JPH0360109B2 - - Google Patents

Info

Publication number
JPH0360109B2
JPH0360109B2 JP56214811A JP21481181A JPH0360109B2 JP H0360109 B2 JPH0360109 B2 JP H0360109B2 JP 56214811 A JP56214811 A JP 56214811A JP 21481181 A JP21481181 A JP 21481181A JP H0360109 B2 JPH0360109 B2 JP H0360109B2
Authority
JP
Japan
Prior art keywords
alkali
compound
energy radiation
organic acid
acid component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56214811A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58116531A (ja
Inventor
Kazuo Toda
Katsuhiro Fujino
Satoshi Takechi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP21481181A priority Critical patent/JPS58116531A/ja
Publication of JPS58116531A publication Critical patent/JPS58116531A/ja
Publication of JPH0360109B2 publication Critical patent/JPH0360109B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP21481181A 1981-12-29 1981-12-29 ネガ型レジスト材料 Granted JPS58116531A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21481181A JPS58116531A (ja) 1981-12-29 1981-12-29 ネガ型レジスト材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21481181A JPS58116531A (ja) 1981-12-29 1981-12-29 ネガ型レジスト材料

Publications (2)

Publication Number Publication Date
JPS58116531A JPS58116531A (ja) 1983-07-11
JPH0360109B2 true JPH0360109B2 (enrdf_load_stackoverflow) 1991-09-12

Family

ID=16661909

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21481181A Granted JPS58116531A (ja) 1981-12-29 1981-12-29 ネガ型レジスト材料

Country Status (1)

Country Link
JP (1) JPS58116531A (enrdf_load_stackoverflow)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS545967B2 (enrdf_load_stackoverflow) * 1973-04-14 1979-03-23
GB1566802A (en) * 1976-06-02 1980-05-08 Agfa Gevaert Photosensitive imaging material
JPS5934293B2 (ja) * 1977-04-20 1984-08-21 王子製紙株式会社 感光性組成物

Also Published As

Publication number Publication date
JPS58116531A (ja) 1983-07-11

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