JPH0420913B2 - - Google Patents

Info

Publication number
JPH0420913B2
JPH0420913B2 JP57009436A JP943682A JPH0420913B2 JP H0420913 B2 JPH0420913 B2 JP H0420913B2 JP 57009436 A JP57009436 A JP 57009436A JP 943682 A JP943682 A JP 943682A JP H0420913 B2 JPH0420913 B2 JP H0420913B2
Authority
JP
Japan
Prior art keywords
group
branched
formula
tert
butyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57009436A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57142975A (en
Inventor
Jean Rody
Mario Slongo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of JPS57142975A publication Critical patent/JPS57142975A/ja
Publication of JPH0420913B2 publication Critical patent/JPH0420913B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/815—Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
    • G03C1/8155—Organic compounds therefor
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
    • C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
    • C07D249/18—Benzotriazoles
    • C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3472—Five-membered rings
    • C08K5/3475—Five-membered rings condensed with carbocyclic rings
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/48—Stabilisers against degradation by oxygen, light or heat
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/132—Anti-ultraviolet fading

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP57009436A 1981-01-23 1982-01-23 2-(2-hydroxyphenyl)-benzotriazole, manufacture and stabilized organic material containing same Granted JPS57142975A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH43781 1981-01-23

Publications (2)

Publication Number Publication Date
JPS57142975A JPS57142975A (en) 1982-09-03
JPH0420913B2 true JPH0420913B2 (OSRAM) 1992-04-07

Family

ID=4187006

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57009436A Granted JPS57142975A (en) 1981-01-23 1982-01-23 2-(2-hydroxyphenyl)-benzotriazole, manufacture and stabilized organic material containing same

Country Status (8)

Country Link
US (2) US4973702A (OSRAM)
EP (1) EP0057160B1 (OSRAM)
JP (1) JPS57142975A (OSRAM)
BR (1) BR8200336A (OSRAM)
CA (1) CA1197246A (OSRAM)
DE (1) DE3264154D1 (OSRAM)
HK (1) HK32588A (OSRAM)
SG (1) SG78887G (OSRAM)

Families Citing this family (87)

* Cited by examiner, † Cited by third party
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EP0133164B1 (de) * 1983-07-26 1988-12-14 Ciba-Geigy Ag Copolymerisierbare Verbindungen
JPS60232550A (ja) 1984-05-02 1985-11-19 Fuji Photo Film Co Ltd ハロゲン化銀カラ−写真感光材料
JPS6136339A (ja) * 1984-07-27 1986-02-21 Polyplastics Co 耐候性ポリアセタ−ル樹脂組成物
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US4926190A (en) * 1987-02-18 1990-05-15 Ciba-Geigy Corporation Ink jet recording process using certain benzotriazole derivatives as light stabilizers
JPH0788471B2 (ja) * 1987-02-20 1995-09-27 旭電化工業株式会社 熱硬化性合成樹脂塗料用安定剤
US4803254A (en) * 1987-03-11 1989-02-07 Iolab Corporation Vinylsilylalkoxy arylbenzotriazole compounds and UV absorbing compositions made therefrom
US5233047A (en) * 1987-08-12 1993-08-03 Elf Atochem North America, Inc. Benzotriazole UV absorber hydrazides
US4980420A (en) * 1987-08-12 1990-12-25 Atochem North America, Inc. Benzotriazole and oxanilide UV absorber hydrazides
DE3735577A1 (de) * 1987-10-21 1989-05-03 Basf Ag Gemisch zum stabilisieren von polyurethanen
US4921966A (en) * 1987-12-23 1990-05-01 Ciba-Geigy Corporation Process for the preparation of liquid mixtures of alkylated 2-(2-hydroxyphenyl)benzotriazoles
DE3888952D1 (de) * 1987-12-28 1994-05-11 Ciba Geigy Neue 2-(2-Hydroxyphenyl)-benztriazol-derivate.
US4863802A (en) * 1987-12-31 1989-09-05 General Electric Company UV-stabilized coatings
US4861664A (en) * 1987-12-31 1989-08-29 General Electric Company Process for UV stabilizer impregnation of plastic surfaces
US4913974A (en) * 1987-12-31 1990-04-03 General Electric Company UV-stabilized melamine-polyol coated thermoplastic substrate
US4948666A (en) * 1988-04-22 1990-08-14 Mobay Corporation Stain resistant polycarbonate panels
DE68913346T2 (de) * 1988-05-19 1994-09-15 Du Pont Bisharnstoffe als Lichtstabilisatoren für organische Polymere.
US5166234A (en) * 1988-05-19 1992-11-24 E. I. Du Pont De Nemours And Company Bisurea light stabilizer for organic polymers
GB2230784B (en) * 1989-03-21 1992-11-18 Ciba Geigy Ag Process for modifying acrylate copolymers
EP0423070B1 (de) * 1989-10-12 1995-08-30 Ciba-Geigy Ag Verfahren zur Herstellung substituierter Phenole
ES2081458T3 (es) * 1990-03-30 1996-03-16 Ciba Geigy Ag Composicion de pintura.
US5278314A (en) * 1991-02-12 1994-01-11 Ciba-Geigy Corporation 5-thio-substituted benzotriazole UV-absorbers
US5280124A (en) * 1991-02-12 1994-01-18 Ciba-Geigy Corporation 5-sulfonyl-substituted benzotriazole UV-absorbers
EP0530135A1 (de) * 1991-06-03 1993-03-03 Ciba-Geigy Ag UV-Absorber enthaltendes photographisches Material
DE59208921D1 (de) * 1991-06-03 1997-10-30 Ciba Geigy Ag UV-Absorber enthaltendes photographisches Material
DE59208885D1 (de) * 1991-09-05 1997-10-16 Ciba Geigy Ag UV-Absorber enthaltendes photographisches Material
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US5384235A (en) * 1992-07-01 1995-01-24 Eastman Kodak Company Photographic elements incorporating polymeric ultraviolet absorbers
US5489503A (en) * 1992-12-03 1996-02-06 Ciba-Geigy Corp. UV absorbers
DE4417748A1 (de) 1994-05-20 1995-11-23 Bayer Ag UV-stabile Polycarbonate gegebenenfalls im Gemisch mit bekannten aromatischen Polycarbonaten, ihre Herstellung und ihre Verwendung
DE4429697A1 (de) 1994-08-22 1996-02-29 Bayer Ag Verfahren zur Herstellung von UV-stabilen Polycarbonaten
US5455152A (en) * 1994-09-27 1995-10-03 Eastman Kodak Company Benzotriazole based UV absorbing monomers and photographic elements containing polymers formed from them
US5523379A (en) * 1994-12-21 1996-06-04 General Electric Plastics High molecular weight stabilizer compounds for stabilizing polymers
JP3524617B2 (ja) * 1995-03-13 2004-05-10 新日本石油株式会社 紫外線吸収剤及びコーティング材料
US5675015A (en) * 1996-03-07 1997-10-07 Eastman Kodak Company Process for the preparation of benzotriazole derivatives
JP2961307B2 (ja) * 1996-03-28 1999-10-12 大塚化学株式会社 ビスベンゾトリアゾリルフェノール化合物
US5814438A (en) * 1996-03-29 1998-09-29 Eastman Kodak Company Benzotriazole-based novel UV absorbers and photographic elements containing them
JP3590194B2 (ja) * 1996-04-26 2004-11-17 タキロン株式会社 添加剤含有熱可塑性樹脂成形体及びその製造方法
US6291586B2 (en) * 1996-05-03 2001-09-18 3M Innovative Properties Company Amide functional ultraviolet light absorbers for polyurethanes and polyureas
US5994431A (en) * 1996-05-03 1999-11-30 3M Innovative Properties Company Amide functional ultraviolet light absorbers for polyolefins
US5872165A (en) * 1996-12-18 1999-02-16 Basf Corporation Coating composition and method for reducing ultraviolet light degradation
JP3714574B2 (ja) * 1997-03-26 2005-11-09 ダイセル化学工業株式会社 紫外線吸収剤とその製造方法および合成樹脂組成物
US6383716B1 (en) * 1997-08-22 2002-05-07 Asahi Kasei Kabushiki Kaisha Stable photosensitive resin composition
JP3722986B2 (ja) * 1997-08-29 2005-11-30 株式会社ニデック 紫外線吸収性基材
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US5985444A (en) * 1998-04-03 1999-11-16 3M Innovative Properties Company Amide functional ultraviolet light absorbers for fluoropolymers
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US6239276B1 (en) 1998-06-22 2001-05-29 Cytec Technology Corporation Non-yellowing para-tertiary-alkyl phenyl substituted triazine and pyrimidine ultraviolet light absorbers
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US6194330B1 (en) 1998-07-31 2001-02-27 Milliken & Company Polymer latex for ultraviolet absorbtion on fabric
EP0989124B1 (en) * 1998-09-25 2002-08-14 Daicel Chemical Industries, Ltd. New polyester compounds having a benzotriazole group and a preparation method thereof
US6368521B1 (en) 1999-03-29 2002-04-09 Nippon Mitsubishi Oil Corporation Water-based coating composition
US6187845B1 (en) 1999-05-03 2001-02-13 Ciba Specialty Chemicals Corporation Stabilized adhesive compositions containing highly soluble, red-shifted, photostable benzotriazole UV absorbers and laminated articles derived therefrom
US6245915B1 (en) 1999-05-03 2001-06-12 Ciba Specialty Chemicals Corporation Asymmetrical bisbenzotriazoles substituted by a perfluoroalkyl moiety
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JP4857455B2 (ja) * 1999-12-24 2012-01-18 大日本印刷株式会社 耐候性に優れた化粧材
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KR20140101788A (ko) 2011-11-15 2014-08-20 바스프 에스이 유기 반도체 소자 및 이의 제조 방법
CN104428291B (zh) * 2012-07-13 2016-09-07 巴斯夫欧洲公司 作为有机材料稳定剂的二-[3-(7-叔丁基-2-氧代-3-苯基-3h-苯并呋喃-5-基)丙酰基]聚乙二醇衍生物
KR20160077074A (ko) 2013-10-29 2016-07-01 바스프 에스이 코팅 내 uv 흡수제로서의 2-(2-히드록시페닐)벤조트리아졸 화합물의 용도
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JP6843269B2 (ja) * 2017-07-07 2021-03-17 奇▲たい▼科技股▲ふん▼有限公司 反応性紫外線吸収剤およびその適用
KR20190090415A (ko) * 2018-01-24 2019-08-02 삼성디스플레이 주식회사 전자 장치 및 이의 제조방법
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TW201942312A (zh) 2018-04-04 2019-11-01 德商巴地斯顏料化工廠 紫外線輻射吸收聚合物組合物(uvrap)作為用於非生物及非角蛋白材料之塗料之uv吸收劑的用途
KR102267720B1 (ko) * 2019-10-17 2021-06-22 한국화학연구원 벤조트리아졸 화합물, 이를 포함하는 uv 흡수제 및 필름
BR102020024677A2 (pt) 2020-12-02 2022-06-14 Oxiteno S.A. Indústria E Comércio Composição e método para aumentar a resistência de formulações agroquímicas contra raios uva/uvb, uso da composição, e formulação agroquímica

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Also Published As

Publication number Publication date
US5032498A (en) 1991-07-16
JPS57142975A (en) 1982-09-03
HK32588A (en) 1988-05-13
US4973702A (en) 1990-11-27
CA1197246A (en) 1985-11-26
SG78887G (en) 1988-09-16
BR8200336A (pt) 1982-11-23
EP0057160B1 (de) 1985-06-19
DE3264154D1 (en) 1985-07-25
EP0057160A1 (de) 1982-08-04

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