JPH0372599B2 - - Google Patents
Info
- Publication number
- JPH0372599B2 JPH0372599B2 JP59104581A JP10458184A JPH0372599B2 JP H0372599 B2 JPH0372599 B2 JP H0372599B2 JP 59104581 A JP59104581 A JP 59104581A JP 10458184 A JP10458184 A JP 10458184A JP H0372599 B2 JPH0372599 B2 JP H0372599B2
- Authority
- JP
- Japan
- Prior art keywords
- oxygen
- core tube
- tube
- container
- hydrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
- C30B33/005—Oxydation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10458184A JPS60122799A (ja) | 1984-05-25 | 1984-05-25 | 半導体ウエハの熱処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10458184A JPS60122799A (ja) | 1984-05-25 | 1984-05-25 | 半導体ウエハの熱処理方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15986078A Division JPS5590405A (en) | 1978-12-27 | 1978-12-27 | Forming device for wet oxygen and heat treatment furnace provided with the said device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60122799A JPS60122799A (ja) | 1985-07-01 |
| JPH0372599B2 true JPH0372599B2 (enrdf_load_stackoverflow) | 1991-11-19 |
Family
ID=14384398
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10458184A Granted JPS60122799A (ja) | 1984-05-25 | 1984-05-25 | 半導体ウエハの熱処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60122799A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL8603111A (nl) * | 1986-12-08 | 1988-07-01 | Philips Nv | Werkwijze voor het vervaardigen van een halfgeleiderinrichting waarbij een siliciumplak aan zijn oppervlak wordt voorzien van veldoxidegebieden. |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6028138B2 (ja) * | 1976-12-10 | 1985-07-03 | 三菱電機株式会社 | 半導体装置の製造装置 |
| JPS53123667A (en) * | 1977-04-04 | 1978-10-28 | Mitsubishi Electric Corp | Generator for semiconuctor oxidized film |
-
1984
- 1984-05-25 JP JP10458184A patent/JPS60122799A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60122799A (ja) | 1985-07-01 |
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