JPS5590405A - Forming device for wet oxygen and heat treatment furnace provided with the said device - Google Patents
Forming device for wet oxygen and heat treatment furnace provided with the said deviceInfo
- Publication number
- JPS5590405A JPS5590405A JP15986078A JP15986078A JPS5590405A JP S5590405 A JPS5590405 A JP S5590405A JP 15986078 A JP15986078 A JP 15986078A JP 15986078 A JP15986078 A JP 15986078A JP S5590405 A JPS5590405 A JP S5590405A
- Authority
- JP
- Japan
- Prior art keywords
- oxygen
- hydrogen
- vessel
- pipe
- nozzle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Oxygen, Ozone, And Oxides In General (AREA)
Abstract
PURPOSE: To form the titled device that does not disturb the distribution of temperature in a treatment chamber by a mechanism wherein an oxygen feed mechanism, a hydrogen feed mechanism, which can heat a nose portion of a nozzle, and a mechanism for drawing out a gas mixture created are mounted to an airtight vessel.
CONSTITUTION: An oxygen feed pipe 15, a hydrogen feed pipe 14, to which a spiral heater 16 for heating a surrounding portion of a nozzle portion 18 is additionally installed, and a conduit 19, which draws out a mixed gas (wet oxygen) of steam and oxygen produced by a reaction of oxygen and hydrogen and supplies the mixed gas to a furnace core pipe 26 through an auxiliary conduit 28, are arranged to an airtight vessel 8 (it is manufactured so as to make up the three layer structure of a quartz glass box 10, a heat insulating layer 12 and a metallic vessel 11). The said devices are used in such a manner that hydrogen jetted from the nozzle 18, which temperature is brought to a fixed temperature by means of the heater 16, and oxygen, which is supplied from the pipe 15 and is filled in the vessel 8, are reacted and the wet oxygen formed is fed to the furnace core pipe 26 from the conduit 19.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15986078A JPS5590405A (en) | 1978-12-27 | 1978-12-27 | Forming device for wet oxygen and heat treatment furnace provided with the said device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15986078A JPS5590405A (en) | 1978-12-27 | 1978-12-27 | Forming device for wet oxygen and heat treatment furnace provided with the said device |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10458184A Division JPS60122799A (en) | 1984-05-25 | 1984-05-25 | Heat treatment of semiconductor wafer |
JP10458284A Division JPS60131807A (en) | 1984-05-25 | 1984-05-25 | Apparatus for producing wet oxygen atmosphere |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5590405A true JPS5590405A (en) | 1980-07-09 |
JPS6360528B2 JPS6360528B2 (en) | 1988-11-24 |
Family
ID=15702797
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15986078A Granted JPS5590405A (en) | 1978-12-27 | 1978-12-27 | Forming device for wet oxygen and heat treatment furnace provided with the said device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5590405A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5856435U (en) * | 1981-10-12 | 1983-04-16 | 沖電気工業株式会社 | Semiconductor wafer heat treatment equipment |
JPS5895633U (en) * | 1981-12-23 | 1983-06-29 | クラリオン株式会社 | Hydrogen combustion process tube |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53123667A (en) * | 1977-04-04 | 1978-10-28 | Mitsubishi Electric Corp | Generator for semiconuctor oxidized film |
-
1978
- 1978-12-27 JP JP15986078A patent/JPS5590405A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53123667A (en) * | 1977-04-04 | 1978-10-28 | Mitsubishi Electric Corp | Generator for semiconuctor oxidized film |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5856435U (en) * | 1981-10-12 | 1983-04-16 | 沖電気工業株式会社 | Semiconductor wafer heat treatment equipment |
JPS5895633U (en) * | 1981-12-23 | 1983-06-29 | クラリオン株式会社 | Hydrogen combustion process tube |
Also Published As
Publication number | Publication date |
---|---|
JPS6360528B2 (en) | 1988-11-24 |
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