JPH0369184B2 - - Google Patents

Info

Publication number
JPH0369184B2
JPH0369184B2 JP59262567A JP26256784A JPH0369184B2 JP H0369184 B2 JPH0369184 B2 JP H0369184B2 JP 59262567 A JP59262567 A JP 59262567A JP 26256784 A JP26256784 A JP 26256784A JP H0369184 B2 JPH0369184 B2 JP H0369184B2
Authority
JP
Japan
Prior art keywords
channel type
channel
diffusion layer
drain
output
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59262567A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61140164A (ja
Inventor
Hiroshi Kamijo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP59262567A priority Critical patent/JPS61140164A/ja
Publication of JPS61140164A publication Critical patent/JPS61140164A/ja
Publication of JPH0369184B2 publication Critical patent/JPH0369184B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • H10D84/85Complementary IGFETs, e.g. CMOS
    • H10D84/856Complementary IGFETs, e.g. CMOS the complementary IGFETs having different architectures than each other, e.g. high-voltage and low-voltage CMOS

Landscapes

  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Element Separation (AREA)
JP59262567A 1984-12-12 1984-12-12 半導体集積回路の製造方法 Granted JPS61140164A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59262567A JPS61140164A (ja) 1984-12-12 1984-12-12 半導体集積回路の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59262567A JPS61140164A (ja) 1984-12-12 1984-12-12 半導体集積回路の製造方法

Publications (2)

Publication Number Publication Date
JPS61140164A JPS61140164A (ja) 1986-06-27
JPH0369184B2 true JPH0369184B2 (cg-RX-API-DMAC7.html) 1991-10-31

Family

ID=17377592

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59262567A Granted JPS61140164A (ja) 1984-12-12 1984-12-12 半導体集積回路の製造方法

Country Status (1)

Country Link
JP (1) JPS61140164A (cg-RX-API-DMAC7.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6993242B2 (en) 1992-03-23 2006-01-31 3M Innovative Properties Company Luminaire device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6394669A (ja) * 1986-10-08 1988-04-25 Mitsubishi Electric Corp 半導体記憶装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5915189B2 (ja) * 1976-02-23 1984-04-07 ソニー株式会社 半導体装置の製造方法
DE2733787A1 (de) * 1976-08-06 1978-02-09 Rca Corp Komplementaersymmetrisches metall- oxid-halbleiterbauelement
JPS5467780A (en) * 1977-11-09 1979-05-31 Seiko Instr & Electronics Ltd High integration ic
JPS57120371A (en) * 1981-01-19 1982-07-27 Sanyo Electric Co Ltd Manufacture of complementary type mos semiconductor
JPS5947757A (ja) * 1982-09-10 1984-03-17 Hitachi Ltd 半導体集積回路装置とその製造法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6993242B2 (en) 1992-03-23 2006-01-31 3M Innovative Properties Company Luminaire device
US7209628B2 (en) 1992-03-23 2007-04-24 3M Innovative Properties Company Luminaire device
US7418188B2 (en) 1992-03-23 2008-08-26 3M Innovative Properties Company Luminaire device
US7424197B2 (en) 1992-03-23 2008-09-09 3M Innovative Properties Company Luminaire device
US7587117B2 (en) 1992-03-23 2009-09-08 3M Innovative Properties Company Luminaire device

Also Published As

Publication number Publication date
JPS61140164A (ja) 1986-06-27

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