JPH0426219B2 - - Google Patents
Info
- Publication number
- JPH0426219B2 JPH0426219B2 JP58116160A JP11616083A JPH0426219B2 JP H0426219 B2 JPH0426219 B2 JP H0426219B2 JP 58116160 A JP58116160 A JP 58116160A JP 11616083 A JP11616083 A JP 11616083A JP H0426219 B2 JPH0426219 B2 JP H0426219B2
- Authority
- JP
- Japan
- Prior art keywords
- resistor
- resistance value
- impurity
- film
- polycrystalline silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D1/00—Resistors, capacitors or inductors
- H10D1/40—Resistors
- H10D1/47—Resistors having no potential barriers
Landscapes
- Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58116160A JPS609153A (ja) | 1983-06-29 | 1983-06-29 | 半導体集積回路内抵抗体の抵抗値調整方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58116160A JPS609153A (ja) | 1983-06-29 | 1983-06-29 | 半導体集積回路内抵抗体の抵抗値調整方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS609153A JPS609153A (ja) | 1985-01-18 |
JPH0426219B2 true JPH0426219B2 (enrdf_load_stackoverflow) | 1992-05-06 |
Family
ID=14680258
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58116160A Granted JPS609153A (ja) | 1983-06-29 | 1983-06-29 | 半導体集積回路内抵抗体の抵抗値調整方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS609153A (enrdf_load_stackoverflow) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6085550A (ja) * | 1983-10-17 | 1985-05-15 | Hitachi Ltd | 半導体集積回路の抵抗値調整方法 |
JP2685498B2 (ja) * | 1988-05-25 | 1997-12-03 | 株式会社日立製作所 | 半導体装置 |
JP2008159608A (ja) | 2006-12-20 | 2008-07-10 | Fujitsu Ltd | 半導体装置、半導体装置の製造方法および半導体装置の設計装置 |
JP7244180B2 (ja) * | 2019-03-26 | 2023-03-22 | ラピスセミコンダクタ株式会社 | 電圧クランプ回路及び集積回路。 |
-
1983
- 1983-06-29 JP JP58116160A patent/JPS609153A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS609153A (ja) | 1985-01-18 |
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