SG78887G - 2-(2-hydroxyphenyl)-benzotriazoles, their use as ultraviolet stabilizers and their preparation - Google Patents
2-(2-hydroxyphenyl)-benzotriazoles, their use as ultraviolet stabilizers and their preparationInfo
- Publication number
- SG78887G SG78887G SG788/87A SG78887A SG78887G SG 78887 G SG78887 G SG 78887G SG 788/87 A SG788/87 A SG 788/87A SG 78887 A SG78887 A SG 78887A SG 78887 G SG78887 G SG 78887G
- Authority
- SG
- Singapore
- Prior art keywords
- benzotriazoles
- hydroxyphenyl
- preparation
- ultraviolet stabilizers
- stabilizers
- Prior art date
Links
- FJGQBLRYBUAASW-UHFFFAOYSA-N 2-(benzotriazol-2-yl)phenol Chemical class OC1=CC=CC=C1N1N=C2C=CC=CC2=N1 FJGQBLRYBUAASW-UHFFFAOYSA-N 0.000 title 1
- 239000000326 ultraviolet stabilizing agent Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/815—Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
- G03C1/8155—Organic compounds therefor
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
- C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
- C07D249/18—Benzotriazoles
- C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3472—Five-membered rings
- C08K5/3475—Five-membered rings condensed with carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/48—Stabilisers against degradation by oxygen, light or heat
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/132—Anti-ultraviolet fading
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Plural Heterocyclic Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH43781 | 1981-01-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG78887G true SG78887G (en) | 1988-09-16 |
Family
ID=4187006
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG788/87A SG78887G (en) | 1981-01-23 | 1987-09-28 | 2-(2-hydroxyphenyl)-benzotriazoles, their use as ultraviolet stabilizers and their preparation |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US4973702A (OSRAM) |
| EP (1) | EP0057160B1 (OSRAM) |
| JP (1) | JPS57142975A (OSRAM) |
| BR (1) | BR8200336A (OSRAM) |
| CA (1) | CA1197246A (OSRAM) |
| DE (1) | DE3264154D1 (OSRAM) |
| HK (1) | HK32588A (OSRAM) |
| SG (1) | SG78887G (OSRAM) |
Families Citing this family (87)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0133164B1 (de) * | 1983-07-26 | 1988-12-14 | Ciba-Geigy Ag | Copolymerisierbare Verbindungen |
| JPS60232550A (ja) | 1984-05-02 | 1985-11-19 | Fuji Photo Film Co Ltd | ハロゲン化銀カラ−写真感光材料 |
| JPS6136339A (ja) * | 1984-07-27 | 1986-02-21 | Polyplastics Co | 耐候性ポリアセタ−ル樹脂組成物 |
| GB8501563D0 (en) * | 1985-01-22 | 1985-02-20 | Kodak Ltd | Uv-absorbing polymers |
| JPH0618926B2 (ja) * | 1985-05-02 | 1994-03-16 | 住友化学工業株式会社 | 紫外線吸収剤 |
| US4926190A (en) * | 1987-02-18 | 1990-05-15 | Ciba-Geigy Corporation | Ink jet recording process using certain benzotriazole derivatives as light stabilizers |
| JPH0788471B2 (ja) * | 1987-02-20 | 1995-09-27 | 旭電化工業株式会社 | 熱硬化性合成樹脂塗料用安定剤 |
| US4803254A (en) * | 1987-03-11 | 1989-02-07 | Iolab Corporation | Vinylsilylalkoxy arylbenzotriazole compounds and UV absorbing compositions made therefrom |
| US5233047A (en) * | 1987-08-12 | 1993-08-03 | Elf Atochem North America, Inc. | Benzotriazole UV absorber hydrazides |
| US4980420A (en) * | 1987-08-12 | 1990-12-25 | Atochem North America, Inc. | Benzotriazole and oxanilide UV absorber hydrazides |
| DE3735577A1 (de) * | 1987-10-21 | 1989-05-03 | Basf Ag | Gemisch zum stabilisieren von polyurethanen |
| US4921966A (en) * | 1987-12-23 | 1990-05-01 | Ciba-Geigy Corporation | Process for the preparation of liquid mixtures of alkylated 2-(2-hydroxyphenyl)benzotriazoles |
| DE3888952D1 (de) * | 1987-12-28 | 1994-05-11 | Ciba Geigy | Neue 2-(2-Hydroxyphenyl)-benztriazol-derivate. |
| US4863802A (en) * | 1987-12-31 | 1989-09-05 | General Electric Company | UV-stabilized coatings |
| US4861664A (en) * | 1987-12-31 | 1989-08-29 | General Electric Company | Process for UV stabilizer impregnation of plastic surfaces |
| US4913974A (en) * | 1987-12-31 | 1990-04-03 | General Electric Company | UV-stabilized melamine-polyol coated thermoplastic substrate |
| US4948666A (en) * | 1988-04-22 | 1990-08-14 | Mobay Corporation | Stain resistant polycarbonate panels |
| DE68913346T2 (de) * | 1988-05-19 | 1994-09-15 | Du Pont | Bisharnstoffe als Lichtstabilisatoren für organische Polymere. |
| US5166234A (en) * | 1988-05-19 | 1992-11-24 | E. I. Du Pont De Nemours And Company | Bisurea light stabilizer for organic polymers |
| GB2230784B (en) * | 1989-03-21 | 1992-11-18 | Ciba Geigy Ag | Process for modifying acrylate copolymers |
| EP0423070B1 (de) * | 1989-10-12 | 1995-08-30 | Ciba-Geigy Ag | Verfahren zur Herstellung substituierter Phenole |
| ES2081458T3 (es) * | 1990-03-30 | 1996-03-16 | Ciba Geigy Ag | Composicion de pintura. |
| US5278314A (en) * | 1991-02-12 | 1994-01-11 | Ciba-Geigy Corporation | 5-thio-substituted benzotriazole UV-absorbers |
| US5280124A (en) * | 1991-02-12 | 1994-01-18 | Ciba-Geigy Corporation | 5-sulfonyl-substituted benzotriazole UV-absorbers |
| EP0530135A1 (de) * | 1991-06-03 | 1993-03-03 | Ciba-Geigy Ag | UV-Absorber enthaltendes photographisches Material |
| DE59208921D1 (de) * | 1991-06-03 | 1997-10-30 | Ciba Geigy Ag | UV-Absorber enthaltendes photographisches Material |
| DE59208885D1 (de) * | 1991-09-05 | 1997-10-16 | Ciba Geigy Ag | UV-Absorber enthaltendes photographisches Material |
| US5385815A (en) | 1992-07-01 | 1995-01-31 | Eastman Kodak Company | Photographic elements containing loaded ultraviolet absorbing polymer latex |
| US5384235A (en) * | 1992-07-01 | 1995-01-24 | Eastman Kodak Company | Photographic elements incorporating polymeric ultraviolet absorbers |
| US5489503A (en) * | 1992-12-03 | 1996-02-06 | Ciba-Geigy Corp. | UV absorbers |
| DE4417748A1 (de) | 1994-05-20 | 1995-11-23 | Bayer Ag | UV-stabile Polycarbonate gegebenenfalls im Gemisch mit bekannten aromatischen Polycarbonaten, ihre Herstellung und ihre Verwendung |
| DE4429697A1 (de) | 1994-08-22 | 1996-02-29 | Bayer Ag | Verfahren zur Herstellung von UV-stabilen Polycarbonaten |
| US5455152A (en) * | 1994-09-27 | 1995-10-03 | Eastman Kodak Company | Benzotriazole based UV absorbing monomers and photographic elements containing polymers formed from them |
| US5523379A (en) * | 1994-12-21 | 1996-06-04 | General Electric Plastics | High molecular weight stabilizer compounds for stabilizing polymers |
| JP3524617B2 (ja) * | 1995-03-13 | 2004-05-10 | 新日本石油株式会社 | 紫外線吸収剤及びコーティング材料 |
| US5675015A (en) * | 1996-03-07 | 1997-10-07 | Eastman Kodak Company | Process for the preparation of benzotriazole derivatives |
| JP2961307B2 (ja) * | 1996-03-28 | 1999-10-12 | 大塚化学株式会社 | ビスベンゾトリアゾリルフェノール化合物 |
| US5814438A (en) * | 1996-03-29 | 1998-09-29 | Eastman Kodak Company | Benzotriazole-based novel UV absorbers and photographic elements containing them |
| JP3590194B2 (ja) * | 1996-04-26 | 2004-11-17 | タキロン株式会社 | 添加剤含有熱可塑性樹脂成形体及びその製造方法 |
| US6291586B2 (en) * | 1996-05-03 | 2001-09-18 | 3M Innovative Properties Company | Amide functional ultraviolet light absorbers for polyurethanes and polyureas |
| US5994431A (en) * | 1996-05-03 | 1999-11-30 | 3M Innovative Properties Company | Amide functional ultraviolet light absorbers for polyolefins |
| US5872165A (en) * | 1996-12-18 | 1999-02-16 | Basf Corporation | Coating composition and method for reducing ultraviolet light degradation |
| JP3714574B2 (ja) * | 1997-03-26 | 2005-11-09 | ダイセル化学工業株式会社 | 紫外線吸収剤とその製造方法および合成樹脂組成物 |
| US6383716B1 (en) * | 1997-08-22 | 2002-05-07 | Asahi Kasei Kabushiki Kaisha | Stable photosensitive resin composition |
| JP3722986B2 (ja) * | 1997-08-29 | 2005-11-30 | 株式会社ニデック | 紫外線吸収性基材 |
| IT1295933B1 (it) | 1997-10-30 | 1999-05-28 | Great Lakes Chemical Italia | 2-(2'-idrossifenil)benzotriazoli e procedimento per la loro preparazione |
| DE19756778A1 (de) | 1997-12-19 | 1999-06-24 | Basf Ag | Verwendung von Isoindolinonderivaten als Stabilisatoren für organische Materialien |
| US5985444A (en) * | 1998-04-03 | 1999-11-16 | 3M Innovative Properties Company | Amide functional ultraviolet light absorbers for fluoropolymers |
| KR20010053097A (ko) | 1998-06-22 | 2001-06-25 | 에프. 아. 프라저, 에른스트 알테르 (에. 알테르), 한스 페터 비틀린 (하. 페. 비틀린), 피. 랍 보프, 브이. 스펜글러, 페. 아에글러 | 폴리-트리스아릴-1,3,5-트리아진 카바메이트 자외선 흡수제 |
| US6297377B1 (en) | 1998-06-22 | 2001-10-02 | Cytec Technology Corporation | Benzocycle-substituted triazine and pyrimidine ultraviolet light absorbers |
| US6239276B1 (en) | 1998-06-22 | 2001-05-29 | Cytec Technology Corporation | Non-yellowing para-tertiary-alkyl phenyl substituted triazine and pyrimidine ultraviolet light absorbers |
| EP1089985B1 (en) | 1998-06-22 | 2005-09-21 | Cytec Technology Corp. | Red-shifted trisaryl-1,3,5-triazine ultraviolet light absorbers |
| US6194330B1 (en) | 1998-07-31 | 2001-02-27 | Milliken & Company | Polymer latex for ultraviolet absorbtion on fabric |
| EP0989124B1 (en) * | 1998-09-25 | 2002-08-14 | Daicel Chemical Industries, Ltd. | New polyester compounds having a benzotriazole group and a preparation method thereof |
| US6368521B1 (en) | 1999-03-29 | 2002-04-09 | Nippon Mitsubishi Oil Corporation | Water-based coating composition |
| US6187845B1 (en) | 1999-05-03 | 2001-02-13 | Ciba Specialty Chemicals Corporation | Stabilized adhesive compositions containing highly soluble, red-shifted, photostable benzotriazole UV absorbers and laminated articles derived therefrom |
| US6245915B1 (en) | 1999-05-03 | 2001-06-12 | Ciba Specialty Chemicals Corporation | Asymmetrical bisbenzotriazoles substituted by a perfluoroalkyl moiety |
| US6413699B1 (en) | 1999-10-11 | 2002-07-02 | Macdermid Graphic Arts, Inc. | UV-absorbing support layers and flexographic printing elements comprising same |
| CA2387602A1 (en) * | 1999-11-29 | 2001-06-07 | David George Leppard | Dimeric light stabilizers for polyolefins and polyolefin copolymers |
| US6614578B2 (en) | 1999-12-03 | 2003-09-02 | Gentex Corporation | Ultraviolet stabilizing materials having a solublizing moiety |
| US6700693B2 (en) * | 1999-12-03 | 2004-03-02 | Gentex Corporation | Electrochromic devices having an electron shuttle |
| JP4857455B2 (ja) * | 1999-12-24 | 2012-01-18 | 大日本印刷株式会社 | 耐候性に優れた化粧材 |
| US6380285B1 (en) | 2000-02-01 | 2002-04-30 | Ciba Specialty Chemicals Corporation | Bloom-resistant benzotriazole UV absorbers and compositions stabilized therewith |
| JP2003012748A (ja) * | 2001-06-28 | 2003-01-15 | Daicel Chem Ind Ltd | 水系紫外線吸収性樹脂エマルション及びその製造方法並びにエマルション樹脂組成物 |
| US6867250B1 (en) | 2000-10-30 | 2005-03-15 | Cytec Technology Corp. | Non-yellowing ortho-dialkyl aryl substituted triazine ultraviolet light absorbers |
| DE10120838A1 (de) * | 2001-04-27 | 2002-10-31 | Basf Ag | Stoffmischung zur UV-Stabilisierung von Kunststoffen und Herstellung davon |
| JP2002363254A (ja) * | 2001-06-06 | 2002-12-18 | Nippon Kayaku Co Ltd | エポキシ化合物、エポキシ樹脂組成物及びその硬化物 |
| US6602447B2 (en) * | 2001-08-21 | 2003-08-05 | Milliken & Company | Low-color ultraviolet absorbers for high UV wavelength protection applications |
| US7097789B2 (en) * | 2001-08-21 | 2006-08-29 | Milliken & Company | Thermoplastic containers exhibiting excellent protection to various ultraviolet susceptible compounds |
| US7381762B2 (en) * | 2004-08-20 | 2008-06-03 | Milliken & Company | Ultraviolet light (UV) absorbing compounds and compositions containing UV absorbing compounds |
| US7101659B1 (en) | 2005-07-01 | 2006-09-05 | Eastman Kodak Company | Color photographic element with UV absorber |
| CA2727153A1 (en) | 2008-06-20 | 2009-12-23 | Basf Se | Agrochemical formulation comprising a pesticide, an organic uv photoprotective filter and coated metal oxide nanoparticles |
| US20100073754A1 (en) * | 2008-09-24 | 2010-03-25 | Gentex Corporation | Ultraviolet light stabilizing compounds and associated media and devices |
| US20120058974A1 (en) * | 2009-03-13 | 2012-03-08 | Basf Se | Composition comprising pesticide and benzotriazole UV absorbers |
| EP2430089B1 (de) * | 2009-05-15 | 2013-07-31 | Basf Se | Hochmolekulare unpolare benztriazole |
| US9125411B2 (en) | 2010-04-15 | 2015-09-08 | Basf Se | UV absorbers for reducing the E/Z isomerization of pesticides |
| TWI425026B (zh) | 2011-09-19 | 2014-02-01 | Everlight Chem Ind Corp | 聚氨酯衍生物及其組成物及包括該衍生物的染料添加劑 |
| KR20140101788A (ko) | 2011-11-15 | 2014-08-20 | 바스프 에스이 | 유기 반도체 소자 및 이의 제조 방법 |
| CN104428291B (zh) * | 2012-07-13 | 2016-09-07 | 巴斯夫欧洲公司 | 作为有机材料稳定剂的二-[3-(7-叔丁基-2-氧代-3-苯基-3h-苯并呋喃-5-基)丙酰基]聚乙二醇衍生物 |
| KR20160077074A (ko) | 2013-10-29 | 2016-07-01 | 바스프 에스이 | 코팅 내 uv 흡수제로서의 2-(2-히드록시페닐)벤조트리아졸 화합물의 용도 |
| WO2016053662A1 (en) * | 2014-09-30 | 2016-04-07 | Transitions Optical, Inc. | Ultraviolet light absorbers |
| JP6843269B2 (ja) * | 2017-07-07 | 2021-03-17 | 奇▲たい▼科技股▲ふん▼有限公司 | 反応性紫外線吸収剤およびその適用 |
| KR20190090415A (ko) * | 2018-01-24 | 2019-08-02 | 삼성디스플레이 주식회사 | 전자 장치 및 이의 제조방법 |
| US11417857B2 (en) | 2018-01-24 | 2022-08-16 | Samsung Display Co., Ltd. | Heterocyclic compound and electronic apparatus |
| TW201942312A (zh) | 2018-04-04 | 2019-11-01 | 德商巴地斯顏料化工廠 | 紫外線輻射吸收聚合物組合物(uvrap)作為用於非生物及非角蛋白材料之塗料之uv吸收劑的用途 |
| KR102267720B1 (ko) * | 2019-10-17 | 2021-06-22 | 한국화학연구원 | 벤조트리아졸 화합물, 이를 포함하는 uv 흡수제 및 필름 |
| BR102020024677A2 (pt) | 2020-12-02 | 2022-06-14 | Oxiteno S.A. Indústria E Comércio | Composição e método para aumentar a resistência de formulações agroquímicas contra raios uva/uvb, uso da composição, e formulação agroquímica |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3213058A (en) * | 1960-12-19 | 1965-10-19 | American Cyanamid Co | Polymers reacted with benzotriazole uv absorbers |
| US3214436A (en) * | 1960-12-19 | 1965-10-26 | American Cyanamid Co | Benzotriazole compounds |
| BE630548A (OSRAM) * | 1961-06-16 | |||
| CH494060A (de) * | 1961-06-16 | 1970-07-31 | Geigy Ag J R | Verwendung von 2-(2'-Hydrophenyl)-benztriazolverbindungen als Lichtschutzmittel |
| US3230194A (en) * | 1961-12-22 | 1966-01-18 | American Cyanamid Co | 2-(2'-hydroxy-5'-tertiary-octylphenyl)-benzotriazole and polyolefins stabilized therewith |
| GB1212466A (en) * | 1969-03-27 | 1970-11-18 | Chemicke Zd Y Juraje Dimitrova | Hydroxyarylalkyldiethers and a method for the manufacture thereof |
| JPS5735221B2 (OSRAM) * | 1974-06-14 | 1982-07-28 | ||
| JPS6039218B2 (ja) * | 1977-05-16 | 1985-09-05 | コニカ株式会社 | ハロゲン化銀カラ−写真感光材料 |
| US4219480A (en) * | 1977-09-20 | 1980-08-26 | Ciba-Geigy Corporation | Process for the production of 2-aryl-2H-benzotriazoles |
| US4230867A (en) * | 1977-11-25 | 1980-10-28 | Ciba-Geigy Corporation | Process for the production of 2-aryl-2H-benzotriazoles |
| US4289686A (en) * | 1978-09-27 | 1981-09-15 | Ciba-Geigy Corporation | Tetra-alkyl piperidine derivatives as light stabilizers |
| CA1126999A (en) * | 1978-10-20 | 1982-07-06 | Michael J. Simons | Use of azole compounds with a n,n disubstituted carbamoyl group on a ring nitrogen as development restrainer precursors in photographic elements |
| US4347180A (en) * | 1979-05-16 | 1982-08-31 | Ciba-Geigy Corporation | High caustic coupling process for preparing substituted 2-nitro-2'-hydroxyazobenzenes |
| US4853471A (en) * | 1981-01-23 | 1989-08-01 | Ciba-Geigy Corporation | 2-(2-Hydroxyphenyl)-benztriazoles, their use as UV-absorbers and their preparation |
| EP0133164B1 (de) * | 1983-07-26 | 1988-12-14 | Ciba-Geigy Ag | Copolymerisierbare Verbindungen |
| US4791206A (en) * | 1985-05-16 | 1988-12-13 | Ciba-Geigy Corporation | Triazole-organodithiophosphate reaction product additives for functional fluids |
| US4716234A (en) * | 1986-12-01 | 1987-12-29 | Iolab Corporation | Ultraviolet absorbing polymers comprising 2-(2'-hydroxy-5'-acryloyloxyalkoxyphenyl)-2H-benzotriazole |
| JPH03141622A (ja) * | 1989-10-26 | 1991-06-17 | Matsushita Electric Ind Co Ltd | インダクタンス素子の製造方法 |
-
1982
- 1982-01-18 DE DE8282810020T patent/DE3264154D1/de not_active Expired
- 1982-01-18 EP EP82810020A patent/EP0057160B1/de not_active Expired
- 1982-01-21 CA CA000394626A patent/CA1197246A/en not_active Expired
- 1982-01-22 BR BR8200336A patent/BR8200336A/pt not_active IP Right Cessation
- 1982-01-23 JP JP57009436A patent/JPS57142975A/ja active Granted
-
1987
- 1987-09-28 SG SG788/87A patent/SG78887G/en unknown
-
1988
- 1988-05-02 HK HK325/88A patent/HK32588A/xx not_active IP Right Cessation
-
1989
- 1989-02-13 US US07/310,178 patent/US4973702A/en not_active Expired - Lifetime
-
1990
- 1990-08-21 US US07/570,474 patent/US5032498A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US5032498A (en) | 1991-07-16 |
| JPS57142975A (en) | 1982-09-03 |
| JPH0420913B2 (OSRAM) | 1992-04-07 |
| HK32588A (en) | 1988-05-13 |
| US4973702A (en) | 1990-11-27 |
| CA1197246A (en) | 1985-11-26 |
| BR8200336A (pt) | 1982-11-23 |
| EP0057160B1 (de) | 1985-06-19 |
| DE3264154D1 (en) | 1985-07-25 |
| EP0057160A1 (de) | 1982-08-04 |
Similar Documents
| Publication | Publication Date | Title |
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