nikon Corporation |
Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
|
|
US9116346B2
(en)
|
2007-11-06 |
2015-08-25 |
Nikon Corporation |
Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
|
|
WO2009084244A1
(ja)
|
2007-12-28 |
2009-07-09 |
Nikon Corporation |
露光装置、移動体駆動システム、パターン形成装置、及び露光方法、並びにデバイス製造方法
|
|
JP2009206143A
(ja)
*
|
2008-02-26 |
2009-09-10 |
Seiko Instruments Inc |
アライメント方法
|
|
JP2011029458A
(ja)
*
|
2009-07-27 |
2011-02-10 |
Nikon Corp |
積層型半導体素子の製造方法、及び積層型半導体素子の製造装置
|
|
KR101962487B1
(ko)
|
2011-02-22 |
2019-07-17 |
가부시키가이샤 니콘 |
유지 장치, 노광 장치, 및 디바이스의 제조 방법
|
|
JP6159072B2
(ja)
|
2011-11-30 |
2017-07-05 |
キヤノン株式会社 |
インプリント装置、インプリント方法及び物品の製造方法
|
|
US10134622B2
(en)
|
2012-06-06 |
2018-11-20 |
Ev Group E. Thallner Gmbh |
Apparatus and method for ascertaining orientation errors
|
|
JP6643834B2
(ja)
*
|
2015-09-02 |
2020-02-12 |
キヤノン株式会社 |
ディストーション検出方法、露光装置、露光方法、およびデバイス製造方法
|
|
JP6337179B2
(ja)
*
|
2017-05-10 |
2018-06-06 |
エーファウ・グループ・エー・タルナー・ゲーエムベーハー |
位置合わせ誤差を求めるための装置と方法
|
|
JP7580297B2
(ja)
|
2021-02-22 |
2024-11-11 |
キヤノン株式会社 |
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|
|
JP7745407B2
(ja)
|
2021-10-01 |
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キヤノン株式会社 |
基板上の複数のショット領域の配列を求める方法、露光方法、露光装置、物品の製造方法、プログラム及び情報処理装置
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