JPH0447455B2 - - Google Patents

Info

Publication number
JPH0447455B2
JPH0447455B2 JP62041752A JP4175287A JPH0447455B2 JP H0447455 B2 JPH0447455 B2 JP H0447455B2 JP 62041752 A JP62041752 A JP 62041752A JP 4175287 A JP4175287 A JP 4175287A JP H0447455 B2 JPH0447455 B2 JP H0447455B2
Authority
JP
Japan
Prior art keywords
chamber
light source
reaction chamber
reaction
pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62041752A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62216223A (ja
Inventor
Shunpei Yamazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
Original Assignee
Semiconductor Energy Laboratory Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Priority to JP4175287A priority Critical patent/JPS62216223A/ja
Publication of JPS62216223A publication Critical patent/JPS62216223A/ja
Publication of JPH0447455B2 publication Critical patent/JPH0447455B2/ja
Granted legal-status Critical Current

Links

JP4175287A 1987-02-24 1987-02-24 半導体処理装置 Granted JPS62216223A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4175287A JPS62216223A (ja) 1987-02-24 1987-02-24 半導体処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4175287A JPS62216223A (ja) 1987-02-24 1987-02-24 半導体処理装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP57167281A Division JPS5956726A (ja) 1982-09-20 1982-09-25 プラズマｃｖｄ装置

Publications (2)

Publication Number Publication Date
JPS62216223A JPS62216223A (ja) 1987-09-22
JPH0447455B2 true JPH0447455B2 (enrdf_load_stackoverflow) 1992-08-04

Family

ID=12617151

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4175287A Granted JPS62216223A (ja) 1987-02-24 1987-02-24 半導体処理装置

Country Status (1)

Country Link
JP (1) JPS62216223A (enrdf_load_stackoverflow)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5143718U (enrdf_load_stackoverflow) * 1974-09-27 1976-03-31
DE2638270C2 (de) * 1976-08-25 1983-01-27 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Verfahren zur Herstellung großflächiger, freitragender Platten aus Silicium

Also Published As

Publication number Publication date
JPS62216223A (ja) 1987-09-22

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