JPH0447968B2 - - Google Patents

Info

Publication number
JPH0447968B2
JPH0447968B2 JP59167020A JP16702084A JPH0447968B2 JP H0447968 B2 JPH0447968 B2 JP H0447968B2 JP 59167020 A JP59167020 A JP 59167020A JP 16702084 A JP16702084 A JP 16702084A JP H0447968 B2 JPH0447968 B2 JP H0447968B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP59167020A
Other versions
JPS6144429A (en
Inventor
Toshikazu Umadate
Original Assignee
Nippon Kogaku Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku Kk filed Critical Nippon Kogaku Kk
Priority to JP59167020A priority Critical patent/JPH0447968B2/ja
Publication of JPS6144429A publication Critical patent/JPS6144429A/en
Priority claimed from US06/915,027 external-priority patent/US4780617A/en
Publication of JPH0447968B2 publication Critical patent/JPH0447968B2/ja
Anticipated expiration legal-status Critical
Application status is Expired - Fee Related legal-status Critical

Links

JP59167020A 1984-08-09 1984-08-09 Expired - Fee Related JPH0447968B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59167020A JPH0447968B2 (en) 1984-08-09 1984-08-09

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP59167020A JPH0447968B2 (en) 1984-08-09 1984-08-09
US06/915,027 US4780617A (en) 1984-08-09 1986-10-03 Method for successive alignment of chip patterns on a substrate

Publications (2)

Publication Number Publication Date
JPS6144429A JPS6144429A (en) 1986-03-04
JPH0447968B2 true JPH0447968B2 (en) 1992-08-05

Family

ID=15841900

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59167020A Expired - Fee Related JPH0447968B2 (en) 1984-08-09 1984-08-09

Country Status (1)

Country Link
JP (1) JPH0447968B2 (en)

Families Citing this family (97)

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JPH0468767B2 (en) * 1987-03-20 1992-11-04 Canon Kk
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JP2009206143A (en) * 2008-02-26 2009-09-10 Seiko Instruments Inc Alignment method
JP2011029458A (en) * 2009-07-27 2011-02-10 Nikon Corp Method and apparatus for manufacturing multilayer semiconductor device
WO2012115002A1 (en) 2011-02-22 2012-08-30 株式会社ニコン Holding device, exposure device and production method for device
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JP6502846B2 (en) * 2012-06-06 2019-04-17 エーファウ・グループ・エー・タルナー・ゲーエムベーハー Apparatus and method for determining registration error
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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS531552A (en) * 1976-06-25 1978-01-09 Honda Motor Co Ltd Coordinate selffestimating calculation system with multiipoint measurement
JPS58103136A (en) * 1981-12-16 1983-06-20 Nippon Kogaku Kk <Nikon> Gap setter
JPS5954225A (en) * 1982-09-21 1984-03-29 Hitachi Ltd Projection exposure method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS531552A (en) * 1976-06-25 1978-01-09 Honda Motor Co Ltd Coordinate selffestimating calculation system with multiipoint measurement
JPS58103136A (en) * 1981-12-16 1983-06-20 Nippon Kogaku Kk <Nikon> Gap setter
JPS5954225A (en) * 1982-09-21 1984-03-29 Hitachi Ltd Projection exposure method

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Legal Events

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LAPS Cancellation because of no payment of annual fees