JPH0441977Y2 - - Google Patents
Info
- Publication number
- JPH0441977Y2 JPH0441977Y2 JP1986013793U JP1379386U JPH0441977Y2 JP H0441977 Y2 JPH0441977 Y2 JP H0441977Y2 JP 1986013793 U JP1986013793 U JP 1986013793U JP 1379386 U JP1379386 U JP 1379386U JP H0441977 Y2 JPH0441977 Y2 JP H0441977Y2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- hole
- liquid
- liquid passage
- suction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007788 liquid Substances 0.000 claims description 73
- 239000000758 substrate Substances 0.000 claims description 69
- 238000012545 processing Methods 0.000 claims description 41
- 230000002093 peripheral effect Effects 0.000 claims description 6
- 238000004891 communication Methods 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000011161 development Methods 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000009194 climbing Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Coating Apparatus (AREA)
- Weting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986013793U JPH0441977Y2 (de) | 1986-01-31 | 1986-01-31 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986013793U JPH0441977Y2 (de) | 1986-01-31 | 1986-01-31 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62126283U JPS62126283U (de) | 1987-08-11 |
| JPH0441977Y2 true JPH0441977Y2 (de) | 1992-10-02 |
Family
ID=30803189
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986013793U Expired JPH0441977Y2 (de) | 1986-01-31 | 1986-01-31 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0441977Y2 (de) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0624674B2 (ja) * | 1986-12-09 | 1994-04-06 | 東京エレクトロン株式会社 | 基板載置台 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5982257U (ja) * | 1982-11-25 | 1984-06-02 | 株式会社東芝 | レジスト塗布装置 |
-
1986
- 1986-01-31 JP JP1986013793U patent/JPH0441977Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62126283U (de) | 1987-08-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3388628B2 (ja) | 回転式薬液処理装置 | |
| JP3518948B2 (ja) | 基板の回転処理装置 | |
| US6511540B1 (en) | Spin coating spindle and chuck assembly | |
| KR19990013571A (ko) | 도포장치 | |
| JP4504537B2 (ja) | スピン処理装置 | |
| JP3621568B2 (ja) | 基板洗浄装置 | |
| JPH0441977Y2 (de) | ||
| TWI841982B (zh) | 基板蝕刻處理裝置及基板邊緣的蝕刻控制方法 | |
| JP4567178B2 (ja) | スピン処理装置 | |
| JPH0512990B2 (de) | ||
| JPH05253853A (ja) | 薄片吸着装置および薄片吸着装置の洗浄方法 | |
| EP1015136B1 (de) | Verfahren und vorrichtung zum zentrifugalbeschichten von chemikalien | |
| JP3948963B2 (ja) | スピン処理装置 | |
| JP2002329705A (ja) | スピン処理装置 | |
| JP3133735B2 (ja) | 回転式塗布装置 | |
| JPH09290197A (ja) | 回転式基板処理装置 | |
| JP4358410B2 (ja) | スピン処理装置 | |
| JP3485471B2 (ja) | 処理装置及び処理方法 | |
| JPH03256677A (ja) | 薄片吸着保持装置 | |
| JP3352371B2 (ja) | 塗布装置 | |
| JP3387730B2 (ja) | 回転式基板処理装置 | |
| JP2004039978A (ja) | 基板保持装置 | |
| JPS58217184A (ja) | ウエハ乾燥装置 | |
| JPH0628224Y2 (ja) | 基板回転処理装置 | |
| JPH03209741A (ja) | 真空吸着装置 |