JPH0360800B2 - - Google Patents
Info
- Publication number
- JPH0360800B2 JPH0360800B2 JP59042851A JP4285184A JPH0360800B2 JP H0360800 B2 JPH0360800 B2 JP H0360800B2 JP 59042851 A JP59042851 A JP 59042851A JP 4285184 A JP4285184 A JP 4285184A JP H0360800 B2 JPH0360800 B2 JP H0360800B2
- Authority
- JP
- Japan
- Prior art keywords
- film thickness
- growth
- flow rate
- gas
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/14—Feed and outlet means for the gases; Modifying the flow of the reactive gases
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4285184A JPS60191096A (ja) | 1984-03-08 | 1984-03-08 | 気相成長方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4285184A JPS60191096A (ja) | 1984-03-08 | 1984-03-08 | 気相成長方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60191096A JPS60191096A (ja) | 1985-09-28 |
JPH0360800B2 true JPH0360800B2 (enrdf_load_html_response) | 1991-09-17 |
Family
ID=12647513
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4285184A Granted JPS60191096A (ja) | 1984-03-08 | 1984-03-08 | 気相成長方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60191096A (enrdf_load_html_response) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4818357A (en) * | 1987-05-06 | 1989-04-04 | Brown University Research Foundation | Method and apparatus for sputter deposition of a semiconductor homojunction and semiconductor homojunction products created by same |
JPH05291140A (ja) * | 1992-04-09 | 1993-11-05 | Fujitsu Ltd | 化合物半導体薄膜の成長方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58208200A (ja) * | 1982-05-31 | 1983-12-03 | Nippon Telegr & Teleph Corp <Ntt> | InPの選択気相エピタキシャル成長法 |
-
1984
- 1984-03-08 JP JP4285184A patent/JPS60191096A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS60191096A (ja) | 1985-09-28 |
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