JPH0414491B2 - - Google Patents
Info
- Publication number
- JPH0414491B2 JPH0414491B2 JP59102277A JP10227784A JPH0414491B2 JP H0414491 B2 JPH0414491 B2 JP H0414491B2 JP 59102277 A JP59102277 A JP 59102277A JP 10227784 A JP10227784 A JP 10227784A JP H0414491 B2 JPH0414491 B2 JP H0414491B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- wafer holder
- electron beam
- reference member
- alignment stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000609 electron-beam lithography Methods 0.000 claims description 6
- 238000010894 electron beam technology Methods 0.000 description 5
- 239000000696 magnetic material Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 238000003825 pressing Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000001988 toxicity Effects 0.000 description 2
- 231100000419 toxicity Toxicity 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
Landscapes
- Electron Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59102277A JPS60245221A (ja) | 1984-05-21 | 1984-05-21 | 電子ビ−ム描画装置用ウエハホルダ |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59102277A JPS60245221A (ja) | 1984-05-21 | 1984-05-21 | 電子ビ−ム描画装置用ウエハホルダ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60245221A JPS60245221A (ja) | 1985-12-05 |
JPH0414491B2 true JPH0414491B2 (enrdf_load_stackoverflow) | 1992-03-13 |
Family
ID=14323103
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59102277A Granted JPS60245221A (ja) | 1984-05-21 | 1984-05-21 | 電子ビ−ム描画装置用ウエハホルダ |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60245221A (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5095300A (en) * | 1990-03-28 | 1992-03-10 | Nec Electronics Inc. | Device for sensing side positioning of wafers |
-
1984
- 1984-05-21 JP JP59102277A patent/JPS60245221A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS60245221A (ja) | 1985-12-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |