JPH0337728B2 - - Google Patents
Info
- Publication number
- JPH0337728B2 JPH0337728B2 JP56065542A JP6554281A JPH0337728B2 JP H0337728 B2 JPH0337728 B2 JP H0337728B2 JP 56065542 A JP56065542 A JP 56065542A JP 6554281 A JP6554281 A JP 6554281A JP H0337728 B2 JPH0337728 B2 JP H0337728B2
- Authority
- JP
- Japan
- Prior art keywords
- polycrystalline
- amorphous silicon
- silicon
- polysilicon layer
- annealing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B19/00—Liquid-phase epitaxial-layer growth
- C30B19/02—Liquid-phase epitaxial-layer growth using molten solvents, e.g. flux
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Recrystallisation Techniques (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6554281A JPS57180116A (en) | 1981-04-30 | 1981-04-30 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6554281A JPS57180116A (en) | 1981-04-30 | 1981-04-30 | Manufacture of semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57180116A JPS57180116A (en) | 1982-11-06 |
JPH0337728B2 true JPH0337728B2 (en, 2012) | 1991-06-06 |
Family
ID=13290003
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6554281A Granted JPS57180116A (en) | 1981-04-30 | 1981-04-30 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57180116A (en, 2012) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5578520A (en) | 1991-05-28 | 1996-11-26 | Semiconductor Energy Laboratory Co., Ltd. | Method for annealing a semiconductor |
JPH05182923A (ja) * | 1991-05-28 | 1993-07-23 | Semiconductor Energy Lab Co Ltd | レーザーアニール方法 |
US5766344A (en) | 1991-09-21 | 1998-06-16 | Semiconductor Energy Laboratory Co., Ltd. | Method for forming a semiconductor |
JPH05235039A (ja) * | 1992-02-19 | 1993-09-10 | Casio Comput Co Ltd | 薄膜トランジスタの製造方法 |
JP3063018B2 (ja) * | 1992-02-19 | 2000-07-12 | カシオ計算機株式会社 | 薄膜トランジスタの製造方法 |
JP3082164B2 (ja) * | 1994-04-15 | 2000-08-28 | 株式会社半導体エネルギー研究所 | レーザー処理方法及び半導体装置 |
-
1981
- 1981-04-30 JP JP6554281A patent/JPS57180116A/ja active Granted
Non-Patent Citations (1)
Title |
---|
APPL.PHYS.LETT=1978 * |
Also Published As
Publication number | Publication date |
---|---|
JPS57180116A (en) | 1982-11-06 |
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