JPH0363739B2 - - Google Patents
Info
- Publication number
- JPH0363739B2 JPH0363739B2 JP57212617A JP21261782A JPH0363739B2 JP H0363739 B2 JPH0363739 B2 JP H0363739B2 JP 57212617 A JP57212617 A JP 57212617A JP 21261782 A JP21261782 A JP 21261782A JP H0363739 B2 JPH0363739 B2 JP H0363739B2
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive resin
- polyvinyl acetate
- polymerization
- photosensitive
- partially saponified
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
- G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21261782A JPS59102228A (ja) | 1982-12-06 | 1982-12-06 | 感光性樹脂版材 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21261782A JPS59102228A (ja) | 1982-12-06 | 1982-12-06 | 感光性樹脂版材 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59102228A JPS59102228A (ja) | 1984-06-13 |
JPH0363739B2 true JPH0363739B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1991-10-02 |
Family
ID=16625638
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21261782A Granted JPS59102228A (ja) | 1982-12-06 | 1982-12-06 | 感光性樹脂版材 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59102228A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61103150A (ja) * | 1984-10-26 | 1986-05-21 | Toray Ind Inc | 感光性樹脂組成物 |
CN107924129B (zh) * | 2015-09-03 | 2019-03-26 | 东丽株式会社 | 感光性树脂印刷版原版及印刷版的制造方法 |
EP4212957A4 (en) * | 2020-09-14 | 2024-03-13 | Toray Industries, Inc. | PHOTOSENSITIVE RESIN PRINTING PLATE PRECURSOR AND METHOD FOR MANUFACTURING PRINTING PLATE USING SAID PRECURSOR |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5917414B2 (ja) * | 1975-10-07 | 1984-04-21 | 村上スクリ−ン (株) | スクリ−ン版用感光性組成物及び感光膜 |
JPS5785048A (en) * | 1980-11-17 | 1982-05-27 | Daicel Chem Ind Ltd | Exposed photosensitive diazo film for making screen plate |
-
1982
- 1982-12-06 JP JP21261782A patent/JPS59102228A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS59102228A (ja) | 1984-06-13 |